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公开(公告)号：US20250095973A1
公开(公告)日：2025-03-20
申请号：US18967551
申请日：2024-12-03
Applicant: Tokyo Electron Limited , The University of Shiga Prefecture
Inventor： Kazushi KANEKO , Eiki KAMATA , Osamu SAKAI
IPC: H01J37/32
Abstract: A plasma processing apparatus comprising: a processing chamber; an electromagnetic wave generator; a resonating structure formed by arranging resonators that are capable of resonating with a magnetic field component of electromagnetic waves; a measurement part configured to measure, for each frequency, a power of the electromagnetic waves traveling from the electromagnetic wave generator to the resonating structure and a power of transmitted waves, reflected waves, or scattered waves of the electromagnetic waves in the resonating structure; and a controller that performs measuring the power of the electromagnetic waves and the power of the transmitted waves, the reflected waves, or the scattered waves with the measurement part, and calculating a resonance frequency of the resonating structure based on frequency distribution of characteristic values of the resonating structure, calculated from the power of the electromagnetic waves and the power of the transmitted waves, the reflected waves, or the scattered waves.
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公开(公告)号：US12070296B2
公开(公告)日：2024-08-27
申请号：US17023148
申请日：2020-09-16
Inventor： Yasutaka Nishioka , Kenta Azuma , Minoru Taniguchi , Chisato Tawara , Tsuyoshi Hamaguchi
IPC: A61B5/022
CPC classification number: A61B5/02233 , A61B5/02225 , A61B2560/04 , A61B2562/0247
Abstract: A cuff unit of the present invention includes a first wall and a second wall that face each other with an object which has a rod shape interposed therebetween, an actuator that is capable of moving the first wall and the second wall in parallel with each other in a direction in which the first wall and the second wall relatively approach each other or separate from each other, a pressing fluid bag that is provided on a surface of the first wall on a side facing the object and that receives supply of a fluid from outside to inflate and press the object, and a restraining fluid bag that is provided on a surface of the second wall on a side facing the object and that receives supply of a fluid from outside to inflate along the periphery of the object.
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公开(公告)号：US20180271386A1
公开(公告)日：2018-09-27
申请号：US15989627
申请日：2018-05-25
Inventor： Yasutaka NISHIOKA , Wataru MASUDA , Masao SHIMIZU , Tsuyoshi HAMAGUCHI , Minoru TANIGUCHI
IPC: A61B5/021
CPC classification number: A61B5/02141 , A61B5/02116 , A61B5/022 , A61B5/02233
Abstract: A soft gripper that surrounds and grips an outer peripheral surface of an object, the soft gripper includes an elongated first actuator and an elongated second actuator, which are deformed in response to supply of a fluid. The first actuator and the second actuator extend from bases of the first and second actuators toward opposite sides each other. When receiving the supply of the fluid, each of the first and second actuators sequentially surrounds the object from the base toward a side of a leading end of the each of the first and second actuators.
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公开(公告)号：US20240339300A1
公开(公告)日：2024-10-10
申请号：US18622596
申请日：2024-03-29
Applicant: Tokyo Electron Limited , The University of Shiga Prefecture
Inventor： Kazushi KANEKO , Osamu SAKAI
IPC: H01J37/32
CPC classification number: H01J37/32247 , H01J37/3222 , H01J37/32238 , H01J2237/327
Abstract: A plasma processing apparatus comprises a processing chamber having a processing space, an electromagnetic wave generator configured to generate electromagnetic waves for plasma excitation to be supplied to the processing space, a dielectric having a first surface facing the processing space, an electromagnetic wave supply configured to supply the electromagnetic waves to the processing space via the dielectric, and a resonator array structure disposed along the first surface of the dielectric in the processing chamber. The resonator array structure includes a plurality of resonators resonating with magnetic field components of the electromagnetic waves, having a size smaller than a wavelength of the electromagnetic waves, and arranged in a direction along the first surface of the dielectric. The electromagnetic wave supply is configured to supply magnetic field components perpendicular to a plane on which the plurality of resonators are arranged.
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公开(公告)号：US20240203692A1
公开(公告)日：2024-06-20
申请号：US18590058
申请日：2024-02-28
Applicant: Tokyo Electron Limited , The University of Shiga Prefecture
Inventor： Shin OOWADA , Kazushi KANEKO , Masaaki MATSUKUMA , Eiki KAMATA , Satoru KAWAKAMI , Taro IKEDA , Osamu SAKAI
IPC: H01J37/32
CPC classification number: H01J37/32284 , H01J37/3222 , H01J37/32238 , H01J37/32256 , H01J37/32715 , H01J2237/327
Abstract: A plasma processing apparatus includes a processing container, an electromagnetic wave generator, and a resonator array structure. The processing container provides a processing space. The electromagnetic wave generator generates an electromagnetic wave for plasma excitation that is supplied to the processing space. The resonator array structure is formed by arranging resonators configured to resonate with a magnetic field component of the electromagnetic wave, each of the resonators having a size smaller than a wavelength of the electromagnetic wave, and is positioned in the processing container.
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Patent Agency Ranking
公开(公告)号：US20180272424A1
公开(公告)日：2018-09-27
申请号：US15542109
申请日：2016-01-14
Inventor： Shohei IDA , Yoshitsugu HIROKAWA , Jeyadevan BALACHANDRAN , Jhon Lehman Cuya HUAMAN , Kimitaka SATO
IPC: B22F1/00 , B22F9/24 , C09D11/52 , C09D11/106 , C09D11/037 , H01B1/22
CPC classification number: B22F1/0044 , B22F1/0025 , B22F1/0062 , B22F9/24 , B22F2001/0066 , B22F2301/255 , C08K7/24 , C08K9/04 , C08K9/08 , C08K2003/0806 , C08K2201/001 , C08K2201/003 , C08K2201/004 , C08K2201/011 , C09C1/62 , C09C3/10 , C09D11/037 , C09D11/106 , C09D11/52 , H01B1/02 , H01B1/22
Abstract: Silver nanowires having a thin and long shape that exhibit excellent dispersibility in an aqueous solvent having an alcohol added thereto are provided by silver nanowires having an average diameter of 50 nm or less and an average length of 10 μm or more, covered with a copolymer of a maleimide-based monomer and vinylpyrrolidone. The silver nanowires can be produced by a method for producing silver nanowires, containing reductively depositing silver in a wire form in an alcohol solvent having dissolved therein a silver compound, the deposition being performed in the solvent having dissolved therein a copolymer of a maleimide-based monomer and vinylpyrrolidone.
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公开(公告)号：US20170120327A1
公开(公告)日：2017-05-04
申请号：US15333484
申请日：2016-10-25
Inventor： Jeyadevan BALACHANDRAN , Jhon Lehman Cuya HUAMAN , Takuya NAITO , Kimitaka SATO , Daisuke KODAMA
CPC classification number: B22F1/02 , B22F1/0018 , B22F1/0022 , B22F1/0025 , B22F9/24 , B22F2301/255 , B22F2302/45
Abstract: Silver nanowires coated with, instead of a polymer protective agent such as PVP, an organic protective agent having a smaller molecular weight are provided. The silver nanowires have an average diameter of 100 nm or less and an average length of 5 μm or more, and a thiol having a molecular weight of 75 to 300 is adhered on surfaces of the metal silver. The silver nanowires have a thiol containing one thiol group in the structure adhered thereon. A thiol having only one thiol group (—S—H) in a molecule is a suitable target. Examples thereof include 1-dodecanethiol, 1-decanethiol, 1-octanethiol, 3-mercapto-1,2-propanediol, monoethanolamine thioglycolate, ammonium thioglycolate, and thiomalic acid.
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公开(公告)号：US10391555B2
公开(公告)日：2019-08-27
申请号：US15542109
申请日：2016-01-14
Inventor： Shohei Ida , Yoshitsugu Hirokawa , Jeyadevan Balachandran , Jhon Lehman Cuya Huaman , Kimitaka Sato
IPC: H01B1/02 , B22F1/00 , B22F9/24 , C09C1/62 , C09C3/10 , C09D11/52 , H01B1/22 , C09D11/037 , C09D11/106 , C08K7/24 , C08K9/04 , C08K3/08 , C08K9/08
Abstract: Silver nanowires having a thin and long shape that exhibit excellent dispersibility in an aqueous solvent having an alcohol added thereto are provided by silver nanowires having an average diameter of 50 nm or less and an average length of 10 μm or more, covered with a copolymer of a maleimide-based monomer and vinylpyrrolidone. The silver nanowires can be produced by a method for producing silver nanowires, containing reductively depositing silver in a wire form in an alcohol solvent having dissolved therein a silver compound, the deposition being performed in the solvent having dissolved therein a copolymer of a maleimide-based monomer and vinylpyrrolidone.
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公开(公告)号：US10213838B2
公开(公告)日：2019-02-26
申请号：US15111500
申请日：2015-01-19
Inventor： Jeyadevan Balachandran , Jhon Lehman Cuya Huaman , Daisuke Kodama
Abstract: A production method of silver nanowires exhibits a yield enhancement effect for a protective agent other than PVP. The method for producing silver nanowires includes depositing a silver linear structure, which is referred to as silver nanowires, in an alcohol solvent having a silver compound, a halogen compound, and an organic protective agent dissolved therein. A deposition reaction of silver is performed in a state where aluminum nitrate is further dissolved in the solvent, the total amount of aluminum nitrate dissolved in the solvent being from 0.01 to 0.50 in terms of Al/Ag molar ratio with respect to the total amount of the silver compound. The organic protective agent is, for example, one containing one or more kinds of alkylated PVP and a PVP-PVA graft copolymer.
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公开(公告)号：US20160332234A1
公开(公告)日：2016-11-17
申请号：US15111500
申请日：2015-01-19
Inventor： Jeyadevan BALACHANDRAN , Jhon Lehman Cuya HUAMAN , Daisuke KODAMA
CPC classification number: B22F9/24 , B22F1/0025 , B22F1/0062 , B22F1/0074 , B22F2009/245 , B22F2301/255 , B22F2998/10 , B82Y30/00 , B82Y40/00
Abstract: A production method of silver nanowires exhibits a yield enhancement effect for a protective agent other than PVP. The method for producing silver nanowires includes depositing a silver linear structure, which is referred to as silver nanowires, in an alcohol solvent having a silver compound, a halogen compound, and an organic protective agent dissolved therein. A deposition reaction of silver is performed in a state where aluminum nitrate is further dissolved in the solvent, the total amount of aluminum nitrate dissolved in the solvent being from 0.01 to 0.50 in terms of Al/Ag molar ratio with respect to the total amount of the silver compound. The organic protective agent is, for example, one containing one or more kinds of alkylated PVP and a PVP-PVA graft copolymer.
Abstract translation: 银纳米线的制造方法对PVP以外的保护剂显示出增强效果。 制造银纳米线的方法包括在溶解有银化合物，卤素化合物和有机保护剂的醇溶剂中沉积称为银纳米线的银线性结构。 在硝酸铝进一步溶解于溶剂中的情况下进行银的沉积反应，以Al / Ag摩尔比计，溶解在溶剂中的硝酸铝的总量为0.01〜0.50，相对于 银化合物。 有机保护剂是例如含有一种或多种烷基化PVP和PVP-PVA接枝共聚物的保护剂。
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