CENTRIFUGAL BARREL POLISHING MACHINE AND CENTRIFUGAL BARREL POLISHING METHOD
    2.
    发明申请
    CENTRIFUGAL BARREL POLISHING MACHINE AND CENTRIFUGAL BARREL POLISHING METHOD 有权
    离心式抛光机和离心式抛光方法

    公开(公告)号:US20150038054A1

    公开(公告)日:2015-02-05

    申请号:US14378097

    申请日:2013-02-18

    Applicant: TIPTON CORP.

    CPC classification number: B24B31/033 B24B31/0212 B24B31/0218

    Abstract: Provided is a centrifugal barrel polishing machine capable of maintaining or improving polishing efficiency while increasing polishing amount. The centrifugal barrel polishing machine (10) includes a barrel (12) which is configured to perform planetary rotation and into which workpieces and polishing media are put, thereby polishing the workpieces by the polishing media. A relative centrifugal acceleration F during the planetary rotation of the barrel (12) is set in a range of −2.5(n/N)+12.6≦F≦6.1(n/N)+40.7 where N designates a revolution speed of the barrel (12), n designates a rotation speed of the barrel (12), R designates a radius of an orbital path (15) drawn by a rotation center of the barrel (12), n/N designates a rotation/revolution ratio of the barrel (12), and F=4π2N2R/g designates a relative centrifugal acceleration which is a ratio of a centrifugal acceleration on the orbital path (15) during the planetary rotation of the barrel (12) to gravity acceleration g.

    Abstract translation: 提供一种能够在增加抛光量的同时保持或提高抛光效率的离心式滚筒抛光机。 离心式滚筒抛光机(10)包括一个被配置成执行行星旋转的筒体(12),其中放入了工件和抛光介质,从而通过抛光介质抛光工件。 在筒(12)的行星旋转期间的相对离心加速度F被设定在-2.5(n / N)+ 12.6< lE; F&NlE; 6.1(n / N)+40.7的范围内,其中N表示 桶(12),n表示筒体(12)的转速,R表示由筒体(12)的旋转中心拉出的轨道(15)的半径,n / N表示圆筒 桶(12)和F = 4&pgr; 2N2R / g表示相对离心加速度,其是在筒体(12)的行星旋转期间的轨道(15)上的离心加速度与重力加速度g之比。

    CENTRIFUGAL BARREL POLISHING MACHINE AND CENTRIFUGAL BARREL POLISHING METHOD

    公开(公告)号:US20210229233A1

    公开(公告)日:2021-07-29

    申请号:US17056207

    申请日:2019-06-04

    Applicant: TIPTON CORP.

    Abstract: To detect whether barrel lids are fixed.
    A centrifugal barrel polishing machine (A) includes: a plurality of rotary tanks (50) that rotate planetarily; barrel lids (26) that are attachable to and detachable from the rotary tanks (50); and a plurality of clamp shafts (32) that are provided individually in the plurality of rotary tanks (50) so as to be rotatable integrally with the rotary tanks (50). Each of the clamp shafts (32) is displaceable between in a fixing form for fixing the barrel lid (26) to the rotary tank (50) and in a releasing form for releasing the fixation of the barrel lid (26). It is detected by a first detection means (40) whether the rotary tank (50) is positioned in a detection area (D) on a revolution path of the rotary tank (50), and it is detected by a second detection means (43) whether the clamp shaft (32) of the rotary tank (50) positioned in the detection area (D) is displaced to the fixing form.

    Centrifugal barrel polishing machine and centrifugal barrel polishing method

    公开(公告)号:US12103132B2

    公开(公告)日:2024-10-01

    申请号:US17056207

    申请日:2019-06-04

    Applicant: TIPTON CORP.

    CPC classification number: B24B31/12 B24B31/0218

    Abstract: To detect whether barrel lids are fixed.
    A centrifugal barrel polishing machine (A) includes: a plurality of rotary tanks (50) that rotate planetarily; barrel lids (26) that are attachable to and detachable from the rotary tanks (50); and a plurality of clamp shafts (32) that are provided individually in the plurality of rotary tanks (50) so as to be rotatable integrally with the rotary tanks (50). Each of the clamp shafts (32) is displaceable between in a fixing form for fixing the barrel lid (26) to the rotary tank (50) and in a releasing form for releasing the fixation of the barrel lid (26). It is detected by a first detection means (40) whether the rotary tank (50) is positioned in a detection area (D) on a revolution path of the rotary tank (50), and it is detected by a second detection means (43) whether the clamp shaft (32) of the rotary tank (50) positioned in the detection area (D) is displaced to the fixing form.

    Surface treatment method for metal parts

    公开(公告)号:US10086490B2

    公开(公告)日:2018-10-02

    申请号:US15402615

    申请日:2017-01-10

    Applicant: TIPTON CORP.

    Abstract: A surface treatment method for metal parts includes a polishing step of supplying and discharging a cleaning liquid into and from a barrel tub while mass including a metal part and a medium is caused to flow in the barrel tub, so that a surface of the metal part is polished. The polishing step is carried out at least once. The polishing step includes a final finish polishing process in which a final finish medium which is free from abrasive grain or which consists of a synthetic resin base material and is free from abrasive grain or which is made by binding abrasive grain of not more than 10 wt % and a synthetic resin binding material together and is free from alumina is used as the medium.

    CONTROL METHOD OF COATING DEVICE
    6.
    发明公开

    公开(公告)号:US20240286162A1

    公开(公告)日:2024-08-29

    申请号:US18569151

    申请日:2021-09-24

    Applicant: TIPTON CORP.

    Inventor: Hiroshi SUKA

    CPC classification number: B05C3/08 A23G3/0095 A23G4/025

    Abstract: Provided is a control method of a coating device that can perform coating of coating targets well. The control method of a coating device includes a coating tank (25) which includes a drum (28A) having a cylindrical shape and rotatable, and a disk (38A) having a dish shape and disposed to close a lower end of the drum (28A) and rotatable coaxially with the drum (28A). The method executes a first rotation process of setting a posture of the coating tank (25) in a standing posture in which a rotation axis of the coating tank (25) is directed in a vertical direction, rotating the drum (28A) in one direction, and rotating the disk (38A) in the other direction, and a second rotation process of setting a posture of the coating tank (25) in an inclined posture in which the rotation axis is inclined with respect to the vertical direction and rotating the drum (28A) and the disk (38A) in the one direction.

    Centrifugal barrel polishing machine and centrifugal barrel polishing method
    7.
    发明授权
    Centrifugal barrel polishing machine and centrifugal barrel polishing method 有权
    离心滚筒抛光机和离心滚筒抛光方法

    公开(公告)号:US09283647B2

    公开(公告)日:2016-03-15

    申请号:US14378097

    申请日:2013-02-18

    Applicant: TIPTON CORP.

    CPC classification number: B24B31/033 B24B31/0212 B24B31/0218

    Abstract: A centrifugal barrel polishing machine includes a barrel which is configured to perform planetary rotation and into which workpieces and ceramic polishing media are put, thereby polishing the workpieces by the polishing media. A relative centrifugal acceleration F during the planetary rotation of the barrel is set in a range of 2.1(n/N)+29.5≦F≦6.1(n/N)+40.7 where N designates a revolution speed of the barrel, n designates a rotation speed of the barrel, R designates a radius of an orbital path drawn by a rotation center of the barrel, n/N designates a rotation/revolution ratio of the barrel, and F=4π2N2R/g designates a relative centrifugal acceleration which is a ratio of a centrifugal acceleration on the orbital path during the planetary rotation of the barrel to gravity acceleration g.

    Abstract translation: 离心式滚筒抛光机包括一个被配置为执行行星旋转的筒体,并将工件和陶瓷抛光介质放入其中,从而通过抛光介质抛光工件。 在桶的行星旋转期间的相对离心加速度F设定在2.1(n / N)+ 29.5< ll; F≦̸ 6.1(n / N)+40.7的范围内,其中N表示枪管的转速,n表示 筒的转速R表示由筒的旋转中心拉出的轨道的半径,n / N表示筒的旋转/转速,F = 4&pgr; 2N2R / g表示相对离心加速度 其是在筒的行星旋转期间的轨道上的离心加速度与重力加速度g之间的比率。

    SURFACE TREATMENT METHOD FOR METAL PARTS
    8.
    发明申请

    公开(公告)号:US20170259393A1

    公开(公告)日:2017-09-14

    申请号:US15402615

    申请日:2017-01-10

    Applicant: TIPTON CORP.

    CPC classification number: B24B31/02 B24B1/04 B24B57/02

    Abstract: A surface treatment method for metal parts includes a polishing step of supplying and discharging a cleaning liquid into and from a barrel tub while mass including a metal part and a medium is caused to flow in the barrel tub, so that a surface of the metal part is polished. The polishing step is carried out at least once. The polishing step includes a final finish polishing process in which a final finish medium which is free from abrasive grain or which consists of a synthetic resin base material and is free from abrasive grain or which is made by binding abrasive grain of not more than 10 wt % and a synthetic resin binding material together and is free from alumina is used as the medium.

Patent Agency Ranking