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1.发明授权公开(公告)号：US08351020B2
公开(公告)日：2013-01-08
申请号：US12626581
申请日：2009-11-25
Applicant: Torbjorn Sandstrom
Inventor： Torbjorn Sandstrom
CPC classification number: G06K17/00 , G02B3/0037 , G02B5/003 , G02B26/0833 , G03F7/70291
Abstract: The current invention relates to writing or reading a pattern on a surface, such as in microlithography or inspection of mircrolithographic patterns. In particular, Applicant discloses systems recording or reading images by scanning sparse 2D point arrays or grids across the surface, e.g., multiple optical, electron or particle beams modulated in parallel. The scanning and repeated reading or writing creates a dense pixel or spot grid on the workpiece. The grid may be created by various arrays: arrays of light sources, e.g., laser or LED arrays, by lenslet arrays where each lenslet has its own modulator, by aperture plates for particle beams, or arrays of near-field emitters or mechanical probes. For reading systems, the point grid may be created by a sparse point matrix illumination and/or a detector array where each detector element sees only one spot. The idea behind the use of large arrays is to improve throughput. However, the throughput does not scale with the array size, since above a certain size of arrays, previously known schemes fall into in their own tracks and start repeating the same data over and over again. This application discloses methods to scan workpieces with large arrays while preserving the scaling of throughput proportional to array size, even for very large arrays, in fact essentially without limits.
Abstract translation: 本发明涉及在表面上书写或读取图案，例如在微光刻或微轨迹图案的检查中。 特别地，申请人公开了通过扫描表面上的稀疏2D点阵列或网格来记录或读取图像的系统，例如并行调制的多个光学，电子或粒子束。 扫描和重复的读取或写入会在工件上创建一个密集的像素或斑点。 栅格可以由各种阵列：诸如激光或LED阵列的光源阵列，其中每个小透镜具有其自身调制器的微透镜阵列，用于粒子束的孔板或近场发射器或机械探针的阵列。 对于读取系统，点网格可以由稀疏点矩阵照明和/或检测器阵列创建，其中每个检测器元件仅看到一个点。 使用大型阵列的理念是提高吞吐量。 然而，吞吐量并不随着阵列大小而变化，因为上面的一定数量的阵列，先前已知的方案落入自己的轨道中，并重复地重复相同的数据。 该申请公开了用于扫描具有大阵列的工件的方法，同时保持与阵列尺寸成比例的吞吐量的缩放，即使对于非常大的阵列，实际上基本上没有限制。
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公开(公告)号：US08077377B2
公开(公告)日：2011-12-13
申请号：US12430046
申请日：2009-04-24
Applicant: Torbjorn Sandstrom
Inventor： Torbjorn Sandstrom
CPC classification number: G03F7/70291 , G02B5/1809 , G02B5/1861 , G02B26/06 , G02B26/0808 , G02B26/0841
Abstract: The invention relates to methods to improve SLMs, in particular to reflecting micromechanical SLMs, for applications with simple system architecture, high precision, high power handling capability, high throughput, and/or high optical processing capability. Applications include optical data processing, image projection, lithography, image enhancement, holography, optical metrology, coherence and wavefront control, and adaptive optics. A particular aspect of the invention is the achromatization of diffractive SLMs so they can be used with multiple wavelengths sequentially, simultaneously or as a result of spectral broadening in very short pulses.
Abstract translation: 本发明涉及用于改进SLM的方法，特别是用于反映微机械SLM，用于具有简单的系统架构，高精度，高功率处理能力，高吞吐量和/或高光学处理能力的应用。 应用包括光学数据处理，图像投影，光刻，图像增强，全息，光学测量，相干和波前控制以及自适应光学。 本发明的一个特定方面是衍射SLM的消色差，因此它们可以以多个波长顺序地，同时使用，或者作为非常短的脉冲中的光谱扩展的结果。
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公开(公告)号：US07957055B2
公开(公告)日：2011-06-07
申请号：US12662675
申请日：2010-04-28
Applicant: Torbjorn Sandstrom
Inventor： Torbjorn Sandstrom
CPC classification number: G03F7/70725 , B23K26/032 , B23K26/064 , B23K26/0648 , B41J2/465 , G02B26/0833 , G02B26/0841 , G02B27/0043 , G02B27/4205 , G03F7/2022 , G03F7/70041 , G03F7/70283 , G03F7/70291 , G03F7/704 , G03F7/70475 , G09G3/2007 , G09G3/346 , H04N1/195 , H04N5/7458 , H04N2201/0414
Abstract: The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modulating elements (pixels), adapted to being illuminated by the radiation, and a projection system creating an image of the modulator on the workpiece. It may further include an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting the pattern to modulator signals, and feeding the signals to the modulator. An electronic control system may be provided to control a trigger signal to compensate for flash-to-flash time jitter in the light source.
Abstract translation: 本发明涉及一种用于在对辐射敏感的工件上形成图案的装置，例如光掩模，显示面板或微光学装置。 该装置可以包括用于发出闪光的源，具有适于被辐射照射的调制元件（像素）的空间调制器以及在工件上产生调制器的图像的投影系统。 它还可以包括接收要写入的模式的数字描述的电子数据处理和传送系统，将模式转换成调制器信号，以及将信号馈送到调制器。 可以提供电子控制系统来控制触发信号以补偿光源中的闪光到闪光时间抖动。
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公开(公告)号：US07842525B2
公开(公告)日：2010-11-30
申请号：US11980432
申请日：2007-10-31
Applicant: Torbjorn Sandstrom
Inventor： Torbjorn Sandstrom
IPC: H01L29/06
CPC classification number: G03F7/70541 , G03B27/44 , G03F7/70291 , G03F7/7045 , G03F7/70466 , G03F7/70575 , H01L22/34 , H01L23/544 , H01L23/57 , H01L2223/5444 , H01L2924/0002 , H01L2924/00
Abstract: A system for making small modifications to the pattern in standard processed semiconductor devices. The modifications are made to create a small variable part of the pattern against a large constant part of the same pattern. In a preferred embodiment the exposure of the variable and constant parts are done with the same wavelength in the same combined stepper and code-writer. The invention devices a way of writing variable parts of the chip that is automatic, inexpensive and risk-free. A system for automatic design and production of die-unique patterns is also shown.
Abstract translation: 用于对标准处理的半导体器件中的图案进行小的修改的系统。 进行修改以针对相同图案的大常数部分创建图案的小变量部分。 在优选实施例中，可变和恒定部分的曝光在相同的组合步进器和代码写入器中以相同的波长进行。 本发明设备以自动，廉价和无风险的方式编写芯片的可变部分。 还显示了一种用于自动设计和生产模具独特图案的系统。
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公开(公告)号：US07710634B2
公开(公告)日：2010-05-04
申请号：US12320713
申请日：2009-02-03
Applicant: Torbjorn Sandstrom
Inventor： Torbjorn Sandstrom
CPC classification number: G03F7/70725 , B23K26/032 , B23K26/064 , B23K26/0648 , B41J2/465 , G02B26/0833 , G02B26/0841 , G02B27/0043 , G02B27/4205 , G03F7/2022 , G03F7/70041 , G03F7/70283 , G03F7/70291 , G03F7/704 , G03F7/70475 , G09G3/2007 , G09G3/346 , H04N1/195 , H04N5/7458 , H04N2201/0414
Abstract: The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modulating elements (pixels), adapted to being illuminated by the radiation, and a projection system creating an image of the modulator on the workpiece. It may further include an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting the pattern to modulator signals, and feeding the signals to the modulator. An electronic control system may be provided to control a trigger signal to compensate for flash-to-flash time jitter in the light source.
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Patent Agency Ranking
公开(公告)号：US20090213354A1
公开(公告)日：2009-08-27
申请号：US12063228
申请日：2006-08-08
Applicant: Torbjorn Sandstrom , Igor Ivonin
Inventor： Torbjorn Sandstrom , Igor Ivonin
CPC classification number: G03F7/70291 , G03F7/701 , G03F7/70308 , G03F7/70566
Abstract: A method, apparatus for and a device manufactured by the same, for printing a microlithographic pattern with high fidelity and resolution using simultaneously optimized illuminator and pupil filters having semi-continuous transmission profiles. The optimization can be further improved if the illuminator and pupil filters are polarization selective. The optimization method becomes a linear programming problem and uses a set of relevant features in the merit function. With a suitably chosen merit function and a representative feature set both neutral printing without long-range proximity effects and good resolution of small features can be achieved. With only short-range proximity effects OPC correction is simple and can be done in real time using a perturbation method.
Abstract translation: 一种用于使用其制造的方法，装置和装置，用于使用具有半连续透射轮廓的同时优化的照明器和瞳孔滤光器，以高保真度和分辨率打印微光刻图案。 如果照明器和光瞳滤光器是偏振选择的，则可以进一步改善优化。 优化方法成为线性规划问题，并在优值函数中使用一组相关特征。 通过适当选择的优点功能和具有代表性的特征，可以实现不具有远距离邻近效应的中性打印和小特征的良好分辨率。 只有短距离邻近效应OPC校正很简单，可以使用扰动方法实时完成。
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公开(公告)号：US07444616B2
公开(公告)日：2008-10-28
申请号：US10827530
申请日：2004-04-20
Applicant: Torbjorn Sandstrom , Peter Ekberg
Inventor： Torbjorn Sandstrom , Peter Ekberg
CPC classification number: G03F7/70783 , G03F1/70 , G03F7/704 , G03F7/70425 , G03F7/70433 , G03F7/705 , G03F7/706 , G03F7/70616 , G03F7/70625
Abstract: The present invention relates to a method and a system for predicting and/or measuring and correcting geometrical errors in lithography using masks, such as large-area photomasks or reticles, and exposure stations, such as wafer steppers or projection aligners, printing the pattern of said masks on a workpiece, such as a display panel or a semiconductor wafer. A method to compensate for process variations when printing a pattern on a workpiece, including determining a two-dimensional CD profile in said pattern printed on said workpiece, generating a two-dimensional compensation file to equalize fluctuations in said two-dimensional CD-profile, and patterning a workpiece with said two-dimensional compensation file.
Abstract translation: 本发明涉及一种用于使用诸如大面积光掩模或掩模版的掩模和诸如晶片步进器或投影对准器的曝光站来预测和/或测量和校正光刻中的几何误差的方法和系统， 所述掩模在诸如显示面板或半导体晶片的工件上。 一种在工件上印刷图案时补偿工艺变化的方法，包括确定印刷在所述工件上的所述图案中的二维CD轮廓，产生二维补偿文件以均衡所述二维CD轮廓中的波动， 并用所述二维补偿文件图案化工件。
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公开(公告)号：US20080244371A1
公开(公告)日：2008-10-02
申请号：US12115410
申请日：2008-05-05
Applicant: Torbjorn Sandstrom , Leif Odselius , Martin Olsson
Inventor： Torbjorn Sandstrom , Leif Odselius , Martin Olsson
CPC classification number: H04N5/7458
Abstract: The present invention relates to high speed datapaths, sometimes including mixed digital and analog voltage signals. In particular, it relates to error checking strategies for large data volumes, in digital and/or analog domains and to analog signal patterns that accelerate charge loading of micromirrors in an SLM. Particular aspects of the present invention are described in the claims, specification and drawings.
Abstract translation: 本发明涉及高速数据通路，有时包括混合的数字和模拟电压信号。 特别地，它涉及用于在数字和/或模拟域中的大数据量的错误检查策略以及加速SLM中的微镜的电荷负载的模拟信号模式。 在权利要求书，说明书和附图中描述了本发明的特定方面。
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公开(公告)号：US20080062389A1
公开(公告)日：2008-03-13
申请号：US11980432
申请日：2007-10-31
Applicant: Torbjorn Sandstrom
Inventor： Torbjorn Sandstrom
CPC classification number: G03F7/70541 , G03B27/44 , G03F7/70291 , G03F7/7045 , G03F7/70466 , G03F7/70575 , H01L22/34 , H01L23/544 , H01L23/57 , H01L2223/5444 , H01L2924/0002 , H01L2924/00
Abstract: A system for making small modifications to the pattern in standard processed semiconductor devices. The modifications are made to create a small variable part of the pattern against a large constant part of the same pattern. In a preferred embodiment the exposure of the variable and constant parts are done with the same wavelength in the same combined stepper and code-writer. The invention devices a way of writing variable parts of the chip that is automatic, inexpensive and risk-free. A system for automatic design and production of die-unique patterns is also shown.
Abstract translation: 用于对标准处理的半导体器件中的图案进行小的修改的系统。 进行修改以针对相同图案的大常数部分创建图案的小变量部分。 在优选实施例中，可变和恒定部分的曝光在相同的组合步进器和代码写入器中以相同的波长进行。 本发明设备以自动，廉价和无风险的方式编写芯片的可变部分。 还显示了一种用于自动设计和生产模具独特图案的系统。
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10.发明申请Platforms, apparatuses, systems and methods for processing and analyzing substrates 有权用于处理和分析基板的平台，设备，系统和方法公开(公告)号：US20080032066A1
公开(公告)日：2008-02-07
申请号：US11711895
申请日：2007-02-28
Applicant: Lars Stiblert , Torbjorn Sandstrom , Jarek Luberek , Tomas Lock
Inventor： Lars Stiblert , Torbjorn Sandstrom , Jarek Luberek , Tomas Lock
CPC classification number: G03F7/704 , G03F7/70391 , Y10T29/497 , Y10T29/4976 , Y10T29/49998 , Y10T29/534 , Y10T29/53961
Abstract: Devices and methods for manufacturing displays, solar panels and other devices using larger size workpieces are provided. The workpiece is rolled into a cylinder, thereby reducing the physical size by a factor of 3 in one dimension. The stages on which the workpieces are rolled have a cylindrical shape, which allows a more robust and/or compact movement of the glass, reduced machine weight. The workpieces are relatively thin, more flexible, and are rolled onto a cylinder with a diameter of about 1 meter.
Abstract translation: 提供用于制造显示器，太阳能电池板和使用较大尺寸工件的其它装置的装置和方法。 工件滚动成圆柱体，从而在一个维度上将物理尺寸减小了3倍。 工件被轧制的阶段具有圆柱形形状，这允许玻璃更坚固和/或紧凑的移动，减小了机器重量。 工件相对较薄，更灵活，并滚动到直径约1米的圆柱体上。
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