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    Surface structured articles and methods of making the same
    2.
    发明授权
    Surface structured articles and methods of making the same 有权

    公开(公告)号：US11111395B2

    公开(公告)日：2021-09-07

    申请号：US16471873

    申请日：2017-12-19

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Timothy J. Hebrink ,  Rachael A. T. Gould ,  Moses M. David ,  Rebecca L. A. Everman ,  Simon K. Shannon ,  Ta-Hua Yu

    IPC: C09D5/16 ,  A01N59/20

    Abstract: Surface structured articles comprising a polymer matrix and a dispersed phase, the article having first and second opposed major surfaces, at least a portion of the first major surface is a microstructured, anisotropic surface comprises features having at least one dimension in a range from 1 micrometer to 500 micrometers, wherein the dispersed phase comprises an antimicrobial material, and wherein at least a portion of the dispersed phase is present on the microstructured, anisotropic surface. Surface structured articles are useful, for example, for marine applications (e.g., surfaces in contact with water (e.g., fresh water, ocean water)) such as boats, ships, piers, oil rigs, decks, and roofing materials.

    NONPLANAR PATTERNED NANOSTRUCTURED SURFACE AND PRINTING METHODS FOR MAKING THEREOF
    4.
    发明申请
    NONPLANAR PATTERNED NANOSTRUCTURED SURFACE AND PRINTING METHODS FOR MAKING THEREOF 有权

    公开(公告)号：US20210094272A1

    公开(公告)日：2021-04-01

    申请号：US15733300

    申请日：2018-12-26

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： James Zhu ,  Karl K. Stensvad ,  Daniel M. Lentz ,  Thomas J. Metzler ,  Moses M. David

    IPC: B41C1/00 ,  B81C1/00 ,  B41C1/18 ,  B41K3/26

    Abstract: A method of applying a pattern to a nonplanar surface. A stamp has a major surface with pattern elements having a lateral dimension of greater than 0 and less than about 5 microns. The major surface of the stamp has a functionalizing molecule with a functional group selected to chemically bind to the nonplanar surface. The stamp is positioned to initiate rolling contact with the nonplanar surface, and contacts the nonplanar surface to form a self-assembled monolayer (SAM) of the functionalizing material thereon and impart the arrangement of pattern elements thereto. The major surface of the stamp is translated with respect to the nonplanar surface such that: a contact pressure is controlled at an interface between the stamping surfaces and the nonplanar surface, and a contact force at the interface is allowed to vary while the stamping surfaces and the nonplanar surface are in contact with each other.

    COMPOSITE MEMBRANES WITH IMPROVED PERFORMANCE AND/OR DURABILITY AND METHODS OF USE
    7.
    发明申请
    COMPOSITE MEMBRANES WITH IMPROVED PERFORMANCE AND/OR DURABILITY AND METHODS OF USE 审中-公开

    公开(公告)号：US20200164319A1

    公开(公告)日：2020-05-28

    申请号：US16638167

    申请日：2018-08-14

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Jinsheng Zhou ,  Ryan C. Shirk ,  David Scott Seitz ,  Moses M. David

    IPC: B01D69/12 ,  B01D69/10 ,  B01D61/36

    Abstract: A composite membrane for selectively separating (e.g., pervaporating) a first fluid (e.g., first liquid such as a high octane compound) from a mixture comprising the first fluid (e.g., first liquid such as a high octane compound) and a second fluid (e.g., second liquid such as gasoline). The composite membrane includes a porous substrate comprising opposite first and second major surfaces, and a plurality of pores. A pore-filling polymer is disposed in at least some of the pores so as to form a layer having a thickness within the porous substrate. The composite membrane further includes at least one of: (a) an ionic liquid mixed with the pore-filling polymer; or (b) an amorphous fluorochemical film disposed on the composite membrane.

    Polishing pads and systems and methods of making and using the same
    9.
    发明授权
    Polishing pads and systems and methods of making and using the same 有权

    公开(公告)号：US10252396B2

    公开(公告)日：2019-04-09

    申请号：US15129639

    申请日：2015-03-31

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Duy K. Lehuu ,  Kenneth A. P. Meyer ,  Moses M. David

    IPC: B24B7/22 ,  B24B37/22 ,  B24B37/26 ,  B24B37/24 ,  B24B7/24

    Abstract: The present disclosure relates to polishing pads which include a polishing layer, wherein the polishing layer includes a working surface and a second surface opposite the working surface. The working surface includes at least one of a plurality of precisely shaped pores and a plurality of precisely shaped asperities. The present disclosure further relates to a polishing system, the polishing system includes the preceding polishing pad and a polishing solution. The present disclosure relates to a method of polishing a substrate, the method of polishing including: providing a polishing pad according to any one of the previous polishing pads; providing a substrate, contacting the working surface of the polishing pad with the substrate surface, moving the polishing pad and the substrate relative to one another while maintaining contact between the working surface of the polishing pad and the substrate surface, wherein polishing is conducted in the presence of a polishing solution.

    Method of making a nanostructure and nanostructured articles
    10.
    发明授权
    Method of making a nanostructure and nanostructured articles 有权

    公开(公告)号：US10134566B2

    公开(公告)日：2018-11-20

    申请号：US14895693

    申请日：2014-07-23

    Applicant: 3M INNOVATIVE PROPERTIES COMPANY

    Inventor： Moses M. David ,  Ta-Hua Yu ,  Daniel S. Bates ,  Jayshree Seth ,  Michael S. Berger ,  Carsten Franke ,  Sebastian F. Zehentmaier

    IPC: B32B3/20 ,  H01J37/32 ,  G09B19/00

    Abstract: A method of making a nanostructure and nanostructured articles by depositing a layer to a major surface of a substrate by plasma chemical vapor deposition from a gaseous mixture while substantially simultaneously etching the surface with a reactive species. The method includes providing a substrate; mixing a first gaseous species capable of depositing a layer onto the substrate when formed into a plasma, with a second gaseous species capable of etching the substrate when formed into a plasma, thereby forming a gaseous mixture; forming the gaseous mixture into a plasma; and exposing a surface of the substrate to the plasma, wherein the surface is etched and a layer is deposited on at least a portion of the etched surface substantially simultaneously, thereby forming the nanostructure. The substrate can be a (co)polymeric material, an inorganic material, an alloy, a solid solution, or a combination thereof. The deposited layer can include the reaction product of plasma chemical vapor deposition using a reactant gas comprising a compound selected from the group consisting of organosilicon compounds, metal alkyl compounds, meal isopropoxide compounds, metal acetylacetonate compounds, metal halide compounds, and combinations thereof. Nanostructures of high aspect ratio and optionally with random dimensions in at least one dimension and preferably in three orthogonal dimensions can be prepared.

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