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公开(公告)号:US10851246B2
公开(公告)日:2020-12-01
申请号:US16715204
申请日:2019-12-16
Applicant: ADMATECHS CO., LTD.
Inventor: Yusuke Watanabe , Nobutaka Tomita , Yoshiaki Kato
Abstract: A production method for an electronic material filler includes: a preparation step of preparing a silica particle material produced by a dry method; and a first surface treatment step of performing surface treatment on the silica particle material with a silane compound having a vinyl group, a phenyl group, a phenylamino group, an alkyl group having four or more carbon atoms, a methacryl group, or an epoxy group, to obtain a first surface treatment-processed particle material. After the silica particle material is produced by the dry method, the silica particle material is not brought into contact with liquid water, and has a particle diameter of 100 nm to 600 nm or a specific surface area of 5 m2/g to 35 m2/g.
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公开(公告)号:US10981835B2
公开(公告)日:2021-04-20
申请号:US16822176
申请日:2020-03-18
Applicant: ADMATECHS CO., LTD.
Inventor: Kimitoshi Sato , Yusuke Watanabe , Nobutaka Tomita , Akihiko Suda , Tatsuo Fukano
IPC: C04B35/56 , H01M4/1393 , H01M4/583 , C04B35/626
Abstract: A particulate material with a composition expressed by MaAlbXc in which “M” includes one or more elements selected from the group consisting of Ti, V, Cr, Zr, Nb, Mo, Hf and Ta and “X” includes C or one or more chemical structures selected from the group consisting of C(1.0−x)Nx (where “x” is 0
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公开(公告)号:US20200255343A1
公开(公告)日:2020-08-13
申请号:US16822161
申请日:2020-03-18
Applicant: ADMATECHS CO., LTD.
Inventor: Kimitoshi SATO , Yusuke Watanabe , Nobutaka Tomita , Akihiko Suda , Tatsuo Fukano
IPC: C04B35/56 , H01M4/583 , C04B35/626 , H01M10/0525
Abstract: A particulate material with a composition expressed by Ti2Alx (C(1-y)Ny)z (where “x” is more than 0.02, “y” is 0
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公开(公告)号:US12187903B2
公开(公告)日:2025-01-07
申请号:US17953430
申请日:2022-09-27
Applicant: ADMATECHS CO., LTD.
Inventor: Kenta Takei , Yusuke Watanabe , Nobutaka Tomita
Abstract: A particle material that has high dispersibility in a dispersion medium such as toluene having high hydrophobicity, and a slurry composition in which the particle material is used, are provided for solving the problem. A surface-modified particle material of the present invention includes: a particle material formed of an inorganic material; and a surface treatment agent formed of a silane compound having a first functional group that has any of C, N, and O atoms away over five or more atoms from Si to which an alkoxide is bound, the surface treatment agent allowing surface treatment of the particle material in such an amount that a degree of hydrophobicity becomes not less than 30%. Dispersibility is enhanced also in a dispersion medium having high hydrophobicity in a case where a functional group having a predetermined structure is introduced so as to impart predetermined or higher hydrophobicity.
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公开(公告)号:US11001714B2
公开(公告)日:2021-05-11
申请号:US16715185
申请日:2019-12-16
Applicant: ADMATECHS CO., LTD.
Inventor: Yusuke Watanabe , Nobutaka Tomita , Yoshiaki Kato
Abstract: A production method for an electronic material filler includes: a preparation step of preparing a silica particle material produced by a dry method; and a first surface treatment step of performing surface treatment on the silica particle material with a silane compound having a vinyl group, a phenyl group, a phenylamino group, an alkyl group having four or more carbon atoms, a methacryl group, or an epoxy group, to obtain a first surface treatment-processed particle material. After the silica particle material is produced by the dry method, the silica particle material is not brought into contact with liquid water, and has a particle diameter of 100 nm to 600 nm or a specific surface area of 5 m2/g to 35 m2/g.
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公开(公告)号:US10947161B2
公开(公告)日:2021-03-16
申请号:US16822161
申请日:2020-03-18
Applicant: ADMATECHS CO., LTD.
Inventor: Kimitoshi Sato , Yusuke Watanabe , Nobutaka Tomita , Akihiko Suda , Tatsuo Fukano
IPC: C04B35/56 , H01M10/0525 , H01M4/583 , C04B35/626 , H01M4/02
Abstract: A particulate material with a composition expressed by Ti2Alx(C(1-y)Ny)z (where “x” is more than 0.02, “y” is 0
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