公开(公告)号：US20170272864A1

公开(公告)日：2017-09-21

申请号：US15464077

申请日：2017-03-20

Applicant: APPLE INC.

Inventor： Wai Man Raymund Kwok ,  Melissa Wah

IPC: H04R9/02 ,  H04R9/06 ,  H01F7/02

Abstract: Embodiments of the disclosure pertain to methods of plating magnets with a stack of layers such that the resulting magnet assembly has improved corrosion resistance. Embodiments of the disclosure are also directed to magnet assemblies formed by such methods. Some embodiments include a High Phosphorus Electroless Nickel (HiPEN) layer with Phosphorus content greater than 11% by weight.

公开(公告)号：US10553352B2

公开(公告)日：2020-02-04

申请号：US15464077

申请日：2017-03-20

Applicant: APPLE INC.

Inventor： Wai Man Raymund Kwok ,  Melissa Wah

IPC: H01F41/02 ,  H04R9/06 ,  H01F7/02 ,  H04R9/02 ,  H01F27/23

Abstract: Embodiments of the disclosure pertain to methods of plating magnets with a stack of layers such that the resulting magnet assembly has improved corrosion resistance. Embodiments of the disclosure are also directed to magnet assemblies formed by such methods. Some embodiments include a High Phosphorus Electroless Nickel (HiPEN) layer with Phosphorus content greater than 11% by weight.