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Patent Agency Ranking
公开(公告)号：US10553397B2
公开(公告)日：2020-02-04
申请号：US16365424
申请日：2019-03-26
Applicant: Applied Materials, Inc.
Inventor： Sathyendra K. Ghantasala , Vijayakumar C. Venugopal , Hyun-Ho Doh
Abstract: A method of assigning faults to a processing chamber is described. Some embodiments include applying a radio frequency (RF) signal to a processing chamber to stimulate resonance in the chamber, measuring resonances of the applied RF signal in the chamber, extracting a fingerprint from the measured resonances, comparing the extracted fingerprint to a library of fingerprints, assigning a similarity index to combinations of the extracted fingerprint with at least one fingerprint in the fingerprint library, comparing each similarity index to a threshold, and if the similarity is greater than a threshold, then assigning a fault to the processing chamber using the library fingerprint.
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公开(公告)号：US10283320B2
公开(公告)日：2019-05-07
申请号：US15349139
申请日：2016-11-11
Applicant: APPLIED MATERIALS, INC.
Inventor： Sathyendra K. Ghantasala , Vijayakumar C. Venugopal , Hyun-Ho Doh
Abstract: A method of assigning faults to a processing chamber is described. Some embodiments include applying a radio frequency (RF) signal to a processing chamber to stimulate resonance in the chamber, measuring resonances of the applied RF signal in the chamber, extracting a fingerprint from the measured resonances, comparing the extracted fingerprint to a library of fingerprints, assigning a similarity index to combinations of the extracted fingerprint with at least one fingerprint in the fingerprint library, comparing each similarity index to a threshold, and if the similarity is greater than a threshold, then assigning a fault to the processing chamber using the library fingerprint.
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公开(公告)号：US10607815B2
公开(公告)日：2020-03-31
申请号：US16023963
申请日：2018-06-29
Applicant: Applied Materials, Inc.
Inventor： Sathyendra Ghantasala , Hyun-Ho Doh , Vijayakumar C. Venugopal
Abstract: Methods of operating and assembling a plasma chamber are disclosed. An operating method includes tuning a match network of a plasma chamber while running a non-plasma discharge recipe. A hardware impedance of the plasma chamber is calculated from the match network settings from the tuning. A match loss for the plasma chamber is also calculated according to match network settings. A radio frequency (RF) power setting for the first plasma chamber is set according to the calculated hardware impedance and the calculated match loss. Such methods can be utilized to provide chamber-to-chamber performance matching across different plasma chambers. Certain disclosed methods of operating the plasma chamber can be utilized to identify hardware faults during operation and/or assembly processes.
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公开(公告)号：US20180138015A1
公开(公告)日：2018-05-17
申请号：US15349139
申请日：2016-11-11
Applicant: APPLIED MATERIALS, INC.
Inventor： Sathyendra K. Ghantasala , Vijayakumar C. Venugopal , Hyun-Ho Doh
CPC classification number: H01J37/32082 , G01R27/04 , H01J37/32935 , H01J2237/334
Abstract: A method of assigning faults to a processing chamber is described. Some embodiments include applying a radio frequency (RF) signal to a processing chamber to stimulate resonance in the chamber, measuring resonances of the applied RF signal in the chamber, extracting a fingerprint from the measured resonances, comparing the extracted fingerprint to a library of fingerprints, assigning a similarity index to combinations of the extracted fingerprint with at least one fingerprint in the fingerprint library, comparing each similarity index to a threshold, and if the similarity is greater than a threshold, then assigning a fault to the processing chamber using the library fingerprint.
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公开(公告)号：US20190221401A1
公开(公告)日：2019-07-18
申请号：US16365424
申请日：2019-03-26
Applicant: Applied Materials, Inc.
Inventor： Sathyendra K. Ghantasala , Vijayakumar C. Venugopal , Hyun-Ho Doh
CPC classification number: H01J37/32082 , G01R27/04 , H01J37/32935 , H01J2237/334
Abstract: A method of assigning faults to a processing chamber is described. Some embodiments include applying a radio frequency (RF) signal to a processing chamber to stimulate resonance in the chamber, measuring resonances of the applied RF signal in the chamber, extracting a fingerprint from the measured resonances, comparing the extracted fingerprint to a library of fingerprints, assigning a similarity index to combinations of the extracted fingerprint with at least one fingerprint in the fingerprint library, comparing each similarity index to a threshold, and if the similarity is greater than a threshold, then assigning a fault to the processing chamber using the library fingerprint.
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