Abstract:
A system that may include a mechanical stage that is arranged to move an object along a predetermined path in relation to an optical module during an illumination of the object by the optical module; a structural support element that is arranged to support at least a part of the optical module; a gas flow module that is arranged to direct clean gas towards the object through gas flow module openings that define a coverage area that is (a) bigger than the object and (b) is positioned directly above at least a majority of the object when the object is positioned anywhere along the predetermined path.
Abstract:
Chamber elements defining a chamber include a first element having a first surface, a second element, a first dynamic seal and load mechanism. The second element includes an outer floating element that includes a second surface about the periphery of the chamber, and an inner floating element. The second surface and the first surface are maintained proximate to each other when the chamber is in a load position and when the chamber is closed. The load mechanism may move the inner floating element from the outer floating element until a gap between the inner floating element and the second element to facilitate loading of the device to the chamber. A movement system may generate relative movement between the first element and the second element.
Abstract:
A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.
Abstract:
According to an embodiment of the invention, there is provided a system, comprising: a first chamber; a second chamber; a chuck; a movement system; wherein the first chamber comprises: a first element that has a first surface; a first chamber housing that comprises a second surface; wherein the first surface and the second surface come into proximity with each other at a first interface; a supporting element for supporting the chuck when the chuck is positioned within the first chamber; and a first dynamic seal formed at the first interface and is arranged to seal the first chamber from the movement system; wherein the second chamber comprises: a second chamber housing; a movement system that is arranged to introduce movement between (a) the first chamber housing and (b) the first element and the chuck; and a movement control element for mechanically coupling the first element to the movement system.
Abstract:
A system for coupling a mask to a mask holder. The system includes a base, an aperture; mask holder cover supporting elements arranged to move between a first position and a third position while supporting the mask holder cover; mask supporting elements arranged to move between a fourth position and a sixth position while supporting the mask; mask holder base supporting elements arranged to support the mask holder base. When the mask holder cover supporting elements are at the first position and the mask supporting elements are at the third position the mask holder cover, the mask and the base are spaced apart from each other. When the mask holder cover supporting elements are at the third position and the mask supporting elements are at the sixth position the mask holder cover, the mask and the base are connected to each other.
Abstract:
A system that may include a mechanical stage that is arranged to move an object along a predetermined path in relation to an optical module during an illumination of the object by the optical module; a structural support element that is arranged to support at least a part of the optical module; a gas flow module that is arranged to direct clean gas towards the object through gas flow module openings that define a coverage area that is (a) bigger than the object and (b) is positioned directly above at least a majority of the object when the object is positioned anywhere along the predetermined path.
Abstract:
According to an embodiment of the invention, there is provided a slit valve, comprising: a first slit valve portion having a first window therethrough, the first window is sized to permit passage of an object through the first window; wherein the first window is surrounded by a first area of the first slit valve portion; a second slit valve portion that comprises a first sealing element and a first positioning module; wherein the first positioning module is arranged to move the first sealing element in relation to the first window; wherein at least one slit valve portion of the first and second slit valve portions comprises at least one first gas opening for emitting pressurized gas so as to assist in a creation of a first gas cushion between the first area and the first sealing element when the first sealing element is placed adjacent to the first window thus creating a seal between the first and second slit valve portions.
Abstract:
Chamber elements defining a chamber include a first element having a first surface, a second element, a first dynamic seal and load mechanism. The second element includes an outer floating element that includes a second surface about the periphery of the chamber, and an inner floating element. The second surface and the first surface are maintained proximate to each other when the chamber is in a load position and when the chamber is closed. The load mechanism may move the inner floating element from the outer floating element until a gap between the inner floating element and the second element to facilitate loading of the device to the chamber. A movement system may generate relative movement between the first element and the second element.
Abstract:
A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.
Abstract:
A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.