公开(公告)号：US20240209501A1

公开(公告)日：2024-06-27

申请号：US18596144

申请日：2024-03-05

Applicant: ASM IP Holding B.V.

Inventor： Mohith Verghese ,  Eric James Shero ,  Carl Louis White ,  Kyle Fondurulia ,  Herbert Terhorst

IPC: C23C16/448 ,  C23C16/455

CPC classification number: C23C16/4481 ,  C23C16/45544

Abstract: Herein disclosed are systems and methods related to solid source chemical vaporizer vessels and multiple chamber deposition modules. In some embodiments, a solid source chemical vaporizer includes a housing base and a housing lid. Some embodiments also include a first and second tray configured to be housed within the housing base, wherein each tray defines a first serpentine path adapted to hold solid source chemical and allow gas flow thereover. In some embodiments, a multiple chamber deposition module includes first and second vapor phase reaction chambers and a solid source chemical vaporizer vessel to supply each of the first and second vapor phase reaction chambers.

公开(公告)号：US11939673B2

公开(公告)日：2024-03-26

申请号：US17189591

申请日：2021-03-02

Applicant: ASM IP Holding B.V.

Inventor： John Kevin Shugrue ,  Carl Louis White

IPC: C23C16/455 ,  C23C16/505 ,  G01J3/443 ,  G01N21/68 ,  H01J37/32 ,  G01N21/15

CPC classification number: C23C16/45536 ,  C23C16/45544 ,  C23C16/505 ,  G01J3/443 ,  G01N21/68 ,  H01J37/3244 ,  H01J37/32972 ,  G01N21/15 ,  G01N2201/08 ,  H01J2237/24485 ,  H01J2237/24507

Abstract: An apparatus and method are disclosed for monitoring and/or detecting concentrations of a chemical precursor in a reaction chamber. The apparatus and method have an advantage of operating in a high temperature environment. An optical emissions spectrometer (OES) is coupled to a gas source, such as a solid source vessel, in order to monitor or detect an output of the chemical precursor to the reaction chamber. Alternatively, a small sample of precursor can be periodically monitored flowing into the OES and into a vacuum pump, thus bypassing the reaction chamber.

公开(公告)号：US11377732B2

公开(公告)日：2022-07-05

申请号：US16926493

申请日：2020-07-10

Applicant: ASM IP Holding B.V.

Inventor： Mohith Verghese ,  Eric James Shero ,  Carl Louis White ,  Kyle Fondurulia

IPC: C23C16/448

Abstract: Herein disclosed are systems and methods related to solid source chemical vaporizer vessels and multiple chamber deposition modules. In some embodiments, a solid source chemical vaporizer includes a housing base and a housing lid. Some embodiments also include a first and second tray configured to be housed within the housing base, wherein each tray defines a first serpentine path adapted to hold solid source chemical and allow gas flow thereover. In some embodiments, a multiple chamber deposition module includes first and second vapor phase reaction chambers and a solid source chemical vaporizer vessel to supply each of the first and second vapor phase reaction chambers.

公开(公告)号：US20210210373A1

公开(公告)日：2021-07-08

申请号：US17140661

申请日：2021-01-04

Applicant: ASM IP Holding B.V.

Inventor： Govindarajasekhar Singu ,  Dinkar Nandwana ,  Todd Robert Dunn ,  Shankar Swaminathan ,  Bhushan Zope ,  Carl Louis White

IPC: H01L21/687 ,  H01L21/683

Abstract: A reactor system may comprise a reaction chamber enclosed by a chamber sidewall, and a susceptor disposed in the reaction chamber between a reaction space and a lower chamber space comprised in the reaction chamber. The susceptor may comprise a pin hole disposed through the susceptor such that the pin hole is in fluid communication with the reaction space and the lower chamber space, and such that the reaction space is in fluid communication with the lower chamber space. A lift pin may be disposed in the pin hole. The lift pin may comprise a pin body comprising a pin channel, defined by a pin channel surface, disposed in the pin body such that the reaction space is in fluid communication with the lower chamber space when the lift pin is disposed in the pin hole.

公开(公告)号：US20190139807A1

公开(公告)日：2019-05-09

申请号：US15803615

申请日：2017-11-03

Applicant: ASM IP HOLDING B.V.

Inventor： Carl Louis White ,  Kyle Fondurulia ,  John Kevin Shugrue

IPC: H01L21/687 ,  C23C16/455 ,  C23C16/458 ,  C23C16/44

Abstract: The present disclosure relates to a semiconductor processing apparatus having a reaction chamber which can include a baseplate having an opening; a moveable substrate support configured to support a substrate; a movement element configured to move a substrate held on the substrate support towards the opening of the baseplate; a plurality of gas inlets positioned above and configured to direct gas downwardly towards the substrate support; and a sealing element configured to form a seal between the baseplate and the substrate support, the seal positioned at a greater radial distance from a center of the substrate support than an outer edge of the substrate support. In some embodiments, the sealing element can also include a plurality of apertures extend through the sealing element, the apertures configured to provide a flow path between a position below the sealing element to a position above the sealing element.

公开(公告)号：US11926894B2

公开(公告)日：2024-03-12

申请号：US15585540

申请日：2017-05-03

Applicant: ASM IP Holding B.V.

Inventor： Mohith Verghese ,  Eric James Shero ,  Carl Louis White ,  Kyle Fondurulia ,  Herbert Terhorst

IPC: C23C16/44 ,  C23C16/448 ,  C23C16/455

CPC classification number: C23C16/4481 ,  C23C16/45544

Abstract: Herein disclosed are systems and methods related to solid source chemical vaporizer vessels and multiple chamber deposition modules. In some embodiments, a solid source chemical vaporizer includes a housing base and a housing lid. Some embodiments also include a first and second tray configured to be housed within the housing base, wherein each tray defines a first serpentine path adapted to hold solid source chemical and allow gas flow thereover. In some embodiments, a multiple chamber deposition module includes first and second vapor phase reaction chambers and a solid source chemical vaporizer vessel to supply each of the first and second vapor phase reaction chambers.

公开(公告)号：US11626313B2

公开(公告)日：2023-04-11

申请号：US17126812

申请日：2020-12-18

Applicant: ASM IP HOLDING B.V.

Inventor： Carl Louis White ,  Kyle Fondurulia ,  John Kevin Shugrue

IPC: H01L21/687 ,  C23C16/455 ,  C23C16/44 ,  C23C16/458 ,  H01L21/67

Abstract: The present disclosure relates to a semiconductor processing apparatus having a reaction chamber which can include a baseplate having an opening; a moveable substrate support configured to support a substrate; a movement element configured to move a substrate held on the substrate support towards the opening of the baseplate; a plurality of gas inlets positioned above and configured to direct gas downwardly towards the substrate support; and a sealing element configured to form a seal between the baseplate and the substrate support, the seal positioned at a greater radial distance from a center of the substrate support than an outer edge of the substrate support. In some embodiments, the sealing element can also include a plurality of apertures extend through the sealing element, the apertures configured to provide a flow path between a position below the sealing element to a position above the sealing element.

公开(公告)号：US20210214846A1

公开(公告)日：2021-07-15

申请号：US17149023

申请日：2021-01-14

Applicant: ASM IP HOLDING B.V.

Inventor： Dinkar Nandwana ,  Carl Louis White ,  Eric James Shero ,  William George Petro ,  Herbert Terhorst ,  Gnyanesh Trivedi ,  Mark Olstad ,  Ankit Kimtee ,  Kyle Fondurulia ,  Michael Schmotzer ,  Jereld Lee Winkler

IPC: C23C16/455 ,  C23C16/458

Abstract: The present disclosure pertains to embodiments of a showerhead assembly which can be used to deposit semiconductor layers using processes such as atomic layer deposition (ALD). The showerhead assembly has a showerhead which has an increased thickness which advantageously decreases reactor chamber size and decreases cycling time. Decreased cycling time can improve throughput and decrease costs.

公开(公告)号：US20210040615A1

公开(公告)日：2021-02-11

申请号：US16944241

申请日：2020-07-31

Applicant: ASM IP Holding B.V.

Inventor： Carl Louis White ,  Kyle Fondurulia ,  Timothy James Sullivan

IPC: C23C16/455 ,  C23C16/52 ,  H01L21/67

Abstract: A temperature control system for a chemical delivery system (e.g., comprised in a reactor system) may comprise a temperature control shell coupled to and/or enclosing at least a portion of at least one component of the chemical delivery system. A chemical delivery system may comprise a filter, an accumulator, and/or a chemical application line fluidly coupled to one another in any suitable arrangement and/or configuration. A temperature control system for such a chemical delivery system may comprise a filter temperature control shell coupled to and/or enclosing at least a portion of the filter, an accumulator temperature control shell coupled to and/or enclosing at least a portion of the accumulator, and/or an application line temperature control shell coupled to and/or enclosing at least a portion of the chemical application line.

公开(公告)号：US20180094351A1

公开(公告)日：2018-04-05

申请号：US15585540

申请日：2017-05-03

Applicant: ASM IP Holding B.V.

Inventor： Mohith Verghese ,  Eric James Shero ,  Carl Louis White ,  Kyle Fondurulia ,  Herbert Terhorst

IPC: C23C16/448 ,  C23C16/455

CPC classification number: C23C16/4481 ,  C23C16/45544

Abstract: Herein disclosed are systems and methods related to solid source chemical vaporizer vessels and multiple chamber deposition modules. In some embodiments, a solid source chemical vaporizer includes a housing base and a housing lid. Some embodiments also include a first and second tray configured to be housed within the housing base, wherein each tray defines a first serpentine path adapted to hold solid source chemical and allow gas flow thereover. In some embodiments, a multiple chamber deposition module includes first and second vapor phase reaction chambers and a solid source chemical vaporizer vessel to supply each of the first and second vapor phase reaction chambers.