APPARATUS FOR PROCESSING A PLURALITY OF SUBSTRATES PROVIDED WITH AN EXTRACTOR CHAMBER

    公开(公告)号:US20230008684A1

    公开(公告)日:2023-01-12

    申请号:US17810759

    申请日:2022-07-05

    Abstract: An apparatus 1 for processing a plurality of substrates 3 is provided. The apparatus may have a process tube 5 creating a process chamber 7; a heater 9 surrounding the process tube 5; a flange 11 for supporting the process tube; and a door 15 configured to support a wafer boat 17 with a plurality of substrates 3 in the process chamber and to seal the process chamber 7. An exhaust operably connected to the process chamber 7 may be provided to remove gas from the process chamber via a first exhaust duct 19. The apparatus may be provided with an extractor chamber 21 surrounding the first exhaust duct where it connects to the process chamber and connected to a second exhaust duct 23 to remove gas from the extractor chamber.

    A STORAGE DEVICE FOR STORING WAFER CASSETTES FOR USE WITH A BATCH FURNACE

    公开(公告)号:US20200350193A1

    公开(公告)日:2020-11-05

    申请号:US16765125

    申请日:2018-11-26

    Inventor: Adriaan Garssen

    Abstract: A storage device for use with at least one batch furnace for batch treatment of wafers supported in a wafer boat is disclosed. The storage device comprises a cassette storage carousel for storing a plurality of wafer cassettes on rotatable platform stages. A carousel housing bounds a mini-environment chamber in which the platform stages are accommodated. A gas recirculation circuit of the storage device subsequently comprises a gas inlet channel, a gas inlet filter, the mini-environment chamber, a plurality of gas outlet openings in a bottom wall of the carousel housing, a plenum housing bounding a plenum chamber, a plenum chamber outlet, a gas circulation pump connecting the plenum chamber outlet to an inlet end of the gas inlet duct.

    WAFER HANDLING ASSEMBLY
    5.
    发明申请

    公开(公告)号:US20240395586A1

    公开(公告)日:2024-11-28

    申请号:US18672416

    申请日:2024-05-23

    Inventor: Adriaan Garssen

    Abstract: A wafer handling assembly, a semiconductor processing apparatus comprising the wafer handling assembly and a method of forming a layer on a plurality of wafers is disclosed. Embodiments of the described wafer handling assembly comprise a boat having three boat supports per wafer for supporting the wafer in the boat and an end effector comprising three end effector supports for supporting a wafer on the end effector.

    SEMICONDUCTOR PROCESSING SYSTEM AND METHOD OF ASSEMBLY

    公开(公告)号:US20230307269A1

    公开(公告)日:2023-09-28

    申请号:US18186653

    申请日:2023-03-20

    Inventor: Adriaan Garssen

    CPC classification number: H01L21/67155

    Abstract: A semiconductor processing system and a method for assembling such a system in a room of a semiconductor fabrication plant. The system comprises an equipment module and a pedestal. The equipment module may be movable over the pedestal to bring the equipment module in an end position and may have a plurality of stop surfaces. The method comprises placing the pedestal in the room, placing two stops on the pedestal and positioning the two stops relative to reference elements in the room, and connecting the positioned stops to the pedestal so that the positions thereof in the X-direction and Y-direction are fixed. The equipment module may be moved over the pedestal until the stop surfaces of the equipment module abut against the stops so as to position the equipment module in the X-direction and Y-direction relative to the reference elements.

    Storage device for storing wafer cassettes for use with a batch furnace

    公开(公告)号:US11682572B2

    公开(公告)日:2023-06-20

    申请号:US17398177

    申请日:2021-08-10

    Inventor: Adriaan Garssen

    CPC classification number: H01L21/67769

    Abstract: A storage device for use with at least one batch furnace for batch treatment of wafers supported in a wafer boat is disclosed. The storage device comprises a cassette storage carousel for storing a plurality of wafer cassettes on rotatable platform stages. A carousel housing bounds a mini-environment chamber in which the platform stages are accommodated. A gas recirculation circuit of the storage device subsequently comprises a gas inlet channel, a gas inlet filter, the mini-environment chamber, a plurality of gas outlet openings in a bottom wall of the carousel housing, a plenum housing bounding a plenum chamber, a plenum chamber outlet, a gas circulation pump connecting the plenum chamber outlet to an inlet end of the gas inlet duct.

    STORAGE DEVICE FOR STORING WAFER CASSETTES FOR USE WITH A BATCH FURNACE

    公开(公告)号:US20210366754A1

    公开(公告)日:2021-11-25

    申请号:US17398177

    申请日:2021-08-10

    Inventor: Adriaan Garssen

    Abstract: A storage device for use with at least one batch furnace for batch treatment of wafers supported in a wafer boat is disclosed. The storage device comprises a cassette storage carousel for storing a plurality of wafer cassettes on rotatable platform stages. A carousel housing bounds a mini-environment chamber in which the platform stages are accommodated. A gas recirculation circuit of the storage device subsequently comprises a gas inlet channel, a gas inlet filter, the mini-environment chamber, a plurality of gas outlet openings in a bottom wall of the carousel housing, a plenum housing bounding a plenum chamber, a plenum chamber outlet, a gas circulation pump connecting the plenum chamber outlet to an inlet end of the gas inlet duct.

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