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    Wafer boat
    2.
    发明授权
    Wafer boat 有权
    晶圆船

    公开(公告)号：US09153466B2

    公开(公告)日：2015-10-06

    申请号：US13871279

    申请日：2013-04-26

    Applicant: ASM IP Holding B.V.

    Inventor： Lucian C. Jdira ,  Arjen Klaver ,  Klaas P. Boonstra ,  Chris G. M. De Ridder ,  Theodorus G. M. Oosterlaken

    IPC: H01L21/673

    CPC classification number: H01L21/67309 ,  H01L21/67303

    Abstract: A wafer boat for accommodating semiconductor wafers comprises two side rods and at least one back rod, the rods being vertically oriented and extending between a top member and a bottom member. The rods comprise vertically spaced recesses formed at corresponding heights, recesses at the same height defining a wafer accommodation for receiving and supporting a wafer in a substantially horizontal orientation, the recesses having an improved shape. The upwardly facing surfaces of the recesses comprise a first flat surface in an inward region of the recess which is horizontal or inclined upward in an outward direction of the recess and a second flat surface in an outer region of the recess which is inclined downward in an outward direction of the recess. The intersection of the first and second surface forming an edge for supporting the wafer. The recesses are easy to machine and prevent damage to the wafer.

    Abstract translation: 用于容纳半导体晶片的晶片舟包括两个侧杆和至少一个后杆，所述杆垂直定向并在顶部构件和底部构件之间延伸。 杆包括形成在相应高度处的垂直间隔开的凹部，在相同高度处的凹槽限定用于以基本上水平的方向接收和支撑晶片的晶片容置，所述凹部具有改进的形状。 凹槽的面向上的表面包括在凹部的向内区域中的第一平坦表面，其在凹部的向外方向上是水平的或向上倾斜的，并且在凹部的外部区域中的第二平坦表面在第一平坦表面中向下倾斜 凹槽的向外方向。 第一和第二表面的交点形成用于支撑晶片的边缘。 凹槽容易加工并防止损坏晶片。

    Assembly of liner and flange for vertical furnace as well as a vertical process furnace
    3.
    发明授权
    Assembly of liner and flange for vertical furnace as well as a vertical process furnace 有权

    公开(公告)号：US10224222B2

    公开(公告)日：2019-03-05

    申请号：US14481131

    申请日：2014-09-09

    Applicant: ASM IP Holding B.V.

    Inventor： Chris G. M. de Ridder ,  Theodorus G. M. Oosterlaken ,  Klaas P. Boonstra

    IPC: H01L21/67 ,  H01L21/683 ,  H01L21/673

    Abstract: An assembly of a liner and a support flange for a vertical furnace for processing wafers, wherein the support flange is configured for supporting the liner, at least two support members that are connected to the cylindrical wall, each having a downwardly directed supporting surface, wherein each downwardly directed supporting surface is positioned radially outwardly from the inner cylindrical surface, wherein the support flange and/or the liner are configured such that, when the liner is placed on the support flange, the downwardly directed supporting surfaces are in contact with an upper surface of the support flange and support the liner, and wherein at least the part of the lower end surface of the liner that bounds the inner cylindrical surface is spaced apart from the upper surface of the support flange.

    PURGE NOZZLE ASSEMBLY AND SEMICONDUCTOR PROCESSING ASSEMBLY INCLUDING THE PURGE NOZZLE ASSEMBLY
    4.
    发明申请
    PURGE NOZZLE ASSEMBLY AND SEMICONDUCTOR PROCESSING ASSEMBLY INCLUDING THE PURGE NOZZLE ASSEMBLY 有权

    公开(公告)号：US20210375644A1

    公开(公告)日：2021-12-02

    申请号：US17326706

    申请日：2021-05-21

    Applicant: ASM IP Holding B.V.

    Inventor： Christianus G.M. de Ridder ,  Klaas P. Boonstra

    IPC: H01L21/673 ,  H01L21/677

    Abstract: A purge nozzle assembly comprising a purge nozzle body including an inlet opening and an outlet opening. The outlet opening opens into a purge nozzle contact surface. Additionally, the purge nozzle assembly includes a mounting body for connecting the purge nozzle assembly to an external frame member. A mechanical coupling mechanism moveably couples the purge nozzle body with the mounting body and is configured to allow tilting of the purge nozzle body relative to the mounting body as well as to allow a substantial lateral movement of the purge nozzle body relative to the mounting body, wherein the lateral movement has a movement component which is substantially parallel to the purge nozzle contact surface.

    ASSEMBLY OF LINER AND FLANGE FOR VERTICAL FURNACE AS WELL AS A VERTICAL PROCESS FURNACE
    6.
    发明申请
    ASSEMBLY OF LINER AND FLANGE FOR VERTICAL FURNACE AS WELL AS A VERTICAL PROCESS FURNACE 审中-公开
    垂直炉的内衬和法兰装配作为垂直过程炉

    公开(公告)号：US20160071750A1

    公开(公告)日：2016-03-10

    申请号：US14481131

    申请日：2014-09-09

    Applicant: ASM IP Holding B.V.

    Inventor： Chris G.M. de Ridder ,  Theodorus G.M. Oosterlaken ,  Klaas P. Boonstra

    IPC: H01L21/67 ,  H01L21/683 ,  H01L21/673

    CPC classification number: H01L21/67109 ,  H01L21/67017

    Abstract: An assembly of a liner and a support flange for a vertical furnace for processing wafers, wherein the support flange is configured for supporting the liner, at least two support members that are connected to the cylindrical wall, each having a downwardly directed supporting surface, wherein each downwardly directed supporting surface is positioned radially outwardly from the inner cylindrical surface, wherein the support flange and/or the liner are configured such that, when the liner is placed on the support flange, the downwardly directed supporting surfaces are in contact with an upper surface of the support flange and support the liner, and wherein at least the part of the lower end surface of the liner that bounds the inner cylindrical surface is spaced apart from the upper surface of the support flange.

    Abstract translation: 用于处理晶片的垂直炉的衬套和支撑凸缘的组件，其中所述支撑凸缘被构造成用于支撑衬套，连接到所述圆柱形壁的至少两个支撑构件，每个支撑构件具有向下指向的支撑表面，其中 每个向下指向的支撑表面从内圆柱形表面径向向外定位，其中支撑凸缘和/或衬套被构造成使得当衬垫放置在支撑凸缘上时，向下指向的支撑表面与上部 支撑凸缘的表面并支撑衬套，并且其中限定内圆柱形表面的衬套的下端表面的至少部分与支撑凸缘的上表面间隔开。

    Injector
    7.
    发明授权
    Injector 有权

    公开(公告)号：US11993847B2

    公开(公告)日：2024-05-28

    申请号：US17142790

    申请日：2021-01-06

    Applicant: ASM IP Holding B.V.

    Inventor： Chris G. M. de Ridder ,  Klaas P. Boonstra ,  Theodorus G. M. Oosterlaken

    IPC: C23C16/40 ,  C23C16/00 ,  C23C16/455

    CPC classification number: C23C16/45578 ,  C23C16/00

    Abstract: An injector configured to be placed in a process chamber of a batch furnace assembly for injecting a gas into said process chamber. The injector has an elongated, tubular housing enclosing an injection chamber. The housing has a gas inlet opening for supplying a gas from a gas source to the injection chamber, at least one gas supply opening for supplying the gas from the injection chamber into the process chamber, and a circumferential wall extending in a longitudinal direction of the housing. The circumferential wall comprises a first lateral wall half and a second lateral wall half. Both lateral wall halves substantially span a length of the housing in the longitudinal direction. The first and second lateral wall halves are fastened to each other by means of mechanical fastening.

    INJECTOR
    8.
    发明申请
    INJECTOR 有权

    公开(公告)号：US20210207270A1

    公开(公告)日：2021-07-08

    申请号：US17142790

    申请日：2021-01-06

    Applicant: ASM IP Holding B.V.

    Inventor： Chris G.M. de Ridder ,  Klaas P. Boonstra ,  Theodorus G.M. Oosterlaken

    IPC: C23C16/455

    Abstract: An injector configured to be placed in a process chamber of a batch furnace assembly for injecting a gas into said process chamber. The injector has an elongated, tubular housing enclosing an injection chamber. The housing has a gas inlet opening for supplying a gas from a gas source to the injection chamber, at least one gas supply opening for supplying the gas from the injection chamber into the process chamber, and a circumferential wall extending in a longitudinal direction of the housing. The circumferential wall comprises a first lateral wall half and a second lateral wall half. Both lateral wall halves substantially span a length of the housing in the longitudinal direction. The first and second lateral wall halves are fastened to each other by means of mechanical fastening.

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