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1.发明授权公开(公告)号：US10267744B2
公开(公告)日：2019-04-23
申请号：US15641579
申请日：2017-07-05
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus Tinnemans , Nan Lin , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen
IPC: G02F1/35 , G01N21/47 , G01N21/88 , G01N21/956 , G03F7/20
Abstract: Disclosed is an illumination source for generating measurement radiation for an inspection apparatus. The source generates at least first measurement radiation and second measurement radiation such that the first measurement radiation and the second measurement radiation interfere to form combined measurement radiation modulated with a beat component. The illumination source may be a HHG source. Also disclosed is an inspection apparatus comprising such a source and an associated inspection method.
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公开(公告)号：US10983361B2
公开(公告)日：2021-04-20
申请号：US15898394
申请日：2018-02-16
Applicant: ASML Netherlands B.V.
Abstract: A method of aligning a diffractive optical system, to be operated with an operating beam, comprises: aligning (558) the diffractive optical system using an alignment beam having a different wavelength range from the operating beam and using a diffractive optical element optimized (552) to diffract the alignment beam and the operating beam in the same (or a predetermined) direction. In an example, the alignment beam comprises infra-red (IR) radiation and the operating beam comprises soft X-ray (SXR) radiation. The diffractive optical element is optimized by providing it with a first periodic structure with a first pitch (pIR) and a second periodic structure with a second pitch (pSXR). After alignment, the vacuum system is pumped down (562) and in operation the SXR operating beam is generated (564) by a high harmonic generation (HHG) optical source pumped by the IR alignment beam’ optical source.
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公开(公告)号：US10725387B2
公开(公告)日：2020-07-28
申请号：US16028917
申请日：2018-07-06
Applicant: ASML Netherlands B.V.
Inventor： Teis Johan Coenen , Sander Bas Roobol , Sipke Jacob Bijlsma
Abstract: In a method of determining an edge roughness parameter of a periodic structure, the periodic structure is illuminated (602) in an inspection apparatus. The illumination radiation beam may comprise radiation with a wavelength in the range 1 nm to 100 nm. A scattering signal (604) is obtained from a radiation beam scattered from the periodic structure. The scattering signal comprises a scattering intensity signal that is obtained by detecting an image of a far-field diffraction pattern in the inspection apparatus. An edge roughness parameter, such as Lined Edge Roughness and/or Line Width Roughness is determined (606) based on a distribution of the scattering intensity signal around a non-specular diffraction order. This may be done for example using a peak broadening model.
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公开(公告)号：US10379448B2
公开(公告)日：2019-08-13
申请号：US15875156
申请日：2018-01-19
Applicant: ASML Netherlands B.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Sander Bas Roobol , Nan Lin , Willem Marie Julia Marcel Coene , Arie Jeffrey Den Boef
Abstract: Target structures such as overlay gratings (Ta and Tb) are formed on a substrate (W) by a lithographic process. The first target is illuminated with a spot of first radiation (456a, Sa) and simultaneously the second target is illuminated with a spot of second radiation (456b, Sb). A sensor (418) detects at different locations, portions (460x−, 460x+) of said first radiation that have been diffracted in a first direction by features of the first target and portions (460y−, 460y+) of said second radiation that have been diffracted in a second direction by features of the second target. Asymmetry in X and Y directions can be detected simultaneously, reducing the time required for overlay measurements in X and Y. The two spots of radiation at soft x-ray wavelength can be generated simply by exciting two locations (710a, 710b) in a higher harmonic generation (HHG) radiation source or inverse Compton scattering source.
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5.发明申请公开(公告)号：US20190204757A1
公开(公告)日：2019-07-04
申请号：US16233707
申请日：2018-12-27
Applicant: ASML Netherlands B.V.
Inventor： Gerrit Jacobus Hendrik BRUSSAARD , Petrus Wilhelmus Smorenburg , Teis Johan Coenen , Niels Geypen , Peter Danny Van Voorst , Sander Bas Roobol
IPC: G03F7/20
Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.
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Patent Agency Ranking
公开(公告)号：US11092902B2
公开(公告)日：2021-08-17
申请号：US16624609
申请日：2018-05-17
Applicant: ASML Netherlands B.V.
Inventor： Johannes Franciscus Martinus D'Achard Van Enschut , Tamara Druzhinina , Nitish Kumar , Sarathi Roy , Yang-Shan Huang , Arie Jeffrey Den Boef , Han-Kwang Nienhuys , Pieter-Jan Van Zwol , Sander Bas Roobol
Abstract: Disclosed is a method and associated inspection apparatus for detecting variations on a surface of a substrate. The method comprises providing patterned inspection radiation to a surface of a substrate. The inspection radiation is patterned such that an amplitude of a corresponding enhanced field is modulated in a manner corresponding to the patterned inspection radiation. The scattered radiation resultant from interaction between the enhanced field and the substrate surface is received and variations on the surface of the substrate are detected based on the interaction between the enhanced field and the substrate surface. Also disclosed is a method of detecting any changes to at least one characteristic of received radiation, the said changes being induced by the generation of a surface plasmon at said surface of the optical element.
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公开(公告)号：US10816906B2
公开(公告)日：2020-10-27
申请号：US16254896
申请日：2019-01-23
Applicant: ASML Netherlands B.V.
Inventor： Nan Lin , Arie Jeffrey Den Boef , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen , Niels Geypen
IPC: G03F7/20 , G01N21/95 , G01N21/956 , G01B11/24 , G02F1/355 , G02F1/37 , H01S3/00 , H01S3/13 , H01S3/16 , G01N21/88
Abstract: Disclosed is a method of performing a measurement in an inspection apparatus, and an associated inspection apparatus and HHG source. The method comprises configuring one or more controllable characteristics of at least one driving laser pulse of a high harmonic generation radiation source to control the output emission spectrum of illumination radiation provided by the high harmonic generation radiation source; and illuminating a target structure with said illuminating radiation. The method may comprise configuring the driving laser pulse so that the output emission spectrum comprises a plurality of discrete harmonic peaks. Alternatively the method may comprise using a plurality of driving laser pulses of different wavelengths such that the output emission spectrum is substantially monochromatic.
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8.发明授权公开(公告)号：US10451559B2
公开(公告)日：2019-10-22
申请号：US16102178
申请日：2018-08-13
Applicant: ASML Netherlands B.V.
Inventor： Peter Danny Van Voorst , Nan Lin , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen , Sietse Thijmen Van Der Post
IPC: G01N21/88 , G03F7/20 , G01N21/95 , H05G2/00 , G01N21/956
Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.
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公开(公告)号：US10248029B2
公开(公告)日：2019-04-02
申请号：US15580500
申请日：2016-07-05
Applicant: ASML Netherlands B.V.
Inventor： Sietse Thijmen Van Der Post , Ferry Zijp , Sander Bas Roobol
Abstract: A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.
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10.发明申请公开(公告)号：US20180239160A1
公开(公告)日：2018-08-23
申请号：US15898394
申请日：2018-02-16
Applicant: ASML Netherlands B.V.
IPC: G02B27/42
CPC classification number: G02B27/4255 , G02B27/62 , G03F7/70158 , G03F7/70258 , G03F7/70316 , G03F7/70575 , G03F7/70591 , G03F7/7085
Abstract: A method of aligning a diffractive optical system, to be operated with an operating beam, comprises: aligning (558) the diffractive optical system using an alignment beam having a different wavelength range from the operating beam and using a diffractive optical element optimized (552) to diffract the alignment beam and the operating beam in the same (or a predetermined) direction. In an example, the alignment beam comprises infra-red (IR) radiation and the operating beam comprises soft X-ray (SXR) radiation. The diffractive optical element is optimized by providing it with a first periodic structure with a first pitch (pIR) and a second periodic structure with a second pitch (pSXR). After alignment, the vacuum system is pumped down (562) and in operation the SXR operating beam is generated (564) by a high harmonic generation (HHG) optical source pumped by the IR alignment beam’ optical source.
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