公开(公告)号：US20250112023A1

公开(公告)日：2025-04-03

申请号：US18829217

申请日：2024-09-09

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Shuai LI ,  Xuedong LIU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/12 ,  H01J37/147

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

公开(公告)号：US20220148851A1

公开(公告)日：2022-05-12

申请号：US17460381

申请日：2021-08-30

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Shuai LI ,  Xuedong LIU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/05 ,  H01J37/063 ,  H01J37/304 ,  H01J29/51 ,  H01J37/12

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

公开(公告)号：US20210391138A1

公开(公告)日：2021-12-16

申请号：US17353790

申请日：2021-06-21

Applicant: ASML Netherlands B.V.

Inventor： Xuedong LIU ,  Weiming REN ,  Shuai LI ,  Zhongwei CHEN

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/04 ,  H01J37/153

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

公开(公告)号：US20210384008A1

公开(公告)日：2021-12-09

申请号：US17373716

申请日：2021-07-12

Applicant: ASML Netherlands B.V.

Inventor： Shuai LI ,  Weiming REN ,  Xuedong LIU ,  Juying DOU ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/10

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

公开(公告)号：US20240014003A1

公开(公告)日：2024-01-11

申请号：US18345956

申请日：2023-06-30

Applicant: ASML Netherlands B.V.

Inventor： Shuai LI ,  Weiming REN ,  Xuedong LIU ,  Juying DOU ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/20

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

公开(公告)号：US20240145209A1

公开(公告)日：2024-05-02

申请号：US18498984

申请日：2023-10-31

Applicant: ASML Netherlands B.V.

Inventor： Shuai LI ,  Zhongwei Chen

IPC: H01J37/145 ,  H01J37/141 ,  H01J37/147

CPC classification number: H01J37/145 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/1477

Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).

公开(公告)号：US20220068589A1

公开(公告)日：2022-03-03

申请号：US17383353

申请日：2021-07-22

Applicant: ASML Netherlands B.V.

Inventor： Shuai LI

IPC: H01J37/143 ,  H01J37/28 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/14 ,  H01J37/09

Abstract: This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

公开(公告)号：US20190279842A1

公开(公告)日：2019-09-12

申请号：US16357309

申请日：2019-03-18

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Shuai LI ,  Xuedong LIU ,  Zhongwei CHEN ,  Jack JAU

IPC: H01J37/28

Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.

公开(公告)号：US20200286705A1

公开(公告)日：2020-09-10

申请号：US16799773

申请日：2020-02-24

Applicant: ASML Netherlands B.V.

Inventor： Xuedong LIU ,  Weiming REN ,  Shuai LI ,  Zhongwei CHEN

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/04 ,  H01J37/153

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.