公开(公告)号：US11614416B2

公开(公告)日：2023-03-28

申请号：US16655140

申请日：2019-10-16

Applicant: ASML Netherlands B.V.

Inventor： Xuerang Hu ,  Xinan Luo ,  Qingpo Xi ,  Xuedong Liu ,  Weiming Ren

IPC: G01N23/225 ,  G01N21/95 ,  H01J37/244 ,  H01J37/32

Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved alignment mechanism is disclosed. An improved charged particle beam inspection apparatus may include a second electron detection device to generate one or more images of one or more beam spots of the plurality of secondary electron beams during the alignment mode. The beam spot image may be used to determine the alignment characteristics of one or more of the plurality of secondary electron beams and adjust a configuration of a secondary electron projection system.

公开(公告)号：US11961698B2

公开(公告)日：2024-04-16

申请号：US17344446

申请日：2021-06-10

Applicant: ASML Netherlands B.V.

Inventor： Christiaan Otten ,  Peter-Paul Crans ,  Marc Smits ,  Laura Del Tin ,  Christan Teunissen ,  Yang-Shan Huang ,  Stijn Wilem Herman Karel Steenbrink ,  Xuerang Hu ,  Qingpo Xi ,  Xinan Luo ,  Xuedong Liu

IPC: H01J37/15 ,  H01J37/02 ,  H01J37/14 ,  H01J37/147 ,  H01J37/18 ,  H01J37/244 ,  H01J37/28 ,  H01J37/20 ,  H01J37/317

CPC classification number: H01J37/15 ,  H01J37/023 ,  H01J37/14 ,  H01J37/1477 ,  H01J37/18 ,  H01J37/244 ,  H01J37/28 ,  H01J37/20 ,  H01J37/3177 ,  H01J2237/2006 ,  H01J2237/20214 ,  H01J2237/2817

Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.