公开(公告)号：US11460786B2

公开(公告)日：2022-10-04

申请号：US16763925

申请日：2018-10-18

Applicant: ASML Netherlands B.V.

Inventor： Yang-Shan Huang ,  Petrus Theodorus Rutgers

IPC: G03F7/20 ,  H02K21/44 ,  H02K41/03

Abstract: A method for positioning a substage (9), supported by a main stage (5), relative to a reference object, the substage moveable in a direction (7) between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning the main stage. The passive force system includes two magnet systems (119, 121), each magnet system being configured to apply a force in the direction to the first stage with respect to the second stage in a non-contact manner, the forces resulting in a resultant force applied to the first stage in the direction by the passive force system. A magnitude and/or a direction of the resultant force depends on the position of the first stage relative to the second stage, and the first stage has a zero-force position between the first and second position in which the resultant force is zero.

公开(公告)号：US11204558B2

公开(公告)日：2021-12-21

申请号：US16629349

申请日：2018-07-18

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Yang-Shan Huang ,  Daniel Nathan Burbank ,  Marco Koert Stavenga

IPC: G03F7/20

Abstract: An object stage that includes a first structure and a second structure movable relative to the first structure. The second structure is configured to support an object. The object stage also includes a seal plate movably coupled to the first structure or the second structure, but not both. Further, the object stage includes an actuator configured to move the seal plate such that a substantially constant gap is defined between the seal plate and the first structure or second structure that is not coupled to the seal plate.

公开(公告)号：US11232960B2

公开(公告)日：2022-01-25

申请号：US16300595

申请日：2017-04-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Yang-Shan Huang ,  Alexey Olegovich Polyakov ,  Coen Adrianus Verschuren ,  Pieter Willem Herman De Jager

IPC: H01L21/67 ,  H05K3/30 ,  H01L21/683

Abstract: A pick-and-place tool including a plurality of movable holder structures, and a plurality of pick-and-place structures, each holder structure accommodating two or more of the pick-and-place structures, wherein at least one of the two or more pick-and-place structures of a respective holder structure is able to move along a respective holder structure independently from another at least one of the two or more pick-and-place structures of the respective holder structure, and wherein each pick-and-place structure includes a pick-up element configured to pick up a donor component at a donor structure and place the donor component an acceptor structure.

公开(公告)号：US11137694B2

公开(公告)日：2021-10-05

申请号：US16629337

申请日：2018-07-18

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Yang-Shan Huang ,  Marcel Joseph Louis Boonen ,  Han-Kwang Nienhuys ,  Jacob Brinkert ,  Richard Joseph Bruls ,  Peter Conrad Kochersperger

IPC: G03F7/20

Abstract: A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.

公开(公告)号：US09921494B2

公开(公告)日：2018-03-20

申请号：US14395454

申请日：2013-04-12

Applicant: ASML Netherlands B.V.

Inventor： Theodorus Petrus Maria Cadee ,  Sander Christiaan Broers ,  Sven Antoin Johan Hol ,  Yang-Shan Huang ,  Antonius Franciscus Johannes De Groot ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven

IPC: G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70766 ,  G03F7/70533 ,  G03F7/70758 ,  G03F7/709

Abstract: A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.

公开(公告)号：US09261798B2

公开(公告)日：2016-02-16

申请号：US13871328

申请日：2013-04-26

Applicant: ASML Netherlands B.V.

Inventor： Yang-Shan Huang ,  Theodorus Petrus Maria Cadee

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70725 ,  G03F7/70758

Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.

Abstract translation: 基板台用于光刻设备中。 衬底台包括构造成保持衬底的衬底台和用于使用的定位装置相对于光刻设备的投影系统定位衬底台。 所述定位装置包括安装到所述基板台的第一定位构件和与所述第一定位构件配合以定位所述基板台的第二定位构件。 第二定位构件安装到支撑结构。 衬底台还包括致动器，该致动器被布置成相对于支撑结构在基本上固定的水平位置上在衬底台的底表面上施加垂直力。

公开(公告)号：US11442369B2

公开(公告)日：2022-09-13

申请号：US16763487

申请日：2018-11-07

Applicant: ASML Netherlands B.V.

Inventor： Yang-Shan Huang ,  Pieter Cornelis Johan De Jager ,  Rob Reilink ,  Christiaan Louis Valentin ,  Jasper Leonardus Johannes Scholten ,  Antonie Hendrik Verweij ,  Edwin Van Horne

IPC: G03F7/20

Abstract: An object stage bearing system can include an object stage, a hollow shaft coupled to the object stage, and an in-vacuum gas bearing assembly coupled to the hollow shaft and the object stage. The in-vacuum gas bearing assembly can include a gas bearing, a scavenging groove, and a vacuum groove. The gas bearing is disposed along an inner wall of the in-vacuum gas bearing assembly and along an external wall of the hollow shaft. The scavenging groove is disposed along the inner wall such that the scavenging groove is isolated from the gas bearing. The vacuum groove is disposed along the inner wall such that the vacuum groove is isolated from the scavenging groove and the gas bearing.

公开(公告)号：US10705438B2

公开(公告)日：2020-07-07

申请号：US16716568

申请日：2019-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus Jeunink ,  Laurentius Johannes Adrianus Van Bokhoven ,  Stan Henricus Van Der Meulen ,  Yang-Shan Huang ,  Federico La Torre ,  Bearrach Moest ,  Stefan Carolus Jacobus Antonius Keij ,  Enno Van Den Brink ,  Christine Henriette Schouten ,  Hoite Pieter Theodoor Tolsma

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/62

Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.

公开(公告)号：US20150070678A1

公开(公告)日：2015-03-12

申请号：US14395454

申请日：2013-04-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria Cadee ,  Sander Christiaan Broers ,  Sven Antoin Johan Hol ,  Yang-Shan Huang ,  Antonius Franciscus Johannes De Groot ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven

IPC: G03F7/20

CPC classification number: G03F7/70766 ,  G03F7/70533 ,  G03F7/70758 ,  G03F7/709

Abstract: A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.

Abstract translation: 光刻设备包括一个系统。 该系统包括第一部分，第二部分和能量吸收元件。 第二部分被配置为相对于第一部分移动。 该系统在系统的操作模式期间具有位于第一部分和第二部分之间的间隙。 当第一部分和第二部分在系统的故障模式下彼此碰撞时，能量吸收元件用于在第一部分和第二部分之间吸收能量。 能量吸收元件在间隙之外。

公开(公告)号：US12032296B2

公开(公告)日：2024-07-09

申请号：US17776369

申请日：2020-10-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Yang-Shan Huang ,  Nicolaas Ten Kate

IPC: G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/709

Abstract: A fluid handling system that includes a liquid confinement structure configured to confine immersion liquid to a space between at least a part of the liquid confinement structure and a surface of a substrate. The fluid handling system also includes a mechanism configured to vibrate a vibration component in contact with the immersion liquid.