Substrate, semiconductor device package and method of manufacturing the same

    公开(公告)号:US11776885B2

    公开(公告)日:2023-10-03

    申请号:US17397842

    申请日:2021-08-09

    Abstract: A substrate includes a first dielectric layer having a first surface and a second dielectric layer having a first surface disposed adjacent to the first surface of the first dielectric layer. The substrate further includes a first conductive via disposed in the first dielectric layer and having a first end adjacent to the first surface of the first dielectric layer and a second end opposite the first end. The substrate further includes a second conductive via disposed in the second dielectric layer and having a first end adjacent to the first surface of the second dielectric layer. A width of the first end of the first conductive via is smaller than a width of the second end of the first conductive via, and a width of the first end of the second conductive via is smaller than the width of the first end of the first conductive via.

    Semiconductor substrate, semiconductor package, and method for forming the same

    公开(公告)号:US11024555B2

    公开(公告)日:2021-06-01

    申请号:US16878475

    申请日:2020-05-19

    Abstract: The present disclosure provides a semiconductor substrate, including a first patterned conductive layer, a dielectric structure on the first patterned conductive layer, wherein the dielectric structure having a side surface, a second patterned conductive layer on the dielectric structure and extending on the side surface, and a third patterned conductive layer on the second patterned conductive layer and extending on the side surface. The present disclosure provides a semiconductor package including the semiconductor substrate. A method for manufacturing the semiconductor substrate and the semiconductor package is also provided.

    Substrate structure having pad portions

    公开(公告)号:US11101186B2

    公开(公告)日:2021-08-24

    申请号:US16297451

    申请日:2019-03-08

    Abstract: A substrate structure includes a wiring structure and a supporter. The wiring structure includes a first dielectric structure, a first circuit layer, a second dielectric structure and a second circuit layer. The first circuit layer is disposed on the first dielectric structure. The second dielectric structure covers the first dielectric structure and the first circuit layer. A pad portion of the first circuit layer is exposed from the first dielectric structure, and the second circuit layer protrudes from the second dielectric structure. The supporter is disposed adjacent to the first dielectric structure of the wiring structure, and defines at least one through hole corresponding to the exposed pad portion of the first circuit layer.

    Substrate, semiconductor device package and method of manufacturing the same

    公开(公告)号:US11088061B2

    公开(公告)日:2021-08-10

    申请号:US16814729

    申请日:2020-03-10

    Abstract: A substrate includes a first dielectric layer having a first surface and a second dielectric layer having a first surface disposed adjacent to the first surface of the first dielectric layer. The substrate further includes a first conductive via disposed in the first dielectric layer and having a first end adjacent to the first surface of the first dielectric layer and a second end opposite the first end. The substrate further includes a second conductive via disposed in the second dielectric layer and having a first end adjacent to the first surface of the second dielectric layer. A width of the first end of the first conductive via is smaller than a width of the second end of the first conductive via, and a width of the first end of the second conductive via is smaller than the width of the first end of the first conductive via.

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