公开(公告)号：US10964730B2

公开(公告)日：2021-03-30

申请号：US16741628

申请日：2020-01-13

Applicant: Applejack 199 L.P.

Inventor： Oanh Nguyen ,  Wojciech Jan Walecki

IPC: H01L27/12 ,  G01B11/30 ,  G01B11/24 ,  G01B11/16 ,  G01M11/08 ,  G01L1/24 ,  H01L21/66 ,  H01L21/48 ,  G01B11/06 ,  G01R31/26 ,  H01L21/16 ,  H01L29/786

Abstract: A method for non-contact measurement of stress in a thin-film deposited on a substrate is disclosed. The method may include measuring first topography data of a substrate having a thin-film deposited thereupon. The method may also include comparing the first topography data with second topography data of the substrate that is measured prior to thin-film deposition. The method may further include obtaining a vertical displacement of the substrate based on the comparison between the first topography data and the second topography data. The method may also include detecting a stress value in the thin-film deposited on the substrate based on a fourth-order polynomial equation and the vertical displacement.

公开(公告)号：US10584958B2

公开(公告)日：2020-03-10

申请号：US16165451

申请日：2018-10-19

Applicant: APPLEJACK 199 L.P.

Inventor： Wojciech Jan Walecki

IPC: G01B11/06

Abstract: Operations related to error reduction in measurement of samples of materials may include operations in which a first distance measurement may be obtained between a first probe and a first surface of a sample at a first time mark. Additionally, the operations may include obtaining a second distance measurement between a second probe and a second surface of the sample at a second time mark. Operations may further include obtaining a third distance measurement between the first probe and the first surface of a sample at a third time mark, and determining a fourth distance measurement between the first probe and the first surface of the sample at the second time mark. In addition, the operations may include determining a thickness of the sample, including an error term due to vibration of the sample. The error term may be discounted from the thickness of the sample.

公开(公告)号：US10655949B2

公开(公告)日：2020-05-19

申请号：US16174053

申请日：2018-10-29

Applicant: Applejack 199 L.P.

Inventor： Wojciech Jan Walecki ,  Alexander Pravdivtsev

IPC: G01B11/06 ,  G01B9/02

Abstract: Inspecting a multilayer sample. In one example embodiment, a method may receiving, at a beam splitter, light and splitting the light into first and second portions; combining, at the beam splitter, the first portion of the light after being reflected from a multilayer sample and the second portion of the light after being reflected from a reflector; receiving, at a computer-controlled system for analyzing Fabry-Perot fringes, the combined light and spectrally analyzing the combined light to determine a value of a total power impinging a slit of the system for analyzing Fabry-Perot fringes; determining an optical path difference (OPD); recording an interferogram that plots the value versus the OPD for the OPD; performing the previous acts of the method one or more additional times with a different OPD; and using the interferogram for each of the different OPDs to determine the thicknesses and order of the layers of the multilayer sample.

公开(公告)号：US10168138B1

公开(公告)日：2019-01-01

申请号：US16048712

申请日：2018-07-30

Applicant: Applejack 199 L.P.

Inventor： Wojciech Jan Walecki ,  Alexander Pravdivtsev

IPC: G01B9/02 ,  G01B11/06 ,  G01B11/24

Abstract: A system for inspecting a slab of material may include a polarization maintaining single mode optical-fiber, a linearly polarized broadband light-source configured to emit a polarized-light over the optical fiber, a beam-assembly configured to receive the light over the optical fiber and direct the light toward a slab of material; a polarization-rotator for controlling polarization of the light directed to the slab of material from the beam-assembly; a computer-controlled etalon filter configured to receive the light over the optical fiber, filter the light, and direct the light over the optical fiber; and a computer-controlled spectrometer configured to receive the light over the optical fiber after the light has been filtered by the etalon filter and after the light has been reflected from or transmitted through the slab of material and spectrally analyze the light.

公开(公告)号：US20200152783A1

公开(公告)日：2020-05-14

申请号：US16741628

申请日：2020-01-13

Applicant: Applejack 199 L.P.

Inventor： Oanh Nguyen ,  Wojciech Jan Walecki

IPC: H01L29/786 ,  H01L21/48 ,  H01L27/12 ,  H01L21/66 ,  H01L21/16 ,  G01R31/26

Abstract: A method for non-contact measurement of stress in a thin-film deposited on a substrate is disclosed. The method may include measuring first topography data of a substrate having a thin-film deposited thereupon. The method may also include comparing the first topography data with second topography data of the substrate that is measured prior to thin-film deposition. The method may further include obtaining a vertical displacement of the substrate based on the comparison between the first topography data and the second topography data. The method may also include detecting a stress value in the thin-film deposited on the substrate based on a fourth-order polynomial equation and the vertical displacement.

公开(公告)号：US10553623B2

公开(公告)日：2020-02-04

申请号：US15722645

申请日：2017-10-02

Applicant: Applejack 199 L.P.

Inventor： Wojciech Jan Walecki ,  Oanh Nguyen

IPC: H01L27/12 ,  G01B11/30 ,  G01B11/24 ,  G01B11/16 ,  G01M11/08 ,  G01L1/24 ,  H01L21/66

Abstract: A method for non-contact measurement of stress in a thin-film deposited on a substrate is disclosed. The method may include measuring first topography data of a substrate having a thin-film deposited thereupon. The method may also include comparing the first topography data with second topography data of the substrate that is measured prior to thin-film deposition. The method may further include obtaining a vertical displacement of the substrate based on the comparison between the first topography data and the second topography data. The method may also include detecting a stress value in the thin-film deposited on the substrate based on a fourth-order polynomial equation and the vertical displacement.

公开(公告)号：US10113860B1

公开(公告)日：2018-10-30

申请号：US15486146

申请日：2017-04-12

Applicant: Applejack 199 L.P.

Inventor： Wojciech Jan Walecki ,  Alexander Pravdivtsev

IPC: G01B11/06 ,  G01B9/02

Abstract: Inspecting a multilayer sample. In one example embodiment, a method may include receiving, at a beam splitter, light and splitting the light into first and second portions; combining, at the beam splitter, the first portion of the light after being reflected from a multilayer sample and the second portion of the light after being reflected from a reflector; receiving, at a computer-controlled system for analyzing Fabry-Perot fringes, the combined light and spectrally analyzing the combined light to determine a value of a total power impinging a slit of the system for analyzing Fabry-Perot fringes; determining an optical path difference (OPD); recording an interferogram that plots the value versus the OPD for the OPD; performing the previous acts of the method one or more additional times with a different OPD; and using the interferogram for each of the different OPDs to determine the thicknesses and order of the layers of the multilayer sample.

公开(公告)号：US09915564B1

公开(公告)日：2018-03-13

申请号：US15410328

申请日：2017-01-19

Applicant: Applejack 199 L.P.

Inventor： Wojciech Jan Walecki ,  Alexander Pravdivtsev

IPC: G01J3/26 ,  G01N21/25 ,  G01B9/02 ,  G01B11/06 ,  G01B11/24 ,  G01J3/12

CPC classification number: G01J3/26 ,  G01B9/02044 ,  G01B11/06 ,  G01B11/2441 ,  G01J2003/1247 ,  G01N21/255 ,  G01N2201/084

Abstract: According to an aspect of one or more embodiments, a system for inspecting a slab of material may include a single mode optical fiber, a broadband light source configured to emit light over the optical fiber, a beam assembly configured to receive the light over the optical fiber and direct the light toward a slab of material, a computer-controlled etalon filter configured to receive the light over the optical fiber either before the light is directed toward the slab of material or after the light has been reflected from or transmitted through the slab of material, filter the light, and direct the light over the optical fiber, and a computer-controlled spectrometer configured to receive the light over the optical fiber after the light has been filtered by the etalon filter and after the light has been reflected from or transmitted through the slab of material and spectrally analyze the light.

公开(公告)号：US10890434B2

公开(公告)日：2021-01-12

申请号：US16206467

申请日：2018-11-30

Applicant: Applejack 199 L.P.

Inventor： Wojciech Jan Walecki

IPC: G01B11/06 ,  G01B9/02

Abstract: Inspecting a multilayer sample may include receiving, at a beam splitter, light and splitting the light into first and second portions; combining, at the beam splitter, the first portion of the light after being reflected from a multilayer sample and the second portion of the light after being reflected from a reflector; receiving, at a computer-controlled system for analyzing Fabry-Perot fringes, the combined light and spectrally analyzing the combined light to determine a value of a total power impinging a slit of the system for analyzing Fabry-Perot fringes; determining an optical path difference (OPD); recording an interferogram that plots the value versus the OPD for the OPD; performing the previous acts of the method one or more additional times with a different OPD; and using the interferogram for each of the different OPDs to determine the thicknesses and order of the layers of the multilayer sample.

公开(公告)号：US10036624B1

公开(公告)日：2018-07-31

申请号：US15919003

申请日：2018-03-12

Applicant: Applejack 199 L.P.

Inventor： Wojciech Jan Walecki ,  Alexander Pravdivtsev

IPC: G01B9/02 ,  G01B11/06

Abstract: A system for inspecting a slab of material may include a polarization maintaining single mode optical-fiber, a linearly polarized broadband light-source configured to emit a polarized-light over the optical fiber, a beam-assembly configured to receive the light over the optical fiber and direct the light toward a slab of material; a polarization-rotator for controlling polarization of the light directed to the slab of material from the beam-assembly; a computer-controlled etalon filter configured to receive the light over the optical fiber, filter the light, and direct the light over the optical fiber; and a computer-controlled spectrometer configured to receive the light over the optical fiber after the light has been filtered by the etalon filter and after the light has been reflected from or transmitted through the slab of material and spectrally analyze the light.