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公开(公告)号:US10854483B2
公开(公告)日:2020-12-01
申请号:US16157808
申请日:2018-10-11
Applicant: Applied Materials, Inc.
Inventor: Jason M. Schaller , Robert Brent Vopat , Charles T. Carlson , Jeffrey Charles Blahnik , Timothy J. Franklin , David Blahnik , Aaron Webb
IPC: F27D1/18 , H01L21/67 , H01L21/673 , H01L21/687
Abstract: Apparatuses for annealing semiconductor substrates, such as a batch processing chamber, are provided herein. The batch processing chamber includes a chamber body enclosing an internal volume, a cassette moveably disposed within the internal volume and a plug coupled to a bottom wall of the cassette. The chamber body has a hole through a bottom wall of the chamber body and is interfaced with one or more heaters operable to maintain the chamber body at a temperature of greater than 290° C. The cassette is configured to be raised to load a plurality of substrates thereon and lowered to seal the internal volume. The plug is configured to move up and down within the internal volume. The plug includes a downward-facing seal configured to engage with a top surface of the bottom wall of the chamber body and close the hole through the bottom wall of the chamber body.
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公开(公告)号:US11306824B2
公开(公告)日:2022-04-19
申请号:US16642827
申请日:2018-09-28
Applicant: Applied Materials, Inc.
Inventor: Benjamin B. Riordon , Charles T. Carlson , Aaron Webb , Gary Wyka
Abstract: The present disclosure generally relates to an isolation device for use in processing systems. The isolation device has a body with an inlet opening disposed at a first end coupled to a processing system component such as a remote plasma source and outlet openings, for example two, disposed at a second end which are coupled to a processing system component such as a process chamber. Flaps disposed within the body are actuatable to an open position from a closed position or to a closed position from an open position, to selectively allow or prevent passage of a fluid from the processing system component coupled to the isolation device to the other processing system component coupled thereto.
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公开(公告)号:US10969029B2
公开(公告)日:2021-04-06
申请号:US16341703
申请日:2017-12-01
Applicant: Applied Materials, Inc.
Inventor: Charles T. Carlson , Tammy Jo Pride , Benjamin B. Riordon , Aaron Webb
Abstract: Embodiments of the disclosure generally relate to a flapper valve. The flapper valve may be used with processing chambers, such as semiconductor substrate processing chambers. In one embodiment, a flapper valve includes a housing having a first opening at a first end thereof and a second opening at a second end thereof, a first flapper pivotably disposed in the housing, and a second flapper pivotably disposed in the housing. The first and second flappers are movable to selectively open and close at least one of the first opening and the second opening.
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