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公开(公告)号：US12049696B2
公开(公告)日：2024-07-30
申请号：US17344854
申请日：2021-06-10
Applicant: Applied Materials, Inc.
Inventor： Xiaowei Wu , Jennifer Y. Sun , Michael R. Rice
IPC: C23C14/00 , C23C14/08 , C23C16/40 , C23C16/455 , C30B29/16 , C30B29/68 , H01J37/32 , H01L21/02 , H01L21/67 , H01L23/29 , H10N60/85
CPC classification number: C23C16/405 , C23C14/083 , C23C16/403 , C23C16/45542 , C30B29/16 , C30B29/68 , H01J37/32477 , H01L21/02192 , H01L21/0228 , H01L21/67161 , H01L23/291 , H10N60/855
Abstract: A lid or other chamber component for a process chamber comprises a) at least one surface comprising a first ceramic material, wherein the first ceramic material comprises Y3Al5O12 and b) an internal region beneath the at least one surface comprising a second ceramic material, wherein the second ceramic material comprises a combination of Al2O3 and ZrO2.
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公开(公告)号：US11639547B2
公开(公告)日：2023-05-02
申请号：US16401467
申请日：2019-05-02
Applicant: Applied Materials, Inc.
Inventor： Prerna Goradia , Jennifer Y. Sun , Xiaowei Wu , Geetika Bajaj , Atul Chaudhari , Ankur Kadam
Abstract: Described herein are articles, systems and methods where a halogen resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The halogen resistant coating has an optional amorphous seed layer and a transition metal-containing layer. The halogen resistant coating uniformly covers features of the chamber component, such as those having an aspect ratio of about 3:1 to about 300:1.
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公开(公告)号：US11008653B2
公开(公告)日：2021-05-18
申请号：US15844335
申请日：2017-12-15
Applicant: Applied Materials, Inc.
Inventor： David Fenwick , Xiaowei Wu , Jennifer Y. Sun
Abstract: A multi-layer coating for a surface of an article comprises a diffusion barrier layer and an erosion resistant layer. The diffusion barrier layer may be a nitride film including but not limited to TiNx, TaNx, Zr3N4, and TiZrxNy. The erosion resistant layer may be a rare oxide film comprising YZrxOy. The diffusion barrier layer and the erosion resistant layer may be deposited on the article's surface using a thin film deposition technique including but not limited to, ALD, PVD, and CVD.
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公开(公告)号：US20200181771A1
公开(公告)日：2020-06-11
申请号：US16211335
申请日：2018-12-06
Applicant: Applied Materials, Inc.
Inventor： Xiaowei Wu , Jennifer Y. Sun , Michael R. Rice
IPC: C23C16/40 , C23C16/455
Abstract: Certain embodiments of the present disclosure relate to coated articles and methods of coating articles. In one embodiment, a coated article comprises an article adapted for use in a processing chamber, and a coating formed on exterior and interior surfaces of the article. In one embodiment, the coating comprises a rare earth metal-containing ceramic, and the coating is substantially uniform, conformal, and porosity-free.
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公开(公告)号：US10443126B1
公开(公告)日：2019-10-15
申请号：US15947402
申请日：2018-04-06
Applicant: Applied Materials, Inc.
Inventor： Xiaowei Wu , Jennifer Y. Sun , Michael R. Rice
IPC: C23C16/455 , C23C16/40 , C23C14/08 , H01L21/67 , H01L21/02
Abstract: Disclosed herein is a rare-earth oxide coating on a surface of an article with one or more interruption layers to control crystal growth and methods of its formation. The coating may be deposited by atomic layer deposition and/or by chemical vapor deposition. The rare-earth oxides in the coatings disclosed herein may have an atomic crystalline phase that is different from the atomic crystalline phase or the amorphous phase of the one or more interruption layers.
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Patent Agency Ranking
公开(公告)号：US20180112311A1
公开(公告)日：2018-04-26
申请号：US15844335
申请日：2017-12-15
Applicant: Applied Materials, Inc.
Inventor： David Fenwick , Xiaowei Wu , Jennifer Y. Sun
IPC: C23C16/455 , C23C16/40 , C23C16/34 , C23C14/08 , C23C14/06
CPC classification number: C23C16/45525 , C23C14/0641 , C23C14/08 , C23C16/34 , C23C16/40 , C23C16/405
Abstract: A multi-layer coating for a surface of an article comprises a diffusion barrier layer and an erosion resistant layer. The diffusion barrier layer may be a nitride film including but not limited to TiNx, TaNx, Zr3N4, and TiZrxNy. The erosion resistant layer may be a rare oxide film comprising YZrxOy. The diffusion barrier layer and the erosion resistant layer may be deposited on the article's surface using a thin film deposition technique including but not limited to, ALD, PVD, and CVD.
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公开(公告)号：US12002657B2
公开(公告)日：2024-06-04
申请号：US17534013
申请日：2021-11-23
Applicant: Applied Materials, Inc.
Inventor： Xiaowei Wu , David Fenwick , Jennifer Y. Sun , Guodong Zhan
IPC: B32B15/04 , B32B17/06 , C23C16/04 , C23C16/06 , C23C16/40 , C23C16/44 , C23C16/455 , C23C16/50 , H01J37/32 , H01L21/67
CPC classification number: H01J37/32495 , C23C16/045 , C23C16/06 , C23C16/403 , C23C16/405 , C23C16/4404 , C23C16/45527 , C23C16/45529 , C23C16/45531 , C23C16/45544 , C23C16/45565 , C23C16/50 , H01J37/3244 , H01J2237/3321 , H01J2237/334 , H01J2237/335 , H01L21/67028 , H01L21/67069
Abstract: Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of an article using an atomic layer deposition (ALD) process. The plasma resistant coating has a first layer and a second layer including a solid solution of Y2O3—ZrO2 and uniformly covers features, such as those having an aspect ratio of length to width of about 3:1 to about 300:1.
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公开(公告)号：US11667578B2
公开(公告)日：2023-06-06
申请号：US17686053
申请日：2022-03-03
Applicant: Applied Materials, Inc.
Inventor： Guodong Zhan , Xiaowei Wu , Xiao Ming He , Jennifer Y. Sun
IPC: C04B35/505 , C23C16/30 , C23C16/455 , C23C4/134 , C23C4/10 , C04B35/628 , C04B35/622 , C04B35/64 , C04B35/632 , C23C16/44 , C04B35/486 , C23C14/34 , C04B35/645 , C23C16/40 , C01F17/265 , C01F17/218
CPC classification number: C04B35/505 , C01F17/218 , C01F17/265 , C04B35/486 , C04B35/62222 , C04B35/62813 , C04B35/62815 , C04B35/62823 , C04B35/62828 , C04B35/62884 , C04B35/62889 , C04B35/62897 , C04B35/6325 , C04B35/64 , C04B35/645 , C23C4/10 , C23C4/134 , C23C14/3414 , C23C16/30 , C23C16/405 , C23C16/4417 , C23C16/45525 , C23C16/45555 , C01P2004/64 , C01P2004/84 , C04B2235/3222 , C04B2235/3224 , C04B2235/3225 , C04B2235/3227 , C04B2235/3244 , C04B2235/441 , C04B2235/445 , C04B2235/52 , C04B2235/528 , C04B2235/5454 , C04B2235/666 , C04B2235/77 , C04B2235/96 , C04B2235/9607
Abstract: Methods of forming nanoceramic materials and components. The methods may include performing atomic layer deposition to form a plurality of nanoparticles, including forming a thin film coating over core particles, or sintering the nanoparticles in a mold. The nanoparticles can include a first material selected from a rare earth metal-containing oxide, a rare earth metal-containing fluoride, a rare earth metal-containing oxyfluoride or combinations thereof.
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公开(公告)号：US20220157568A1
公开(公告)日：2022-05-19
申请号：US17534013
申请日：2021-11-23
Applicant: Applied Materials, Inc.
Inventor： Xiaowei Wu , David Fenwick , Jennifer Y. Sun , Guodong Zhan
Abstract: Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of an article using an atomic layer deposition (ALD) process. The plasma resistant coating has a first layer and a second layer including a solid solution of Y2O3-ZrO2 and uniformly covers features, such as those having an aspect ratio of length to width of about 3:1 to about 300:1.
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公开(公告)号：US20200185200A1
公开(公告)日：2020-06-11
申请号：US16734828
申请日：2020-01-06
Applicant: Applied Materials, Inc.
Inventor： Xiaowei Wu , David Fenwick , Jennifer Y. Sun , Guodong Zhan
Abstract: Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The plasma resistant coating has a stress relief layer and a layer comprising a solid solution of Y2O3—ZrO2 and uniformly covers features, such as those having an aspect ratio of about 3:1 to about 300:1.
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