公开(公告)号：US20140198899A1

公开(公告)日：2014-07-17

申请号：US13739871

申请日：2013-01-11

Applicant: Vitaliy Ziskin ,  Boris Oreper

Inventor： Vitaliy Ziskin ,  Boris Oreper

IPC: G01N23/04

CPC classification number: G01N23/04 ,  G01T1/2985 ,  G01V5/0041 ,  G01V5/005

Abstract: An inspection system that makes dual energy measurements with a detector array that has selective placement of filter elements adjacent a subset of detectors in the array to provide at least two subsets of detector elements sensitive to X-rays of different energies. Dual energy measurements may be made on objects of interest within an item under inspection by forming a volumetric image using measurements from detectors in a first of the subsets and synthetic readings computed from measurements made with detectors in the array, including those that are filtered. The volumetric image may be used to identify the objects of interest to and source points that, for each object of interest, provide a low interference path to one of the detectors in the second of the subsets. Measurements made with radiation emanating from those source points are used for dual energy analysis of the objects of interest.

Abstract translation: 一种检测系统，其利用检测器阵列进行双能量测量，所述检测器阵列具有与阵列中的检测器子集相邻的滤波器元件的选择性放置，以提供对不同能量的X射线敏感的检测器元件的至少两个子集。 可以通过使用来自第一子集中的检测器的测量形成体积图像，并且通过阵列中的检测器（包括被过滤的检测器）进行的测量计算的合成读数来形成体积图像，来对被检查物品内的感兴趣对象进行双能量测量。 体积图像可以用于识别感兴趣的对象和源点，对于每个感兴趣对象，在第二个子集中的一个检测器提供低干扰路径。 使用从这些源点发出的辐射进行的测量用于感兴趣对象的双能量分析。

公开(公告)号：US20120008746A1

公开(公告)日：2012-01-12

申请号：US13236011

申请日：2011-09-19

Applicant: Boris Oreper ,  Douglas P. Boyd ,  Nikolay Rolshud

Inventor： Boris Oreper ,  Douglas P. Boyd ,  Nikolay Rolshud

IPC: A61N5/10

CPC classification number: A61N5/1049 ,  A61B6/032 ,  A61B6/4007 ,  A61B6/4028 ,  A61B6/466 ,  A61B6/508 ,  A61N5/1067 ,  A61N2005/1061

Abstract: A property of a treatment beam is controlled during a scanning period. A portion of a region is exposed to an imaging x-ray beam during a scanning period, the imaging x-ray beam being generated by an electron-beam scanner. X-ray radiation from the region is detected, the x-ray radiation representing an attenuation of the imaging x-ray beam caused by the portion of the region. A first image of the portion of the region is generated based on the detected x-ray radiation. A characteristic of the portion of the region is determined from the generated first image. An input derived from the characteristic is generated, the input configured to cause a source of a treatment beam to modify a property of the treatment beam. The source of the treatment beam modifies a property of the treatment beam during the scanning period by providing the input to the source of the treatment beam.

Abstract translation: 处理光束的特性在扫描期间被控制。 在扫描期间，区域的一部分暴露于成像x射线束，成像x射线束由电子束扫描器产生。 检测到来自该区域的X射线辐射，X射线辐射代表由该区域的该部分引起的成像x射线束的衰减。 基于检测到的x射线辐射产生区域的该部分的第一图像。 从所生成的第一图像确定区域的该部分的特征。 产生从该特征得到的输入，该输入被配置为使治疗束的源改变治疗束的特性。 治疗束的源通过向治疗束的源提供输入来在扫描期间改变治疗束的特性。

公开(公告)号：US20100329423A1

公开(公告)日：2010-12-30

申请号：US12871981

申请日：2010-08-31

Applicant: Boris Oreper ,  Douglas P. Boyd ,  Nikolay Rolshud

Inventor： Boris Oreper ,  Douglas P. Boyd ,  Nikolay Rolshud

IPC: A61N5/10

CPC classification number: A61N5/1049 ,  A61B6/032 ,  A61B6/4007 ,  A61B6/4028 ,  A61B6/466 ,  A61B6/508 ,  A61N5/1067 ,  A61N2005/1061

Abstract: A property of a treatment beam is controlled during a scanning period. A portion of a region is exposed to an imaging x-ray beam during a scanning period, the imaging x-ray beam being generated by an electron-beam scanner. X-ray radiation from the region is detected, the x-ray radiation representing an attenuation of the imaging x-ray beam caused by the portion of the region. A first image of the portion of the region is generated based on the detected x-ray radiation. A characteristic of the portion of the region is determined from the generated first image. An input derived from the characteristic is generated, the input configured to cause a source of a treatment beam to modify a property of the treatment beam. The source of the treatment beam modifies a property of the treatment beam during the scanning period by providing the input to the source of the treatment beam.

Abstract translation: 处理光束的特性在扫描期间被控制。 在扫描期间，区域的一部分暴露于成像x射线束，成像x射线束由电子束扫描器产生。 检测到来自该区域的X射线辐射，X射线辐射代表由该区域的该部分引起的成像x射线束的衰减。 基于检测到的x射线辐射产生区域的该部分的第一图像。 从所生成的第一图像确定区域的该部分的特征。 产生从该特征得到的输入，该输入被配置为使治疗束的源改变治疗束的特性。 治疗束的源通过向治疗束的源提供输入来在扫描期间改变治疗束的特性。

公开(公告)号：US20080075230A1

公开(公告)日：2008-03-27

申请号：US11903035

申请日：2007-09-20

Applicant: Boris Oreper ,  Richard Eilbert

Inventor： Boris Oreper ,  Richard Eilbert

IPC: H01J35/20

CPC classification number: H01J35/14 ,  A61B6/032 ,  A61B6/4028 ,  A61B6/482 ,  H01J35/30 ,  H01J2235/086

Abstract: Various novel apparatuses and methods for generating X-rays are disclosed. In some embodiments, for example, an apparatus may be configured and arranged so that, for at least one interception point on a particular portion of a scan path on a surface of a target along which a steering element steers an accelerated electron beam (e-beam), both an angle and its complement between a line corresponding to a direction in which the accelerated e-beam is traveling at the interception point and a line oriented normal to the surface of the target at such interception point are greater than forty five degrees.

Abstract translation: 公开了用于产生X射线的各种新颖的装置和方法。 在一些实施例中，例如，可以对装置进行配置和布置，使得对于目标表面上的扫描路径的特定部分上的至少一个截取点，操纵元件沿着该截取点转向加速的电子束（e- 光束），在与截取点处的加速电子束行进的方向对应的线和在该截取点处与靶的表面垂直的线之间的角度及其补码都大于四十五度 。

公开(公告)号：US06225814B1

公开(公告)日：2001-05-01

申请号：US09290288

申请日：1999-04-13

Applicant: Boris Oreper ,  Mark Lowe ,  Charles McWilliams ,  Charles Malacaria ,  Anthony Coviello ,  Jay Winters

Inventor： Boris Oreper ,  Mark Lowe ,  Charles McWilliams ,  Charles Malacaria ,  Anthony Coviello ,  Jay Winters

IPC: G01R2708

CPC classification number: G01L5/0085

Abstract: This invention relates to apparatus for detecting the contact or nip width between two contacting surfaces. The apparatus includes first and second insulating substrates each of which has a pattern of conductive material formed on a facing inner surface thereof, which substrates are adapted to be fitted between the contacting surfaces. For a first embodiment, the pattern of conductive material on one substrate includes a pair of conductive terminals spaced by a distance greater than the contact width to be measured and the conductive pattern on the other substrate includes a conductor which extends over at least a distance greater than the maximum width W to be measured. A resistance path is provided between the conductive terminals having a resistance R0 which is higher than that of the conductor and material is provided in the space between the conductor and the resistance path which material substantially permits current flow therethrough between the conductor and the resistance path in areas where the contacting surfaces are not in contact and which has a resistance less than R0 permitting current flow therethrough in areas where the contact surfaces are in contact. Circuitry is also provided for applying current to one of the terminals and for utilizing the difference in current flow between the terminals to determine contact width. For a second embodiment, the conductive pattern on one substrate includes N substantially parallel and evenly spaced conductive columns and the pattern on the other substrate is a plurality of substantially parallel and evenly spaced rows. The columns are divided into M groups, where M is an integer which is at least 2, and each of the rows is at an angle &thgr; to a line perpendicular to the columns when extending across alternate ones of the groups and at an angle −&thgr; when extending across the remaining groups. The number of columns in each group is selected to achieve a desired resolution, and &thgr; is selected so that the distance in the direction of the columns between the ends of a row for each group is substantially equal to the spacing between adjacent rows.

公开(公告)号：US08059783B2

公开(公告)日：2011-11-15

申请号：US12871981

申请日：2010-08-31

Applicant: Boris Oreper ,  Douglas P. Boyd ,  Nikolay Rolshud

Inventor： Boris Oreper ,  Douglas P. Boyd ,  Nikolay Rolshud

IPC: A61N5/10

CPC classification number: A61N5/1049 ,  A61B6/032 ,  A61B6/4007 ,  A61B6/4028 ,  A61B6/466 ,  A61B6/508 ,  A61N5/1067 ,  A61N2005/1061

Abstract: A property of a treatment beam is controlled during a scanning period. A portion of a region is exposed to an imaging x-ray beam during a scanning period, the imaging x-ray beam being generated by an electron-beam scanner. X-ray radiation from the region is detected, the x-ray radiation representing an attenuation of the imaging x-ray beam caused by the portion of the region. A first image of the portion of the region is generated based on the detected x-ray radiation. A characteristic of the portion of the region is determined from the generated first image. An input derived from the characteristic is generated, the input configured to cause a source of a treatment beam to modify a property of the treatment beam. The source of the treatment beam modifies a property of the treatment beam during the scanning period by providing the input to the source of the treatment beam.

Abstract translation: 处理光束的特性在扫描期间被控制。 在扫描期间，区域的一部分暴露于成像x射线束，成像x射线束由电子束扫描器产生。 检测到来自该区域的X射线辐射，X射线辐射代表由该区域的该部分引起的成像x射线束的衰减。 基于检测到的x射线辐射产生区域的该部分的第一图像。 从所生成的第一图像确定区域的该部分的特征。 产生从该特征得到的输入，该输入被配置为使治疗束的源修改治疗束的特性。 治疗束的源通过向治疗束的源提供输入来在扫描期间改变治疗束的特性。

公开(公告)号：US07899156B2

公开(公告)日：2011-03-01

申请号：US12503560

申请日：2009-07-15

Applicant: Boris Oreper ,  Douglas P. Boyd ,  Nikolay Rolshud

Inventor： Boris Oreper ,  Douglas P. Boyd ,  Nikolay Rolshud

IPC: A61N5/10

CPC classification number: A61N5/1049 ,  A61B6/032 ,  A61B6/4007 ,  A61B6/4028 ,  A61B6/466 ,  A61B6/508 ,  A61N5/1067 ,  A61N2005/1061

Abstract: A property of a treatment beam is controlled during a scanning period. A portion of a region is exposed to an imaging x-ray beam during a scanning period, the imaging x-ray beam being generated by an electron-beam scanner. X-ray radiation from the region is detected, the x-ray radiation representing an attenuation of the imaging x-ray beam caused by the portion of the region. A first image of the portion of the region is generated based on the detected x-ray radiation. A characteristic of the portion of the region is determined from the generated first image. An input derived from the characteristic is generated, the input configured to cause a source of a treatment beam to modify a property of the treatment beam. The source of the treatment beam modifies a property of the treatment beam during the scanning period by providing the input to the source of the treatment beam.

公开(公告)号：US20100284509A1

公开(公告)日：2010-11-11

申请号：US12776042

申请日：2010-05-07

Applicant: Boris Oreper

Inventor： Boris Oreper

IPC: A61B6/03 ,  G01N23/04 ,  G01N23/06

CPC classification number: G03B42/02 ,  A61B6/03 ,  A61B6/4028 ,  A61B6/4266 ,  A61B6/4488 ,  A61B6/482 ,  G01V5/0041 ,  G01V5/0058

Abstract: A dual energy inspection system that generates X-rays with an electron beam scanned over targets. A switchable voltage source that can be change its voltage output may cause X-rays to be generated at different energies. This X-ray generation subsystem is controlled by a sequencer that provides beam steering and shaping control inputs that may be dependent on the voltage provided by the voltage source. In another aspect, the dual energy inspection system may use multiple types of detectors, each sensitive to X-rays of a different energy. A relatively small number of detectors sensitive to one energy level is provided. Nonetheless, dual energy measurements may be made on objects within an item under inspection by identifying points that, for each object of interest, provide a low interference path to one of those detectors. Measurements made with radiation emanating from those points are used for dual energy analysis of those objects.

Abstract translation: 一种双能量检测系统，可以在目标上扫描电子束产生X射线。 可以改变其电压输出的可切换电压源可能导致在不同能量下产生X射线。 该X射线发生子系统由定序器控制，该定序器提供可能取决于电压源提供的电压的波束导向和整形控制输入。 在另一方面，双能量检查系统可以使用多种类型的检测器，每种检测器对不同能量的X射线敏感。 提供了对一个能量级别敏感的相对较少数量的检测器。 然而，可以通过识别对于每个感兴趣对象提供到这些检测器中的一个的低干扰路径的点来对被检查项目内的对象进行双能量测量。 使用从这些点发出的辐射进行的测量用于这些物体的双能量分析。

公开(公告)号：US07606349B2

公开(公告)日：2009-10-20

申请号：US11704894

申请日：2007-02-09

Applicant: Boris Oreper ,  Richard F. Eilbert ,  Andrew Dean Foland ,  Kenneth E. Prather ,  Thomas David Plamondon

Inventor： Boris Oreper ,  Richard F. Eilbert ,  Andrew Dean Foland ,  Kenneth E. Prather ,  Thomas David Plamondon

IPC: H01J35/02

CPC classification number: G01V5/0025 ,  G01V5/005

Abstract: A system may comprise a cathode, a target, one or more switches, and a conductive element. The cathode may be configured and arranged to generate an electron beam, and the target may be configured and arranged to emit radiation when electrons in the electron beam impact the target after being accelerated by an energy source. The one or more switches may be configured and arranged to apply either a first voltage or a second voltage from a power supply between the cathode and the target. The conductive element may be disposed between the cathode and the target so as to inhibit the electron beam generated by the cathode from reaching the target when a signal is applied to the conductive element.

Abstract translation: 系统可以包括阴极，靶，一个或多个开关和导电元件。 阴极可以被配置和布置成产生电子束，并且靶可以被配置和布置成当电子束中的电子在被能量源加速之后撞击靶时发射辐射。 一个或多个开关可以被配置和布置成施加来自阴极和靶之间的电源的第一电压或第二电压。 导电元件可以设置在阴极和靶之间，以便当信号被施加到导电元件时，抑制由阴极产生的电子束到达目标。

公开(公告)号：US20070030955A1

公开(公告)日：2007-02-08

申请号：US11351998

申请日：2006-02-10

Applicant: Richard Eilbert ,  Boris Oreper ,  Nicholas Gillett

Inventor： Richard Eilbert ,  Boris Oreper ,  Nicholas Gillett

IPC: G01N23/201

CPC classification number: G01V5/0025

Abstract: A radiation (e.g., X-ray) source and collimator assembly with no moving parts provides a swept-line scan of radiation suitable for imaging or analyzing radiation scattered from an object. Scatter radiation is sensed by (e.g., scintillation devices) to produce a signal which is then able to be processed to produce an image, or to be analyzed.

Abstract translation: 具有没有运动部件的辐射（例如，X射线）源和准直器组件提供适于成像或分析从物体散射的辐射的辐射的扫描线扫描。 散射辐射由（例如，闪烁装置）感测以产生信号，然后能够对其进行处理以产生图像或进行分析。