公开(公告)号：US10081733B2

公开(公告)日：2018-09-25

申请号：US14984330

申请日：2015-12-30

Applicant: Clearview Films Ltd.

Inventor： Ilana Haymov ,  Nikolay Yaframenko ,  Dov Zamir ,  Arkady Garbar ,  Dmitry Lekhtman

IPC: H01B1/02 ,  B05D5/12 ,  C09D5/24 ,  H01B1/22 ,  B22F7/04 ,  C23C24/08 ,  C23C26/00 ,  B05D7/02

CPC classification number: C09D5/24 ,  B05D5/12 ,  B05D7/02 ,  B22F7/04 ,  C23C24/08 ,  C23C26/00 ,  H01B1/02 ,  H01B1/22

Abstract: A process is disclosed for the delayed sintering of metal nanoparticles in a self-assembled transparent conductive coating by incorporating a sintering additive into the water phase of the emulsion used to form the coating. The sintering additive reduces the standard reduction potential of the metal ion of the metal forming the nanoparticles by an amount greater than 0.1V but less than the full reduction potential of the metal ion. Emulsion compositions used in the process are also disclosed.

公开(公告)号：US10240050B2

公开(公告)日：2019-03-26

申请号：US14345524

申请日：2012-09-19

Applicant: Clearview Films Ltd.

Inventor： Arkady Garbar ,  Eric L. Granstrom ,  Joseph Masrud

IPC: B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  C25F3/00 ,  C09D5/24 ,  C23F1/02 ,  G03F7/16 ,  B05D3/00

Abstract: A method of producing an article is described. The method includes (a) providing a substrate comprising an etchable surface layer; (b) coating the etchable surface layer with a composition comprising a non-volatile, etch-resistant component in a volatile liquid carrier; and (c) drying the composition to remove the liquid carrier, whereupon the non-volatile, etch-resistant component self-assembles to form etch-resistant traces on the etchable surface layer. The liquid carrier is in the form of an emulsion comprising a continuous phase and a second phase in the form of domains dispersed in the continuous phase.