公开(公告)号：US20130070332A1

公开(公告)日：2013-03-21

申请号：US13675972

申请日：2012-11-13

Applicant: CYMER, INC.

Inventor： Norbert R. Bowering ,  Oleh V. Khodykin

IPC: G02B5/08

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G01J1/429 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70975 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the minor with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.

Abstract translation: 公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。 该方法可以包括以下步骤/动作：用具有波长在EUV谱外的光照射至少一部分未成年人，在光从反射镜反射之后测量光的至少一部分，并使用该测量和 镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。 还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料 技术，并沉积覆盖中间材料的多层镜面涂层。

公开(公告)号：US10185234B2

公开(公告)日：2019-01-22

申请号：US13645253

申请日：2012-10-04

Applicant: Cymer Inc.

Inventor： Alexander I. Ershov ,  Norbert R. Bowering ,  Bruno M. La Fontaine ,  Silvia De Dea

IPC: G02B5/08 ,  G03F7/20

Abstract: Optical element protection systems for protecting optical elements and particularly reflective optical elements from degradation of their optical properties in harsh environments such as the environment inside a vacuum chamber of an EUV light source. The systems include the uses of combinations of materials in various layers where the materials are chosen and the layers are configured and arranged to extend the lifetime of the optical element without compromising its optical properties.

公开(公告)号：US20140098413A1

公开(公告)日：2014-04-10

申请号：US13645253

申请日：2012-10-04

Applicant: CYMER INC.

Inventor： Alexander I. ERSHOV ,  Norbert R. Bowering ,  Bruno M. La Fontaine ,  Silvia De Dea

IPC: G02B5/08

CPC classification number: G03F7/70958 ,  G02B5/0891 ,  G03F7/70983

Abstract: Optical element protection systems for protecting optical elements and particularly reflective optical elements from degradation of their optical properties in harsh environments such as the environment inside a vacuum chamber of an EUV light source. The systems include the uses of combinations of materials in various layers where the materials are chosen and the layers are configured and arranged to extend the lifetime of the optical element without compromising its optical properties.

Abstract translation: 用于保护光学元件，特别是反射光学元件的光学元件保护系统免受其在恶劣环境（例如EUV光源的真空室内的环境）下的光学性能的劣化。 这些系统包括在各种层中的材料的组合的使用，其中材料被选择并且层被配置和布置以延长光学元件的寿命而不损害其光学性质。

公开(公告)号：US08686370B2

公开(公告)日：2014-04-01

申请号：US13675972

申请日：2012-11-13

Applicant: Cymer, Inc.

Inventor： Norbert R. Bowering ,  Oleh V. Khodykin

IPC: G01J1/00

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G01J1/429 ,  G03F7/70941 ,  G03F7/70958 ,  G03F7/70975 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.

Abstract translation: 公开了一种用于EUV反射镜的原位监测以确定光学降解程度的方法。 该方法可以包括用具有波长在EUV谱以外的波长的光照射反射镜的至少一部分的步骤/动作，在光已经从反射镜反射之后测量光的至少一部分，并且使用该测量和 镜面退化和光反射率之间的预定关系，以估计多层镜面退化的程度。 还公开了一种用于制备近似法线入射的EUV反射镜的方法，该反射镜可以包括提供金属基底的步骤/动作，转动基底的表面的金刚石，使用物理气相沉积沉积覆盖表面的至少一种中间材料 技术，并沉积覆盖中间材料的多层镜面涂层。