公开(公告)号：US08703088B2

公开(公告)日：2014-04-22

申请号：US13953107

申请日：2013-07-29

Applicant: Cytec Technology Corp.

Inventor： Morris Lewellyn ,  Alan S. Rothenberg ,  Haunn-Lin Tony Chen ,  Lino G. Magliocco ,  Thomas P. Sassi

IPC: C01B21/20 ,  C02F1/68 ,  C01B21/14 ,  C01B21/16 ,  C02F1/00 ,  B03D1/001 ,  C02F5/10 ,  C02F5/12 ,  C02F5/14

CPC classification number: C01B21/1481 ,  C01B21/14 ,  C01B21/1472 ,  C01B21/16 ,  C01F7/0653 ,  C02F1/68 ,  C02F5/10 ,  C02F5/12 ,  C02F5/14 ,  C08F8/32 ,  C08F120/56

Abstract: The present invention relates to processes for reducing or eliminating the amount of hydrazine from a hydroxylamine-free base containing hydrazine by treating said hydroxylamine-free base with a scavenger agent, and to the hydroxylamine-free base thereby obtained, as well as to its use for producing microdispersions containing a hydroxamated polymer for use as a flocculant in the Bayer process.

Abstract translation: 本发明涉及通过用清除剂处理所述不含羟胺的碱和由此获得的不含羟胺的碱来还原或除去含有羟基胺的肼的肼的方法及其用途 用于生产含有用于拜耳法中絮凝剂的异羟肟酸聚合物的微分散体。