公开(公告)号：US11035038B2

公开(公告)日：2021-06-15

申请号：US15766251

申请日：2016-10-06

Applicant: Entegris, Inc.

Inventor： Thomas H. Baum ,  Yuqi Li ,  David James Eldridge ,  Robert L. Wright

IPC: C09D1/00 ,  C23C16/448 ,  C04B35/00 ,  B22F3/02 ,  C04B35/515 ,  C04B35/63 ,  C04B35/634 ,  C09D5/00

Abstract: A solid delivery precursor is described, which is useful for volatilization to generate precursor vapor for a vapor deposition process. The solid delivery precursor comprises solid bodies of compacted particulate precursor, e.g., in a form such as pellets, platelets, tablets, beads, discs, or monoliths. When utilized in a vapor deposition process such as chemical vapor deposition, pulsed chemical vapor deposition, or atomic layer deposition, the solid delivery precursor in the form of solid bodies of compacted particulate precursor provide substantially increased flux of precursor vapor when subjected to volatilization conditions, in relation to the particulate precursor. As a result, vapor deposition process operation can be carried out in shorter periods of time, thereby achieving increased manufacturing rates of products such as semiconductor products, flat-panel displays, solar panels, LEDs, optical coatings, and the like.

公开(公告)号：US20180282863A1

公开(公告)日：2018-10-04

申请号：US15766251

申请日：2016-10-06

Applicant: Entegris, Inc.

Inventor： Thomas H. Baum ,  Yuqi Li ,  David James Eldridge ,  Robert L. Wright

IPC: C23C16/448 ,  B22F3/02 ,  C09D5/00 ,  C09D1/00 ,  C04B35/515 ,  C04B35/63 ,  C04B35/634

Abstract: A solid delivery precursor is described, which is useful for volatilization to generate precursor vapor for a vapor deposition process. The solid delivery precursor comprises solid bodies of compacted particulate precursor, e.g., in a form such as pellets, platelets, tablets, beads, discs, or monoliths. When utilized in a vapor deposition process such as chemical vapor deposition, pulsed chemical vapor deposition, or atomic layer deposition, the solid delivery precursor in the form of solid bodies of compacted particulate precursor provide substantially increased flux of precursor vapor when subjected to volatilization conditions, in relation to the particulate precursor. As a result, vapor deposition process operation can be carried out in shorter periods of time, thereby achieving increased manufacturing rates of plays, solar panels, LEDs, optical coatings, and the like.

公开(公告)号：US11746413B2

公开(公告)日：2023-09-05

申请号：US17829007

申请日：2022-05-31

Applicant: ENTEGRIS, INC.

Inventor： David James Eldridge ,  David Peters ,  Robert Wright, Jr. ,  Bryan C. Hendrix ,  Scott L. Battle ,  John Gregg

IPC: C23C16/40 ,  C23C16/448 ,  C23C16/52 ,  C23C16/455

CPC classification number: C23C16/4487 ,  C23C16/45512 ,  C23C16/45523 ,  C23C16/45525 ,  C23C16/45561 ,  C23C16/52 ,  H01L21/02271 ,  H01L21/67017

Abstract: A chemical delivery system includes a bulk container, a run/refill chamber, a first conduit and a second conduit. The bulk container stores a precursor. The run/refill chamber includes a plurality of spaced tubes having a plurality of surfaces for receiving the precursor in vapor form and storing the precursor in solid form. The first conduit connects the bulk container to the run/refill chamber for transporting the precursor from the bulk container to the run/refill chamber in vapor form. The second conduit connects the run/refill chamber to a deposition chamber for transporting the precursor from the run/refill chamber to the deposition chamber in vapor form.

公开(公告)号：US20220298629A1

公开(公告)日：2022-09-22

申请号：US17829007

申请日：2022-05-31

Applicant: ENTEGRIS, INC.

Inventor： David James Eldridge ,  David Peters ,  Robert Wright, JR. ,  Bryan C. Hendrix ,  Scott L. Battle, JR. ,  John Gregg

IPC: C23C16/448 ,  C23C16/52 ,  C23C16/455

Abstract: A chemical delivery system includes a bulk container, a run/refill chamber, a first conduit and a second conduit. The bulk container stores a precursor. The run/refill chamber includes a plurality of spaced tubes having a plurality of surfaces for receiving the precursor in vapor form and storing the precursor in solid form. The first conduit connects the bulk container to the run/refill chamber for transporting the precursor from the bulk container to the run/refill chamber in vapor form. The second conduit connects the run/refill chamber to a deposition chamber for transporting the precursor from the run/refill chamber to the deposition chamber in vapor form.

公开(公告)号：US11421320B2

公开(公告)日：2022-08-23

申请号：US16210244

申请日：2018-12-05

Applicant: ENTEGRIS, INC.

Inventor： David James Eldridge ,  David Peters ,  Robert Wright, Jr. ,  Bryan C. Hendrix ,  Scott L. Battle ,  John Gregg

IPC: C23C16/40 ,  C23C16/448 ,  C23C16/52 ,  C23C16/455

Abstract: A chemical delivery system includes a bulk container, a run/refill chamber, a first conduit and a second conduit. The bulk container stores a precursor. The run/refill chamber includes a plurality of spaced tubes having a plurality of surfaces for receiving the precursor in vapor form and storing the precursor in solid form. The first conduit connects the bulk container to the run/refill chamber for transporting the precursor from the bulk container to the run/refill chamber in vapor form. The second conduit connects the run/refill chamber to a deposition chamber for transporting the precursor from the run/refill chamber to the deposition chamber in vapor form.