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1.发明授权公开(公告)号：US10190953B2
公开(公告)日：2019-01-29
申请号：US15802038
申请日：2017-11-02
Applicant: FEI Company
Inventor： Guillaume Delpy , Guillaume Audoit , Laurens Franz Taemsz Kwakman , Chad Rue , Jorge Filevich
IPC: G01N1/00 , G01N1/28 , H01J37/08 , H01J37/147 , G01N1/06 , H01J37/305
Abstract: Sample pillars for x-ray tomography or other tomography scanning are created using an innovative milling strategy on a Plasma-FIB. The strategies are provided in methods, systems, and program products executable to perform the strategies herein. The milling strategy creates an asymmetrical crater around a sample pillar, and provides a single cut cut-free process. Various embodiments may include tuning the ion dose as a function of pixel coordinates along with optimization of the beam scan and crater geometries, drastically reducing the preparation time and significantly improving the overall workflow efficiency. A novel cut-free milling pattern is provided with a crescent shape and optimized dwell-time values.
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公开(公告)号：US20190017942A1
公开(公告)日：2019-01-17
申请号：US16032889
申请日：2018-07-11
Applicant: FEI Company
Inventor： Jorge Filevich
IPC: G01N23/046 , H01J35/08
CPC classification number: G01N23/046 , G01N2223/401 , G01N2223/419 , G21K7/00 , H01J35/08 , H01J2235/081 , H01J2235/086
Abstract: A method and system are disclosed for producing an x-ray image of a sample using a lamella-shaped target to improve the usual tradeoff between imaging resolution and image acquisition time. A beam of electrons impacts the lamella-shaped target normal to the narrower dimension of the lamella which then determines the virtual source size along that axis. For low-energy x-ray generation, the small electron penetration depth parallel to the wider dimension of the lamella determines the virtual source size along that axis. Conductive cooling of the target is improved over post targets with the same imaging resolution. The lamella-shaped target is long enough to ensure that the electron beam does not impact the support structure which would degrade the imaging resolution. Target materials may be selected from the same metals used for bulk or post targets, including tungsten, molybdenum, titanium, scandium, vanadium, silver, or a refractory metal.
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公开(公告)号：US20190013178A1
公开(公告)日：2019-01-10
申请号：US16028622
申请日：2018-07-06
Applicant: FEI Company
Inventor： Cameron James Zachreson , Dolf Timmerman , Milos Toth , Jorge Filevich , Steven Randolph , Aurelien Philippe Jean Maclou Botman
IPC: H01J37/28 , H01J37/147 , G02B26/10 , G02B27/09
CPC classification number: H01J37/28 , G02B26/10 , G02B27/0916 , H01J37/1471 , H01J37/228 , H01J37/265
Abstract: A method and system are disclosed for observing and aligning a beam of light in the sample chamber of a charged particle beam (CPB) system, such as an electron microscope or focused ion beam system. The method comprises providing an imaging aid inside the sample chamber with a calibration surface configured such that when illuminated by light, and simultaneously illuminated by a CPB, the intensity of the secondary radiation induced by the CPB is different in regions also illuminated by light relative to regions with lower light illumination levels, thereby providing an image of the light beam on the calibration surface. The image of the light beam may be used to align the light beam to the charged particle beam.
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公开(公告)号：US20230393074A1
公开(公告)日：2023-12-07
申请号：US17833670
申请日：2022-06-06
Applicant: FEI Company
Inventor： Joseph Christian , Jorge Filevich
CPC classification number: G01N21/65 , H01J3/021 , G01J3/0291 , G01J3/44
Abstract: Methods and apparatus are disclosed for concurrent cleaning and cleanliness monitoring of a sample such as a substrate for electron point projection microscopy. A graphene sample is illuminated by a laser. Raman scattering from contaminants generates secondary light which is analyzed by spectrometer. Based on Raman scattering analysis, sample cleanliness is determined. Cleaning can be dynamically terminated based on achieving a target cleanliness level or based on prediction thereof. Variations and additional applications are disclosed.
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公开(公告)号：US09478390B2
公开(公告)日：2016-10-25
申请号：US14320560
申请日：2014-06-30
Applicant: FEI Company
Inventor： N. William Parker , Marcus Straw , Jorge Filevich , Aurelien Philippe Jean Maclou Botman , Steven Randolph , Clive Chandler , Mark Utlaut
CPC classification number: H01J37/12 , H01J37/228 , H01J2237/006 , H01J2237/31749
Abstract: A method and apparatus for directing light or gas or both to a specimen positioned within about 2 mm from the lower end of a charged particle beam column. The charged particle beam column assembly includes a platform defining a specimen holding position and has a set of electrostatic lenses each including a set of electrodes. The assembly includes a final electrostatic lens that includes a final electrode that is closest to the specimen holding position. This final electrode defines at least one internal passageway having a terminus that is proximal to and directed toward the specimen holding position.
Abstract translation: 一种用于将光或气体或两者引导到位于距离带电粒子束柱的下端约2mm的样本的方法和装置。 带电粒子束柱组件包括限定样品保持位置的平台，并且具有一组静电透镜，每个静电透镜包括一组电极。 组件包括最终静电透镜，其包括最靠近样品保持位置的最终电极。 该最终电极限定至少一个内部通道，其具有靠近并指向试样保持位置的终端。
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Patent Agency Ranking
公开(公告)号：US20150380205A1
公开(公告)日：2015-12-31
申请号：US14320560
申请日：2014-06-30
Applicant: FEI Company
Inventor： N. William Parker , Mark Straw , Jorge Filevich , Aurelien Philippe Jean Maclou Botman , Steven Randolph , Clive Chandler , Mark Utlaut
IPC: H01J37/12
CPC classification number: H01J37/12 , H01J37/228 , H01J2237/006 , H01J2237/31749
Abstract: A method and apparatus for directing light or gas or both to a specimen positioned within about 2 mm from the lower end of a charged particle beam column The charged particle beam column assembly includes a platform defining a specimen holding position and has a set of electrostatic lenses each including a set of electrodes. The assembly includes a final electrostatic lens that includes a final electrode that is closest to the specimen holding position. This final electrode defines at least one internal passageway having a terminus that is proximal to and directed toward the specimen holding position.
Abstract translation: 一种用于将光或气体或两者引导到位于距离带电粒子束柱的下端约2mm的样本的方法和装置。带电粒子束柱组件包括限定样本保持位置并具有一组静电透镜的平台 每个包括一组电极。 组件包括最终静电透镜，其包括最靠近样品保持位置的最终电极。 该最终电极限定至少一个内部通道，其具有靠近并指向试样保持位置的终端。
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公开(公告)号：US10746672B2
公开(公告)日：2020-08-18
申请号：US16032889
申请日：2018-07-11
Applicant: FEI Company
Inventor： Jorge Filevich
IPC: G01N23/046 , G21K7/00 , H01J35/08
Abstract: A method and system are disclosed for producing an x-ray image of a sample using a lamella-shaped target to improve the usual tradeoff between imaging resolution and image acquisition time. A beam of electrons impacts the lamella-shaped target normal to the narrower dimension of the lamella which then determines the virtual source size along that axis. For low-energy x-ray generation, the small electron penetration depth parallel to the wider dimension of the lamella determines the virtual source size along that axis. Conductive cooling of the target is improved over post targets with the same imaging resolution. The lamella-shaped target is long enough to ensure that the electron beam does not impact the support structure which would degrade the imaging resolution. Target materials may be selected from the same metals used for bulk or post targets, including tungsten, molybdenum, titanium, scandium, vanadium, silver, or a refractory metal.
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公开(公告)号：US09349564B2
公开(公告)日：2016-05-24
申请号：US14334293
申请日：2014-07-17
Applicant: FEI Company
Inventor： N. William Parker , Marcus Straw , Jorge Filevich
IPC: H01J37/12 , H01J37/26 , H01J37/244
CPC classification number: H01J37/12 , H01J37/244 , H01J37/26 , H01J37/261 , H01J2237/12 , H01J2237/24415 , H01J2237/2445 , H01J2237/2602
Abstract: A transmissive lens in a charged particle beam column for detecting X-rays and light is provided. The final lens may include elements that are transmissive for X-rays for EDS imaging and analysis or elements that are transmissive for light for cathodoluminescent (CL) imaging and analysis. The final lens may be constructed and arranged to include elements that are transmissive for both X-rays and light for combined EDS and CL imaging and analysis.
Abstract translation: 提供了用于检测X射线和光的带电粒子束列中的透射透镜。 最终的透镜可以包括对于用于EDS成像和分析的X射线透射的元件或对于用于阴极发光（CL）成像和分析的光透射的元件。 最终的透镜可被构造和布置为包括用于X射线和光的透射的元件以用于组合的EDS和CL成像和分析。
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公开(公告)号：US12158372B2
公开(公告)日：2024-12-03
申请号：US17833670
申请日：2022-06-06
Applicant: FEI Company
Inventor： Joseph Christian , Jorge Filevich
Abstract: Methods and apparatus are disclosed for concurrent cleaning and cleanliness monitoring of a sample such as a substrate for electron point projection microscopy. A graphene sample is illuminated by a laser. Raman scattering from contaminants generates secondary light which is analyzed by spectrometer. Based on Raman scattering analysis, sample cleanliness is determined. Cleaning can be dynamically terminated based on achieving a target cleanliness level or based on prediction thereof. Variations and additional applications are disclosed.
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公开(公告)号：US10777383B2
公开(公告)日：2020-09-15
申请号：US16028622
申请日：2018-07-06
Applicant: FEI Company
Inventor： Cameron James Zachreson , Dolf Timmerman , Milos Toth , Jorge Filevich , Steven Randolph , Aurelien Philippe Jean Maclou Botman
Abstract: A method and system are disclosed for observing and aligning a beam of light in the sample chamber of a charged particle beam (CPB) system, such as an electron microscope or focused ion beam system. The method comprises providing an imaging aid inside the sample chamber with a calibration surface configured such that when illuminated by light, and simultaneously illuminated by a CPB, the intensity of the secondary radiation induced by the CPB is different in regions also illuminated by light relative to regions with lower light illumination levels, thereby providing an image of the light beam on the calibration surface. The image of the light beam may be used to align the light beam to the charged particle beam.
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