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公开(公告)号:US20160126395A1
公开(公告)日:2016-05-05
申请号:US14531425
申请日:2014-11-03
Applicant: First Solar, Inc.
Inventor: Dan Damjanovic , Markus Gloeckler , Feng Liao , Andrei Los , Dan Mao , Benjamin Milliron , Gopal Mor , Rick Powell , Kenneth Ring , Aaron Roggelin , Jigish Trivedi , Zhibo Zhao
IPC: H01L31/073 , H01L31/0296 , H01L31/18 , H01L31/0224
Abstract: A photovoltaic device includes a substrate structure and at least one Se-containing layer, such as a CdSeTe layer. A process for manufacturing the photovoltaic device includes forming the CdSeTe layer over a substrate by at least one of sputtering, evaporation deposition, CVD, chemical bath deposition process, and vapor transport deposition process. The process can also include controlling a thickness range of the Se-containing layer.
Abstract translation: 光电器件包括衬底结构和至少一个含硒层,例如CdSeTe层。 制造光伏器件的方法包括通过溅射,蒸发沉积,CVD,化学浴沉积工艺和蒸气迁移沉积工艺中的至少一种在衬底上形成CdSeTe层。 该方法还可以包括控制含Se层的厚度范围。
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公开(公告)号:US10529883B2
公开(公告)日:2020-01-07
申请号:US14531425
申请日:2014-11-03
Applicant: First Solar, Inc.
Inventor: Dan Damjanovic , Markus Gloeckler , Feng Liao , Andrei Los , Dan Mao , Benjamin Milliron , Gopal Mor , Rick Powell , Kenneth Ring , Aaron Roggelin , Jigish Trivedi , Zhibo Zhao
IPC: H01L31/073 , H01L31/0224 , H01L31/0296 , H01L31/18 , H01L31/20
Abstract: A photovoltaic device includes a substrate structure and at least one Se-containing layer, such as a CdSeTe layer. A process for manufacturing the photovoltaic device includes forming the CdSeTe layer over a substrate by at least one of sputtering, evaporation deposition, CVD, chemical bath deposition process, and vapor transport deposition process. The process can also include controlling a thickness range of the Se-containing layer.
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公开(公告)号:US10461207B2
公开(公告)日:2019-10-29
申请号:US14602340
申请日:2015-01-22
Applicant: First Solar, Inc.
Inventor: Dan Damjanovic , Markus Gloeckler , Feng Liao , Andrei Los , Dan Mao , Benjamin Milliron , Gopal Mor , Rick Powell , Kenneth Ring , Aaron Roggelin , Jigish Trivedi , Zhibo Zhao
IPC: H01L31/073 , H01L31/0224 , H01L31/0296 , H01L31/18 , H01L31/20
Abstract: A photovoltaic device includes a substrate structure and at least one Se-containing layer, such as a CdSeTe layer. A process for manufacturing the photovoltaic device includes forming the CdSeTe layer over a substrate by at least one of sputtering, evaporation deposition, CVD, chemical bath deposition process, and vapor transport deposition process. The process can also include controlling a thickness range of the Se-containing layer.
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公开(公告)号:US20160126396A1
公开(公告)日:2016-05-05
申请号:US14602340
申请日:2015-01-22
Applicant: First Solar, Inc.
Inventor: Dan Damjanovic , Markus Gloeckler , Feng Liao , Andrei Los , Dan Mao , Benjamin Milliron , Gopal Mor , Rick Powell , Kenneth Ring , Aaron Roggelin , Jigish Trivedi , Zhibo Zhao
IPC: H01L31/073 , H01L31/18 , H01L31/20 , H01L31/0224
CPC classification number: H01L31/073 , H01L31/022441 , H01L31/022466 , H01L31/0296 , H01L31/02966 , H01L31/1828 , H01L31/1832 , H01L31/1864 , H01L31/1884 , H01L31/208
Abstract: A photovoltaic device includes a substrate structure and at least one Se-containing layer, such as a CdSeTe layer. A process for manufacturing the photovoltaic device includes forming the CdSeTe layer over a substrate by at least one of sputtering, evaporation deposition, CVD, chemical bath deposition process, and vapor transport deposition process. The process can also include controlling a thickness range of the Se-containing layer.
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公开(公告)号:US20240088319A1
公开(公告)日:2024-03-14
申请号:US18507816
申请日:2023-11-13
Applicant: First Solar, Inc.
Inventor: Dan Damjanovic , Markus Gloeckler , Feng Liao , Andrei Los , Dan Mao , Benjamin Milliron , Gopal Mor , Rick Powell , Kenneth Ring , Aaron Roggelin , Jigish Trivedi , Zhibo Zhao
IPC: H01L31/073 , H01L31/0224 , H01L31/0296 , H01L31/18 , H01L31/20
CPC classification number: H01L31/073 , H01L31/022441 , H01L31/022466 , H01L31/0296 , H01L31/02966 , H01L31/1828 , H01L31/1832 , H01L31/1864 , H01L31/1884 , H01L31/208
Abstract: A photovoltaic device includes a substrate structure and at least one Se-containing layer, such as a CdSeTe layer. A process for manufacturing the photovoltaic device includes forming the CdSeTe layer over a substrate by at least one of sputtering, evaporation deposition, CVD, chemical bath deposition process, and vapor transport deposition process. The process can also include controlling a thickness range of the Se-containing layer.
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公开(公告)号:US11817516B2
公开(公告)日:2023-11-14
申请号:US16664737
申请日:2019-10-25
Applicant: First Solar, Inc.
Inventor: Dan Damjanovic , Markus Gloeckler , Feng Liao , Andrei Los , Dan Mao , Benjamin Milliron , Gopal Mor , Rick Powell , Kenneth Ring , Aaron Roggelin , Jigish Trivedi , Zhibo Zhao
IPC: H01L31/073 , H01L31/0224 , H01L31/0296 , H01L31/18 , H01L31/20
CPC classification number: H01L31/073 , H01L31/0296 , H01L31/02966 , H01L31/022441 , H01L31/022466 , H01L31/1828 , H01L31/1832 , H01L31/1864 , H01L31/1884 , H01L31/208
Abstract: A photovoltaic device includes a substrate structure and at least one Se-containing layer, such as a CdSeTe layer. A process for manufacturing the photovoltaic device includes forming the CdSeTe layer over a substrate by at least one of sputtering, evaporation deposition, CVD, chemical bath deposition process, and vapor transport deposition process. The process can also include controlling a thickness range of the Se-containing layer.
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公开(公告)号:US20200058818A1
公开(公告)日:2020-02-20
申请号:US16664737
申请日:2019-10-25
Applicant: First Solar, Inc.
Inventor: Dan Damjanovic , Markus Gloeckler , Feng Liao , Andrei Los , Dan Mao , Benjamin Milliron , Gopal Mor , Rick Powell , Kenneth Ring , Aaron Roggelin , Jigish Trivedi , Zhibo Zhao
IPC: H01L31/073 , H01L31/20 , H01L31/18 , H01L31/0296 , H01L31/0224
Abstract: A photovoltaic device includes a substrate structure and at least one Se-containing layer, such as a CdSeTe layer. A process for manufacturing the photovoltaic device includes forming the CdSeTe layer over a substrate by at least one of sputtering, evaporation deposition, CVD, chemical bath deposition process, and vapor transport deposition process. The process can also include controlling a thickness range of the Se-containing layer.
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