公开(公告)号：US20200215762A1

公开(公告)日：2020-07-09

申请号：US16821486

申请日：2020-03-17

Applicant: Formlabs, Inc.

Inventor： Benjamin FrantzDale ,  Justin Keenan

IPC: B29C64/393 ,  G01B11/00 ,  B33Y50/02

Abstract: Techniques of optically sensing fiducial targets, such as calibration patterns, within an additive fabrication device are provided. In some embodiments, fiducial targets may be disposed on a structure configured to contact source material of the additive fabrication device, the source material being a material from which the device is configured to fabricate solid objects. Indirect sensing means may be employed such that light emitted from a light source of the additive fabrication device scatters from the surface of a fiducial target. At least some of this scattered light can be measured by a sensor and used to determine a position of the fiducial target. In some embodiments, the fiducial target may be configured to move relative to the light source and/or sensor to provide additional information on the target's position via the light scattered from its surface.

公开(公告)号：US20190263055A1

公开(公告)日：2019-08-29

申请号：US16285477

申请日：2019-02-26

Applicant: Formlabs, Inc.

Inventor： Justin Keenan ,  Brendan Pratt ,  Maxim Lobovsky

IPC: B29C64/153 ,  B29C64/268 ,  B29C64/286 ,  B29C64/295

Abstract: Substantially equal amounts of thermal energy may be provided over a build area of an additive fabrication device using as few as one heat source by selectively attenuating thermal energy emitted by the heat source. The thermal energy may be selectively attenuated by a structure that blocks portions of the thermal energy from being directly incident upon the build area such that the heat is normalized over the build area. The heat distribution over the build area may, in some embodiments, approximate the heat distribution produced by a flat field heating element, yet may be produced at comparatively lower cost and with less complex engineering.

公开(公告)号：US20200290282A1

公开(公告)日：2020-09-17

申请号：US16817005

申请日：2020-03-12

Applicant: Formlabs, Inc.

Inventor： Andrew M. Goldman ,  Henry Whitney ,  Justin Keenan ,  Benjamin FrantzDale ,  Michael Fogleman

IPC: B29C64/386 ,  B33Y50/00 ,  G05B19/4099

Abstract: According to some aspects, techniques are provided to more accurately produce fine features in additive fabrication. According to some embodiments, the techniques comprise a process that amplifies exposure to edges and thin positive features whilst not substantially affecting negative features. In particular, an area to be cured may be adapted using signal processing techniques to produce an energy density map. The area may subsequently be cured according to the generated energy density map by, for example, adjusting the scan speed, light power and/or number of passes of the light beam according to the map. As a result, the net exposure to edges and thin positive features may be amplified.

公开(公告)号：US20190047222A1

公开(公告)日：2019-02-14

申请号：US16102912

申请日：2018-08-14

Applicant: Formlabs, Inc.

Inventor： Eduardo Torrealba ,  Steven Thomas ,  Christopher Auld ,  Justin Keenan

IPC: B29C64/245 ,  B29C64/295 ,  B29C64/153 ,  B29C64/218 ,  B29C64/393

Abstract: Techniques for designing and fabricating thermal supports via additive fabrication are described. In some additive fabrication techniques, sufficiently high temperature differentials may contribute to any of a diverse array of part defects and failure modes. Additional volumes, referred to as thermal supports, may be fabricated along with a desired object such that the thermal supports adjusted, in a desired manner, temperatures that would otherwise be experience within the fabrication material during fabrication. For instance, the presence of a thermal support structure may serve to reduce changes in temperature experienced by the material between one or more adjacent layers during fabrication. According to some embodiments, thermal supports may be generated to be fabricated with a part so as to not be in contact with the part. Such a thermal support may reduce a temperature differential without affecting the finish of the fabricated object.

公开(公告)号：US20230405938A1

公开(公告)日：2023-12-21

申请号：US18337650

申请日：2023-06-20

Applicant: Formlabs, Inc.

Inventor： Shane Wighton ,  Andrew M. Goldman ,  Henry Whitney ,  Justin Keenan

IPC: B29C64/393 ,  B29C64/245 ,  B29C64/236 ,  B29C64/286 ,  B29C64/129 ,  B29C64/268 ,  G01N21/958 ,  B33Y50/00 ,  G01N21/94 ,  B29C64/386

CPC classification number: B29C64/393 ,  B29C64/245 ,  B29C64/236 ,  B29C64/286 ,  B29C64/129 ,  B29C64/268 ,  G01N21/958 ,  B33Y50/00 ,  G01N21/94 ,  B29C64/386 ,  B33Y10/00

Abstract: According to some aspects, techniques are provided for identifying contamination in additive fabrication devices by measuring light interacting with the contamination using one or more light sensors. Contamination located between a light source and a target of a light source can affect the uniformity and intensity of the light source when incident upon the target. For instance, in an inverse stereolithography device, contamination located between a light source and a liquid photopolymer resin that is to be cured can affect the quality of the fabricated object when the light is scattered or blocked by the contamination. Identifying the presence of contamination between the light source and the liquid photopolymer resin and alerting the user prior to initiating a fabrication process may increase the quality of the resulting fabricated object and improve the user experience by saving time and photocurable liquid.

公开(公告)号：US11579041B2

公开(公告)日：2023-02-14

申请号：US16818886

申请日：2020-03-13

Applicant: Formlabs, Inc.

Inventor： Andrew M. Goldman ,  Henry Whitney ,  Justin Keenan ,  Benjamin FrantzDale ,  Michael Fogleman ,  Maxim Lobovsky

IPC: B29C64/393 ,  G01M11/02 ,  B33Y30/00 ,  B33Y50/00 ,  B29C64/386

Abstract: According to some aspects, calibration techniques are provided that allow an optics module of an additive fabrication device to be installed and operated in a stereolithography device by a user. In particular, the calibration techniques enable the optics module to be calibrated in a way that only depends on the characteristics of the optics module, and not upon any other components of the stereolithography device. As a result, the techniques enable a user of a stereolithography device to remove one optics module and replace it with another, without it being necessary to repair or replace the whole device. In some cases, the calibration techniques may include directing light onto one or more fiducial targets within the stereolithography device and measuring light scattered from said targets.

公开(公告)号：US11679561B2

公开(公告)日：2023-06-20

申请号：US16811567

申请日：2020-03-06

Applicant: Formlabs, Inc.

Inventor： Shane Wighton ,  Andrew M. Goldman ,  Henry Whitney ,  Justin Keenan

IPC: B29C64/393 ,  B29C64/245 ,  B29C64/286 ,  G01N21/958 ,  B33Y50/00 ,  G01N21/94 ,  B29C64/386 ,  B33Y30/00 ,  B33Y50/02 ,  B29C64/236 ,  B29C64/129 ,  B29C64/268 ,  B33Y10/00

CPC classification number: B29C64/393 ,  B29C64/129 ,  B29C64/236 ,  B29C64/245 ,  B29C64/268 ,  B29C64/286 ,  B29C64/386 ,  B33Y50/00 ,  G01N21/94 ,  G01N21/958 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  G01N2021/945

Abstract: According to some aspects, techniques are provided for identifying contamination in additive fabrication devices by measuring light interacting with the contamination using one or more light sensors. Contamination located between a light source and a target of a light source can affect the uniformity and intensity of the light source when incident upon the target. For instance, in an inverse stereolithography device, contamination located between a light source and a liquid photopolymer resin that is to be cured can affect the quality of the fabricated object when the light is scattered or blocked by the contamination. Identifying the presence of contamination between the light source and the liquid photopolymer resin and alerting the user prior to initiating a fabrication process may increase the quality of the resulting fabricated object and improve the user experience by saving time and photocurable liquid.

公开(公告)号：US11186044B2

公开(公告)日：2021-11-30

申请号：US16821486

申请日：2020-03-17

Applicant: Formlabs, Inc.

Inventor： Benjamin FrantzDale ,  Justin Keenan

IPC: B29C64/393 ,  G01B11/00 ,  B33Y50/02 ,  B33Y10/00 ,  B29C64/135 ,  B29C64/153

Abstract: Techniques of optically sensing fiducial targets, such as calibration patterns, within an additive fabrication device are provided. In some embodiments, fiducial targets may be disposed on a structure configured to contact source material of the additive fabrication device, the source material being a material from which the device is configured to fabricate solid objects. Indirect sensing means may be employed such that light emitted from a light source of the additive fabrication device scatters from the surface of a fiducial target. At least some of this scattered light can be measured by a sensor and used to determine a position of the fiducial target. In some embodiments, the fiducial target may be configured to move relative to the light source and/or sensor to provide additional information on the target's position via the light scattered from its surface.

公开(公告)号：US20200292415A1

公开(公告)日：2020-09-17

申请号：US16818886

申请日：2020-03-13

Applicant: Formlabs, Inc.

Inventor： Andrew M. Goldman ,  Henry Whitney ,  Justin Keenan ,  Benjamin FrantzDale ,  Michael Fogleman ,  Maxim Lobovsky

IPC: G01M11/02 ,  B33Y30/00 ,  B33Y50/00 ,  B29C64/386

Abstract: According to some aspects, calibration techniques are provided that allow an optics module of an additive fabrication device to be installed and operated in a stereolithography device by a user. In particular, the calibration techniques enable the optics module to be calibrated in a way that only depends on the characteristics of the optics module, and not upon any other components of the stereolithography device. As a result, the techniques enable a user of a stereolithography device to remove one optics module and replace it with another, without it being necessary to repair or replace the whole device. In some cases, the calibration techniques may include directing light onto one or more fiducial targets within the stereolithography device and measuring light scattered from said targets.

公开(公告)号：US12263648B2

公开(公告)日：2025-04-01

申请号：US18337650

申请日：2023-06-20

Applicant: Formlabs, Inc.

Inventor： Shane Wighton ,  Andrew M. Goldman ,  Henry Whitney ,  Justin Keenan

IPC: B29C64/393 ,  B29C64/129 ,  B29C64/236 ,  B29C64/245 ,  B29C64/268 ,  B29C64/286 ,  B29C64/386 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/00 ,  B33Y50/02 ,  G01N21/94 ,  G01N21/958

Abstract: According to some aspects, techniques are provided for identifying contamination in additive fabrication devices by measuring light interacting with the contamination using one or more light sensors. Contamination located between a light source and a target of a light source can affect the uniformity and intensity of the light source when incident upon the target. For instance, in an inverse stereolithography device, contamination located between a light source and a liquid photopolymer resin that is to be cured can affect the quality of the fabricated object when the light is scattered or blocked by the contamination. Identifying the presence of contamination between the light source and the liquid photopolymer resin and alerting the user prior to initiating a fabrication process may increase the quality of the resulting fabricated object and improve the user experience by saving time and photocurable liquid.