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公开(公告)号：US11483917B2
公开(公告)日：2022-10-25
申请号：US17156376
申请日：2021-01-22
Applicant: Gigaphoton Inc.
Inventor： Atsushi Ueda , Takayuki Osanai , Koichiro Koge
Abstract: A chamber device may include a concentrating mirror, a central gas supply port, an inner wall, an exhaust port, a recessed portion, and a lateral gas supply port. The recessed portion may be on a side lateral to the focal line and recessed outward from the inner wall when viewed from a direction perpendicular to the focal line. The lateral gas supply port is formed at the recessed portion and may supply gas toward gas supplied from the central gas supply port so that a flow direction of the gas supplied from the central gas supply port is bent from a direction along the focal line toward the exhaust port and an internal space of the recessed portion.
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2.发明授权公开(公告)号：US11036143B2
公开(公告)日：2021-06-15
申请号：US16849421
申请日：2020-04-15
Applicant: Gigaphoton Inc.
Inventor： Atsushi Ueda
Abstract: An extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target with a pulse laser beam includes: a chamber; a magnet that is positioned outside the chamber and forms a magnetic field (70) inside the chamber; a discharge path (37a) that is opened at a position on an inner wall surface of the chamber where the inner wall surface intersects a central axis of the magnetic field (70) and through which gas inside the chamber is discharged; and a gas supply unit (10a) configured to supply gas into the discharge path (37a) through an inner wall surface of the discharge path.
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3.发明授权公开(公告)号：US11789374B2
公开(公告)日：2023-10-17
申请号：US17397554
申请日：2021-08-09
Applicant: Gigaphoton Inc.
Inventor： Yusuke Hoshino , Yukio Watanabe , Toshihiro Nishisaka , Atsushi Ueda , Koichiro Koge , Takayuki Osanai , Gouta Niimi
CPC classification number: G03F7/70916 , G03F7/70033 , H05G2/006 , H05G2/008
Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a first partition wall covering a plasma generation region in the chamber and having a first opening, an EUV light concentrating mirror located in a first space inside the chamber and outside the first partition wall and configured to concentrate extreme ultraviolet light generated in the plasma generation region and having passed through the first opening, a first gas supply port formed at the chamber and configured to supply gas to the first space, and a gas exhaust port formed in the first partition wall and configured to exhaust gas in a second space inside the first partition wall to outside of both the first partition wall and the chamber.
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公开(公告)号：US11145429B2
公开(公告)日：2021-10-12
申请号：US16820849
申请日：2020-03-17
Applicant: Gigaphoton Inc.
Inventor： Atsushi Ueda , Gota Niimi , Georg Soumagne
Abstract: An extreme ultraviolet chamber apparatus includes: a chamber; an EUV condensing mirror arranged in the chamber; a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror; a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror; and an exhaust port arranged in the chamber.
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公开(公告)号：US09872372B2
公开(公告)日：2018-01-16
申请号：US15379230
申请日：2016-12-14
Applicant: Gigaphoton Inc.
Inventor： Atsushi Ueda , Shinji Nagai , Yoshifumi Ueno , Tamotsu Abe
Abstract: An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit.
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Patent Agency Ranking
公开(公告)号：US11363705B2
公开(公告)日：2022-06-14
申请号：US17156186
申请日：2021-01-22
Applicant: Gigaphoton Inc.
Inventor： Takayuki Osanai , Atsushi Ueda , Koichiro Koge , Akihiro Ohsawa , Toshiya Shintani , Yoshiaki Yoshida , Yuki Ishida , Yosuke Takada
Abstract: An extreme ultraviolet light generation apparatus may include a chamber device, a concentrating mirror, a central gas supply port configured to supply gas along a focal line passing through a first focal point and a second focal point from the center side of the reflection surface, and a first peripheral gas supply port disposed at a peripheral portion of the reflection surface and configured to supply gas in a direction from the outer side of the reflection surface toward the inner side of the reflection surface. The first peripheral gas supply port may supply gas, when viewed along the focal line, in an inclined direction inclined to a tangential direction side of the peripheral portion at the peripheral portion where the first peripheral gas supply port is located with respect to a first straight line passing through the first peripheral gas supply port and the focal line.
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7.发明授权公开(公告)号：US11272608B2
公开(公告)日：2022-03-08
申请号：US17226515
申请日：2021-04-09
Applicant: Gigaphoton Inc.
Inventor： Atsushi Ueda , Shinji Nagai
Abstract: An extreme ultraviolet light generation apparatus may include a chamber causing a target substance to be turned into plasma with laser light, a light concentrating mirror concentrating extreme ultraviolet light generated by the turning of the target substance into plasma, a gas supply unit supplying gas into the chamber, a magnetic field generation unit generating a magnetic field including a magnetic field axis that crosses a light path of the extreme ultraviolet light, a first exhaust port arranged at a position through which the magnetic field axis passes in the chamber, a second exhaust port arranged at a position opposite to the light concentrating mirror in the chamber, and a gas exhaust amount adjustment unit adjusting a ratio between an exhaust amount of first exhaust gas exhausted from the first exhaust port and an exhaust amount of second exhaust gas exhausted from the second exhaust port.
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公开(公告)号：US10582602B2
公开(公告)日：2020-03-03
申请号：US16536055
申请日：2019-08-08
Applicant: Gigaphoton Inc.
Inventor： Atsushi Ueda , Akihiro Takayama
Abstract: An extreme ultraviolet light generation apparatus includes: a chamber; an EUV light focusing mirror located in the chamber; and a hydrogen gas release unit that is located in the chamber and includes an opening configured to release a hydrogen gas inward from around the EUV light focusing mirror and a first cooling medium channel through which a cooling medium passes.
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公开(公告)号：US10001706B2
公开(公告)日：2018-06-19
申请号：US15651259
申请日：2017-07-17
Applicant: GIGAPHOTON INC.
Inventor： Atsushi Ueda , Shinji Nagai
CPC classification number: G03F7/2008 , H05G2/006 , H05G2/008
Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a target supply device configured to successively supply targets into the chamber, and an extreme ultraviolet light collector mirror including a reflective surface having a through-hole at the center thereof. The reflective surface may reflect and collect extreme ultraviolet light generated at a predetermined emission cycle because of irradiation of the successively supplied targets with a laser beam. A gas ejection device may be disposed in the through-hole to jut out from the reflective surface and have a gas ejection opening to eject etching gas for debris onto the reflective surface. The gas ejection device may be configured so that the etching gas takes a longer time than the predetermined emission cycle to reach the through-hole-side end of effective reflective area of the reflective surface after being ejected from the gas ejection opening.
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10.发明授权公开(公告)号：US09661730B2
公开(公告)日：2017-05-23
申请号：US15151025
申请日：2016-05-10
Applicant: Gigaphoton Inc.
Inventor： Atsushi Ueda , Takayuki Yabu , Osamu Wakabayashi , Georg Soumagne , Takashi Saito
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target supply unit configured to output a target toward a predetermined region inside the chamber; a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region; and a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.
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