公开(公告)号：US11050210B2

公开(公告)日：2021-06-29

申请号：US16730065

申请日：2019-12-30

Applicant: Gigaphoton Inc.

Inventor： Hisakazu Katsuumi ,  Junichi Fujimoto ,  Satoshi Tanaka

IPC: H01S3/04 ,  H01S3/041 ,  H01G2/08 ,  H01S3/034 ,  H01S3/038 ,  H01S3/097 ,  H01S3/0975 ,  H01S3/032 ,  G03F7/20 ,  H01S3/134 ,  H01S3/036 ,  H01S3/0971

Abstract: To cool a capacitor including a first electrode and a second electrode, a capacitor cooling structure includes: a conducting part electrically connected with the first electrode; an insulating part that has a first surface including a first position and a second surface including a second position, and is connected with the conducting part at the first position; a first fastening part configured to fasten the conducting part and the insulating part to each other; and a cooling part connected with the second position facing the first position, the conducting part and the cooling part being electrically insulated from each other by the insulating part.

公开(公告)号：US11451003B2

公开(公告)日：2022-09-20

申请号：US17009160

申请日：2020-09-01

Applicant: Gigaphoton Inc.

Inventor： Hiroaki Tsushima ,  Satoshi Tanaka ,  Yousuke Fujimaki ,  Takeshi Asayama ,  Osamu Wakabayashi

IPC: H01S3/036 ,  G03F7/20 ,  H01S3/225

Abstract: A laser gas regenerating apparatus regenerates a discharged gas discharged from at least one ArF excimer laser apparatus and supplies the regenerated gas to the at least one ArF excimer laser apparatus connected to a first laser gas supply source that supplies a first laser gas and to a second laser gas supply source that supplies a second laser gas. The laser gas regenerating apparatus includes a data obtaining unit that obtains data on a supply amount of the second laser gas supplied to the at least one ArF excimer laser apparatus; a xenon adding unit that adds, to the regenerated gas, a third laser gas; and a control unit that controls, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit.

公开(公告)号：US12109648B2

公开(公告)日：2024-10-08

申请号：US17487348

申请日：2021-09-28

Applicant: Gigaphoton Inc.

Inventor： Satoshi Tanaka ,  Akiyoshi Suzuki ,  Hideo Hoshino

IPC: B23K26/082 ,  B23K26/0622 ,  B23K101/40

CPC classification number: B23K26/082 ,  B23K26/0622 ,  B23K2101/40

Abstract: Provided is a laser annealing apparatus causing laser light to be radiated to processing receiving areas arranged, out of a first direction and a second direction perpendicular to the first direction, along at least the second direction and move a batch radiation area and a workpiece in the first direction, and the laser annealing apparatus includes an energy density measuring apparatus measuring the energy density at, out of first and second ends of the batch radiation area in the second direction, at least the second end, an energy density adjusting apparatus adjusting the energy density at the first end, and a controller controlling the energy density adjusting apparatus. The energy density at the first end when (N+1)-th scanning is performed is so adjusted that the energy density at the first end in an (N+1)-th scan area approaches the energy density at the second end in the N-th scan area.