EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, TARGET CONTROL METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20210349400A1

    公开(公告)日:2021-11-11

    申请号:US17227912

    申请日:2021-04-12

    Inventor: Toru Abe

    Abstract: An extreme ultraviolet light generation apparatus may include a target supply unit configured to output a target; an actuator configured to change a trajectory of the target; an illumination device configured to illuminate the target; a first trajectory sensor configured to detect the trajectory in a first direction; a second trajectory sensor configured to detect the trajectory in a second direction; and a processor configured, when the trajectory of the target is detected by the first trajectory sensor but is not detected by the second trajectory sensor, to perform a first search and determine whether or not to repeat the first search based on a signal intensity of the first trajectory sensor, the first search including changing the trajectory of the target into a third direction by controlling the actuator, and then determining whether or not the second trajectory sensor is capable of detecting the trajectory of the target.

    Extreme ultraviolet light generation apparatus, target control method, and electronic device manufacturing method

    公开(公告)号:US11287744B2

    公开(公告)日:2022-03-29

    申请号:US17369794

    申请日:2021-07-07

    Inventor: Toru Abe

    Abstract: An extreme ultraviolet light generation apparatus is an apparatus to generate extreme ultraviolet light by irradiating a target with laser light, and may include a target supply unit configured to output the target, an actuator configured to shift a trajectory of the target, a first trajectory sensor configured to detect the trajectory of the target in a first direction, a second trajectory sensor configured to detect the trajectory of the target in a second direction being different from the first direction, and a control unit configured to perform trajectory control including controlling the actuator to cause the second trajectory sensor to be capable of detecting the trajectory of the target when the trajectory of the target has been detected by the first trajectory sensor and has not been detected by the second trajectory sensor.

    Extreme ultraviolet light generation apparatus, target control method, and electronic device manufacturing method

    公开(公告)号:US11229112B2

    公开(公告)日:2022-01-18

    申请号:US17227912

    申请日:2021-04-12

    Inventor: Toru Abe

    Abstract: An extreme ultraviolet light generation apparatus may include a target supply unit configured to output a target; an actuator configured to change a trajectory of the target; an illumination device configured to illuminate the target; a first trajectory sensor configured to detect the trajectory in a first direction; a second trajectory sensor configured to detect the trajectory in a second direction; and a processor configured, when the trajectory of the target is detected by the first trajectory sensor but is not detected by the second trajectory sensor, to perform a first search and determine whether or not to repeat the first search based on a signal intensity of the first trajectory sensor, the first search including changing the trajectory of the target into a third direction by controlling the actuator, and then determining whether or not the second trajectory sensor is capable of detecting the trajectory of the target.

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