公开(公告)号：US10673200B2

公开(公告)日：2020-06-02

申请号：US15973846

申请日：2018-05-08

Applicant: Gigaphoton Inc.

Inventor： Yousuke Fujimaki ,  Hiroaki Tsushima ,  Hiroyuki Ikeda ,  Osamu Wakabayashi

IPC: H01S3/134 ,  H01S3/036 ,  H01S3/038 ,  H01S3/097 ,  H01S3/11 ,  H01S3/225 ,  H01S3/23 ,  H01S3/08 ,  H01S3/13

Abstract: An excimer laser apparatus may include an optical resonator, a chamber including a pair of discharge electrodes, the chamber being provided in the optical resonator and configured to store laser gas, an electric power source configured to receive a trigger signal and apply a pulsed voltage to the pair of discharge electrodes based on the trigger signal, an energy monitor configured to measure pulse energy of a pulse laser beam outputted from the optical resonator, a unit for adjusting partial pressure of halogen gas configured to perform exhausting a part of the laser gas stored in the chamber and supplying laser gas to the chamber, and a controller configured to acquire measurement results of the pulse energy measured by the energy monitor, detect energy depression based on the measurement results of the pulse energy, and control the unit for adjusting partial pressure of halogen gas based on results of detecting the energy depression to adjust the partial pressure of halogen gas in the chamber.

公开(公告)号：US11451003B2

公开(公告)日：2022-09-20

申请号：US17009160

申请日：2020-09-01

Applicant: Gigaphoton Inc.

Inventor： Hiroaki Tsushima ,  Satoshi Tanaka ,  Yousuke Fujimaki ,  Takeshi Asayama ,  Osamu Wakabayashi

IPC: H01S3/036 ,  G03F7/20 ,  H01S3/225

Abstract: A laser gas regenerating apparatus regenerates a discharged gas discharged from at least one ArF excimer laser apparatus and supplies the regenerated gas to the at least one ArF excimer laser apparatus connected to a first laser gas supply source that supplies a first laser gas and to a second laser gas supply source that supplies a second laser gas. The laser gas regenerating apparatus includes a data obtaining unit that obtains data on a supply amount of the second laser gas supplied to the at least one ArF excimer laser apparatus; a xenon adding unit that adds, to the regenerated gas, a third laser gas; and a control unit that controls, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit.

公开(公告)号：US12140869B2

公开(公告)日：2024-11-12

申请号：US17819060

申请日：2022-08-11

Applicant: Gigaphoton Inc.

Inventor： Yousuke Fujimaki

IPC: G03F7/00 ,  G03F7/20 ,  H01S3/08 ,  H01S3/13 ,  H01S3/134

Abstract: A control method for a line narrowed gas laser apparatus is a control method for a line narrowed gas laser apparatus configured to emit a pulse laser beam including a first wavelength component and a second wavelength component. The apparatus includes a laser chamber including a pair of electrodes, an optical resonator including an adjustment mechanism configured to adjust a parameter of an energy ratio of the first and second wavelength components, and a processor in which relation data indicating a relation of the parameter of the energy ratio with a control parameter of the adjustment mechanism is stored. The control method includes receiving a command value of the parameter of the energy ratio from an external device, and acquiring, based on the relation data, a value of the control parameter corresponding to the command value and controlling the adjustment mechanism based on the value of the control parameter.

公开(公告)号：US12105426B2

公开(公告)日：2024-10-01

申请号：US17819060

申请日：2022-08-11

Applicant: Gigaphoton Inc.

Inventor： Yousuke Fujimaki

IPC: G03F7/00 ,  G03F7/20 ,  H01S3/08 ,  H01S3/13 ,  H01S3/134

CPC classification number: G03F7/70041 ,  G03F7/2006 ,  H01S3/08009 ,  H01S3/1305 ,  H01S3/134

Abstract: A control method for a line narrowed gas laser apparatus is a control method for a line narrowed gas laser apparatus configured to emit a pulse laser beam including a first wavelength component and a second wavelength component. The apparatus includes a laser chamber including a pair of electrodes, an optical resonator including an adjustment mechanism configured to adjust a parameter of an energy ratio of the first and second wavelength components, and a processor in which relation data indicating a relation of the parameter of the energy ratio with a control parameter of the adjustment mechanism is stored. The control method includes receiving a command value of the parameter of the energy ratio from an external device, and acquiring, based on the relation data, a value of the control parameter corresponding to the command value and controlling the adjustment mechanism based on the value of the control parameter.