-
公开(公告)号：US11372146B2
公开(公告)日：2022-06-28
申请号：US17008663
申请日：2020-09-01
Inventor： Hao Jiang , Song Zhang , Honggang Gu , Shiyuan Liu
Abstract: A method and a device for real-time attitude angle measurement based on the field of view effect of the birefringent crystal are provided. The device includes a high-speed polarization measurement module and an object attitude adjustment module connected to each other. The high-speed polarization measurement module includes a polarizer unit and a real-time polarization analyzer unit, respectively located on two opposite sides of the object attitude adjustment module. The object attitude adjustment module includes an attitude angle controller, a roll angle adjustment unit, a pitch angle adjustment unit, a yaw angle adjustment unit, and a height adjustment unit respectively connected to the attitude angle controller, and a birefringent crystal. The method includes an algorithm for real-time extraction of object attitude angle according to optical parameters measured by the high-speed polarization measurement module, and a method for compensating attitude angle measurement errors.
-
公开(公告)号：US20210302640A1
公开(公告)日：2021-09-30
申请号：US17008663
申请日：2020-09-01
Inventor： Hao Jiang , Song Zhang , Honggang Gu , Shiyuan Liu
Abstract: A method and a device for real-time attitude angle measurement based on the field of view effect of the birefringent crystal are provided. The device includes a high-speed polarization measurement module and an object attitude adjustment module connected to each other. The high-speed polarization measurement module includes a polarizer unit and a real-time polarization analyzer unit, respectively located on two opposite sides of the object attitude adjustment module. The object attitude adjustment module includes an attitude angle controller, a roll angle adjustment unit, a pitch angle adjustment unit, a yaw angle adjustment unit, and a height adjustment unit respectively connected to the attitude angle controller, and a birefringent crystal. The method includes an algorithm for real-time extraction of object attitude angle according to optical parameters measured by the high-speed polarization measurement module, and a method for compensating attitude angle measurement errors.
-
3.发明申请公开(公告)号：US20230046115A1
公开(公告)日：2023-02-16
申请号：US17564241
申请日：2021-12-29
Inventor： Haiqing Wei , Shiyuan Liu , Hao Jiang
Abstract: A method and a system for correcting lithography process hotspots based on stress damping adjustment are provided. The method includes: acquiring a mark hotspot of a mask pattern; forming N annuli centered on the mark hotspot from inner to outer on a mask; moving vertexes of the mask pattern located in each annulus by a specific distance in a direction deviating from the mark hotspot and connecting the moved vertexes according to an original connection relationship to acquire an updated layout; verifying electrical characteristics of the updated layout, determining whether a deviation of the electrical characteristics of the updated layout is within a tolerable range, and performing geometric correction to compensate for a deviation of electrical parameters if no is determined and then ending correction, or ending the correction if yes is determined.
-
公开(公告)号：US11644413B2
公开(公告)日：2023-05-09
申请号：US17054170
申请日：2020-05-15
Inventor： Honggang Gu , Baokun Song , Shiyuan Liu , Zhengfeng Guo , Mingsheng Fang , Hao Jiang , Xiuguo Chen
CPC classification number: G01N21/211 , G06F17/16 , G01N2021/213
Abstract: The disclosure relates to a method for measuring a dielectric tensor of a material. Firstly, a partial conversion matrix Tp and a transmission matrix Tt are determined by a predetermined initial value ε(E) of the dielectric tensor of the material to be measured, thereby obtaining a transfer matrix of an electromagnetic wave on a surface of the material to be measured by the partial conversion matrix Tp, the transmission matrix Tt, and an incident matrix Ti, a theoretical Mueller matrix spectrum MMCal(E) of the material to be measured is determined by the transfer matrix Tm. A fitting analysis is performed on the theoretical Mueller matrix spectrum MMCal(E) and a measured Mueller matrix spectrum MMExp(E) of the material to be measured to obtain the dielectric tensor of the material to be measured.
-
5.发明申请公开(公告)号：US20240402614A1
公开(公告)日：2024-12-05
申请号：US18488047
申请日：2023-10-17
Inventor： Hao Jiang , Lei Li , Jiamin Liu , Shiyuan Liu
Abstract: The disclosure provides a quasi-dynamic in situ ellipsometry method and system for measuring a photoresist exposure process. The method includes: obtaining a measured Muller matrix of a photoresist at different exposure times by a Muller matrix ellipsometer; building a forward optical model of the photoresist and obtaining a theoretical Mueller matrix; inverting and fitting the measured Mueller matrix and the theoretical Mueller matrix and obtaining ellipsometric parameters of the photoresist at different times, an average extinction coefficient, and a film thickness; building a relational model of a Dill parameter of the photoresist and optical properties of the photoresist, and an exposure model of the photoresist; building a relational model of a theoretical extinction coefficient and the extinction coefficient and obtaining theoretical extinction coefficients of the photoresist after different exposure times; and inverting and fitting the average extinction coefficient and the theoretical extinction coefficient and obtaining the Dill parameter.
-
Patent Agency Ranking
公开(公告)号：US11662197B2
公开(公告)日：2023-05-30
申请号：US16510983
申请日：2019-07-15
Inventor： Honggang Gu , Shiyuan Liu , Simin Zhu , Baokun Song , Hao Jiang , Xiuguo Chen
IPC: G01B11/06
CPC classification number: G01B11/0641
Abstract: The invention discloses a rapid measurement method for an ultra-thin film optical constant, which includes following steps: S1: using a p-light amplitude reflection coefficient rp and an s-light amplitude reflection coefficient rs of an incident light irradiating to an ultra-thin film to be measured to express an amplitude reflection coefficient ratio ρ of the ultra-thin film:
ρ
=
r
p
r
s
;
S2: performing a second-order Taylor expansion to
ρ
=
r
p
r
s
at df=0 while taking 2πdf/λ as a variable to obtain a second-order approximation form; S3: performing merging, simplifying and substituting processing to the second-order approximation form for transforming the same into a one-variable quartic equation; S4: solving the one-variable quartic equation to obtain a plurality of solutions of the optical constant of the ultra-thin film, and obtaining a correct solution through conditional judgment, so as to achieve the rapid measurement for the ultra-thin film optical constant.-
公开(公告)号：US11143804B2
公开(公告)日：2021-10-12
申请号：US16162382
申请日：2018-10-16
Inventor： Honggang Gu , Shiyuan Liu , Xiuguo Chen , Hao Jiang , Chuanwei Zhang
Abstract: The present invention belongs to the field of optical detection devices, and specifically discloses a polarization modulator and a polarization measurement system, comprising a rotating compensator and a polarizer, in which the rotating compensator is a continuously rotating composite waveplate, the composite waveplate is composed of a plurality of single-waveplates of the same material, and the overall structure of the composite waveplate is determined by thicknesses and fast axis intersection angles of the respective single-waveplates according to the optimization design of the polarization characteristic transfer matrix of the polarization modulator. The polarization modulator of the invention has the advantages of simple structure, easy processing and a wide applicable wavelength range, and a wide-waveband polarization measurement system can be designed based on the polarization modulator, which is adapted to the requirements of wide-waveband precision polarization measurement.
-
公开(公告)号：US10983007B2
公开(公告)日：2021-04-20
申请号：US16521603
申请日：2019-07-25
Inventor： Honggang Gu , Baokun Song , Shiyuan Liu , Mingsheng Fang , Xiuguo Chen , Hao Jiang
Abstract: A material optical transition analysis method and system are provided, the method includes: determining a dielectric function spectrum of a material to be analyzed, calculating a second derivative spectrum of the dielectric function spectrum related to the excitation light energy, and performing the CP fitting analysis on the second derivative spectrum to obtain a CP analysis result diagram of the material; drawing an energy band structure diagram and a PDOS diagram of the material, and drawing an energy difference diagram between CBs and VBs according to the energy band structure diagram of the material; determining spatial positions of CPs and the corresponding CBs and the VBs according to the CP analysis result diagram of the material and the energy difference diagram between the CBs and the VBs; and finally indicating the CBs and the VBs in the energy band structure diagram, and determining the particle types participating in formation of the CPs in the PDOS diagram to complete the material optical transition analysis. The invention realizes the analysis and interpretation of the optical transition characteristics occurring at the materials from the perspective of physics, which has the advantages of reliable operation process system and accurate and reliable analysis results.
-
公开(公告)号：US20200333188A1
公开(公告)日：2020-10-22
申请号：US16521603
申请日：2019-07-25
Inventor： Honggang Gu , Baokun Song , Shiyuan Liu , Mingsheng Fang , Xiuguo Chen , Hao Jiang
Abstract: A material optical transition analysis method and system are provided, the method includes: determining a dielectric function spectrum of a material to be analyzed, calculating a second derivative spectrum of the dielectric function spectrum related to the excitation light energy, and performing the CP fitting analysis on the second derivative spectrum to obtain a CP analysis result diagram of the material; drawing an energy band structure diagram and a PDOS diagram of the material, and drawing an energy difference diagram between CBs and VBs according to the energy band structure diagram of the material; determining spatial positions of CPs and the corresponding CBs and the VBs according to the CP analysis result diagram of the material and the energy difference diagram between the CBs and the VBs; and finally indicating the CBs and the VBs in the energy band structure diagram, and determining the particle types participating in formation of the CPs in the PDOS diagram to complete the material optical transition analysis. The invention realizes the analysis and interpretation of the optical transition characteristics occurring at the materials from the perspective of physics, which has the advantages of reliable operation process system and accurate and reliable analysis results.
-
公开(公告)号：US20200333132A1
公开(公告)日：2020-10-22
申请号：US16510983
申请日：2019-07-15
Inventor： Honggang Gu , Shiyuan Liu , Simin Zhu , Baokun Song , Hao Jiang , Xiuguo Chen
IPC: G01B11/06
Abstract: The invention discloses a rapid measurement method for an ultra-thin film optical constant, which includes following steps: S1: using a p-light amplitude reflection coefficient rp and an s-light amplitude reflection coefficient rs of an incident light irradiating to an ultra-thin film to be measured to express an amplitude reflection coefficient ratio ρ of the ultra-thin film: ρ = r p r s ; S2: performing a second-order Taylor expansion to ρ = r p r s at df=0 while taking 2πdf/λ as a variable to obtain a second-order approximation form; S3: performing merging, simplifying and substituting processing to the second-order approximation form for transforming the same into a one-variable quartic equation; S4: solving the one-variable quartic equation to obtain a plurality of solutions of the optical constant of the ultra-thin film, and obtaining a correct solution through conditional judgment, so as to achieve the rapid measurement for the ultra-thin film optical constant.
-
-
-
-
-
-
-
-
-
Search Results
11
records
(took 0.015 seconds)
