Convolution operation accelerator and convolution operation method

    公开(公告)号:US12293804B2

    公开(公告)日:2025-05-06

    申请号:US18266610

    申请日:2022-04-20

    Abstract: The disclosure provides a convolution operation accelerator and a convolution operation method and belongs to the field of microelectronic devices. Input data of each word line may be subjected to a multiply-accumulate operation together with two upper and lower layers of convolution kernel units, so that natural sliding of the convolution kernel units in a y direction in two-dimensional input is achieved. The oblique bit lines and multiple copies of a convolution kernel in each layer of a non-volatile memory array may enable a multiplication operation between one piece of input data and convolution kernel data at different positions in the same convolution kernel. In this way, the natural sliding of the convolution kernel units in an x direction in the two-dimensional input is achieved.

    Preparation method of bipolar gating memristor and bipolar gating memristor

    公开(公告)号:US11825756B2

    公开(公告)日:2023-11-21

    申请号:US17785916

    申请日:2021-08-30

    CPC classification number: H10N70/826 H10B63/22 H10B63/84 H10N70/026 H10N70/245

    Abstract: The present invention provides a preparation method of a bipolar gating memristor and a bipolar gating memristor. The preparation method includes: preparing a lower electrode; depositing a resistive material layer on the lower electrode; and depositing an upper electrode on the resistive material layer by using a magnetron sputtering manner to deposit the upper electrode, controlling upper electrode metal particles to have suitable kinetic energy by controlling sputtering power, controlling a vacuum degree of a region where the upper electrode and the resistive material layer are located, such that a redox reaction occurs spontaneously between the upper electrode and the resistive material layer during the deposition of the upper electrode to form a built-in bipolar gating layer; and continuously depositing the upper electrode on the built-in bipolar gating layer.

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