公开(公告)号：US11239052B2

公开(公告)日：2022-02-01

申请号：US16900176

申请日：2020-06-12

Applicant: Hitachi High-Tech Corporation

Inventor： Toshiyuki Yokosuka ,  Chahn Lee ,  Hideyuki Kazumi ,  Hajime Kawano ,  Shahedul Hoque ,  Kumiko Shimizu ,  Hiroyuki Takahashi

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22

Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

公开(公告)号：US10755890B2

公开(公告)日：2020-08-25

申请号：US15940868

申请日：2018-03-29

Applicant: Hitachi High-Tech Corporation

Inventor： Shinya Ueno ,  Hiroshi Nishihama ,  Shaungqi Dong ,  Shahedul Hoque ,  Susumu Koyama

IPC: H01J37/147 ,  H01J37/20 ,  H01J37/26 ,  H01J37/28 ,  H01J37/22

Abstract: An object of the invention is to provide a charged particle beam apparatus capable of achieving both acquisition of an image having high resolution of an inspection target pattern and suppression of a beam irradiation amount when a specific pattern is an inspection target from a highly integrated pattern group. In order to achieve the object, a charged particle beam apparatus is proposed in which at least one of a stage and a deflector is controlled so as to move a field of view from a reference position to an inspection or measurement target pattern, the number of objects included in a first image obtained by scanning a position of the field of view in a moving process of the field of view with a charged particle beam of a first irradiation condition is counted, and in a case where the number of the objects satisfies a predetermined condition, a second image is generated based on scanning with a charged particle beam of a second irradiation condition of a higher dose than that of the first irradiation condition.

公开(公告)号：US11798780B2

公开(公告)日：2023-10-24

申请号：US17563186

申请日：2021-12-28

Applicant: Hitachi High-Tech Corporation

Inventor： Toshiyuki Yokosuka ,  Chahn Lee ,  Hideyuki Kazumi ,  Hajime Kawano ,  Shahedul Hoque ,  Kumiko Shimizu ,  Hiroyuki Takahashi

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22

CPC classification number: H01J37/28 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J2237/2803 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/2826 ,  H01J2237/3045

Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

公开(公告)号：US11749497B2

公开(公告)日：2023-09-05

申请号：US17394925

申请日：2021-08-05

Applicant: Hitachi High-Tech Corporation

Inventor： Shunsuke Mizutani ,  Shahedul Hoque ,  Uki Ikeda ,  Makoto Suzuki

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/1474 ,  H01J37/244 ,  H01J2237/2443 ,  H01J2237/24475

Abstract: A charged particle beam apparatus covering a wide range of detection angles of charged particles emitted from a sample includes an objective lens for converging charged particle beams emitted from a charged particle source and a detector for detecting charged particles emitted from a sample. The objective lens includes inner and outer magnetic paths which are formed so as to enclose a coil. A first inner magnetic path is disposed at a position opposite to an optical axis of the charged particle beams. A second inner magnetic path, formed at a slant with respect to the optical axis of the charged particle beams, includes a leading end. A detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end and that is parallel to the optical axis of the charged particle beams.

公开(公告)号：US11139144B2

公开(公告)日：2021-10-05

申请号：US16482765

申请日：2017-03-24

Applicant: Hitachi High-Tech Corporation

Inventor： Shunsuke Mizutani ,  Shahedul Hoque ,  Uki Ikeda ,  Makoto Suzuki

IPC: H01J37/244 ,  H01J37/28 ,  H01J37/147

Abstract: The present invention provides a charged particle beam apparatus that covers a wide range of detection angles of charged particles emitted from a sample. Accordingly, the present invention proposes a charged particle beam apparatus that is provided with an objective lens for converging charged particle beams emitted from a charged particle source, and a detector for detecting charged particles emitted from a sample, wherein: the objective lens includes an inner magnetic path and an outer magnetic path which are formed so as to enclose a coil; the inner magnetic path comprises a first inner magnetic path disposed at a position opposite to an optical axis of the charged particle beams and a second inner magnetic path which is formed at a slant with respect to the optical axis of the charged particle beams and which includes a leading end of the magnetic path; and a detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end of the magnetic path and that is parallel to the optical axis of the charged particle beams.

公开(公告)号：US11694873B2

公开(公告)日：2023-07-04

申请号：US17962915

申请日：2022-10-10

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Yoshifumi Sekiguchi ,  Shin Imamura ,  Shunsuke Mizutani ,  Shahedul Hoque ,  Uki Ikeda

IPC: H01J37/244 ,  G01N23/2251 ,  G02B6/42

CPC classification number: H01J37/244 ,  G01N23/2251 ,  G02B6/4214 ,  G01N2223/07 ,  G01N2223/418 ,  G01N2223/505 ,  G01N2223/507

Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.

公开(公告)号：US11515120B2

公开(公告)日：2022-11-29

申请号：US17269424

申请日：2018-09-21

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Yoshifumi Sekiguchi ,  Shin Imamura ,  Shunsuke Mizutani ,  Shahedul Hoque ,  Uki Ikeda

IPC: H01J37/244 ,  G01N23/2251 ,  G02B6/42

Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.

公开(公告)号：US10984981B2

公开(公告)日：2021-04-20

申请号：US16118891

申请日：2018-08-31

Applicant: Hitachi High-Tech Corporation

Inventor： Hideki Itai ,  Kumiko Shimizu ,  Wataru Mori ,  Hajime Kawano ,  Shahedul Hoque

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/22

Abstract: A charged particle beam device is provided which minimizes the beam irradiation amount while maintaining a high measurement success rate. The charged particle beam device includes a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m≥1), the number m of frames being smaller than the number n of frames.