公开(公告)号：US10651006B2

公开(公告)日：2020-05-12

申请号：US15935409

申请日：2018-03-26

Applicant: Hitachi High-Tech Science Corporation

Inventor： Shinichi Matsubara ,  Yoshimi Kawanami ,  Hiroyasu Shichi

IPC: H01J37/08 ,  H01J37/28 ,  H01J37/153 ,  H01J37/10 ,  H01J37/22 ,  H01J37/147

Abstract: According to an embodiment of the present invention, an ion beam apparatus switches between an operation mode of performing irradiation with an ion beam most including H3+ ions and an operation mode of performing irradiation with an ion beam most including ions heavier than the H3+.

公开(公告)号：US10163602B2

公开(公告)日：2018-12-25

申请号：US15635500

申请日：2017-06-28

Applicant: Hitachi High-Tech Science Corporation

Inventor： Hiroyasu Shichi ,  Shinichi Matsubara ,  Yoshimi Kawanami

IPC: H01J37/08 ,  H01J37/18 ,  H01J37/26

Abstract: Provided is an ion beam system including a gas field ionization ion source which can obtain a high current sufficient for processing and stabilize an ion beam current. The ion beam system includes a gas field ionization ion source which includes: a vacuum vessel; an emitter tip holder disposed in the vacuum vessel; an emitter tip connected to the emitter tip holder; an extraction electrode opposed to the emitter tip; a gas supply portion for supplying a gas to the emitter tip; and a cold transfer member disposed in the vacuum vessel and transferring cold energy to the emitter tip holder. The cold transfer member has its surface covered with a heat insulating material in order to prevent the gas condensation.