Methods including panel bonding acts and electronic devices including cavities

    公开(公告)号:US11519847B2

    公开(公告)日:2022-12-06

    申请号:US16778692

    申请日:2020-01-31

    Inventor: Horst Theuss

    Abstract: A method is disclosed. In one example, the method includes bonding a first panel of a first material to a base panel in a first gas atmosphere, wherein multiple hermetically sealed first cavities encapsulating gas of the first gas atmosphere are formed between the first panel and the base panel. The method further includes bonding a second panel of a second material to at least one of the base panel and the first panel, wherein multiple second cavities are formed between the second panel and the at least one of the base panel and the first panel.

    APPARATUS AND METHOD FOR IN-SITU CALIBRATION OF A PHOTOACOUSTIC SENSOR

    公开(公告)号:US20220155261A1

    公开(公告)日:2022-05-19

    申请号:US17591714

    申请日:2022-02-03

    Abstract: An apparatus for in-situ calibration of a photoacoustic sensor includes a measurement device configured to measure an electric signal at an IR emitter of the photoacoustic sensor, wherein the IR emitter generates an electromagnetic spectrum based on the electric signal; and a calibration unit including processing circuitry, configured to compare the electric signal with a comparison value to generate a comparison result used as calibration information. When performing the in-situ calibration, the calibration unit is configured to adjust the electric signal based on the calibration information, or the calibration unit is configured to process an output signal of the photoacoustic sensor based on the calibration information to obtain an adjusted output signal of the photoacoustic sensor.

    Sonic sensors and packages
    5.
    发明授权

    公开(公告)号:US10802124B2

    公开(公告)日:2020-10-13

    申请号:US15390060

    申请日:2016-12-23

    Abstract: Embodiments relate to integrated sonic sensors having a transmitter, a receiver and driver electronics integrated in a single, functional package. In one embodiment, a piezoelectric signal transmitter, a silicon microphone receiver and a controller/amplifier chip are concomitantly integrated in a semiconductor housing. The semiconductor housing, in embodiments, is functional in that at least a portion of the housing can comprise the piezoelectric element of the transmitter, with an inlet aperture opposite the silicon microphone receiver.

    Packages for microelectromechanical system (MEMS) mirror and methods of manufacturing the same

    公开(公告)号:US10678046B2

    公开(公告)日:2020-06-09

    申请号:US15959628

    申请日:2018-04-23

    Abstract: A microelectromechanical system (MEMS) package assembly and a method of manufacturing the same are provided for Light Detection and Ranging (LIDAR) systems. A MEMS package assembly includes a MEMS chip including a front-side surface and a back-side surface, the MEMS chip further including a LIDAR MEMS mirror configured to receive light and reflect the light as reflected light; and a cavity cap disposed on the front-side surface of the MEMS chip and forms a cavity that surrounds the LIDAR MEMS mirror such that the LIDAR MEMS mirror is sealed from an environment, the cavity cap having an asymmetrical shape such that a transmission surface of the cavity cap, through which the light and the reflected light is transmitted, is tilted at a tilt angle with respect to the front-side surface of the MEMS chip.

    MEMS SOUND TRANSDUCER ELEMENT AND METHOD FOR PRODUCING A MEMS SOUND TRANSDUCER ELEMENT

    公开(公告)号:US20180295458A1

    公开(公告)日:2018-10-11

    申请号:US15946443

    申请日:2018-04-05

    Abstract: A method for producing a MEMS sound transducer element includes, inter alia, providing a first substrate. The first substrate has a first substrate side, an opposite second substrate side and a membrane layer arranged on the first substrate side. A further method step includes performing a first etching from the second substrate side in a first surface section that is situated opposite the membrane layer, as far as a first depth. A further method step includes performing a second etching of the first substrate from the second substrate side in a second surface section in order to expose the membrane layer in the first surface section and to produce a back volume for the membrane layer, where the second surface section is larger than the first surface section and includes the first surface section.

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