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公开(公告)号：US20140327358A1
公开(公告)日：2014-11-06
申请号：US14349501
申请日：2012-10-04
Applicant: ION BEAM SERVICES
Inventor： Frank Torregrosa , Laurent Roux
IPC: H01J37/317
CPC classification number: H01J37/3171 , C23C14/48 , H01J37/32009 , H01J37/32146 , H01J37/32412 , H01J37/32422 , H01J37/32706 , H01L21/2236
Abstract: The present invention relates to a method of controlling an ion implanter having a plasma power supply AP and a substrate power supply, the substrate power supply comprising: an electricity generator; a first switch SW1 connected between the generator and the output terminal of the substrate power supply; and a second switch SW2 connected between the output terminal and a neutralization terminal; the method including an implantation stage A-D and a neutralization stage E-H. The method also includes a relaxation stage C-F overlapping the implantation stage and the neutralization stage, during which relaxation stage the plasma power supply is inactivated. Furthermore, the neutralization stage includes a preliminary step E-F for closing the second switch, this preliminary step being followed by a cancellation step F-G for activating the plasma power supply AP.
Abstract translation: 本发明涉及一种控制具有等离子体电源AP和基板电源的离子注入机的方法，所述基板电源包括：发电机; 连接在发电机和基板电源的输出端子之间的第一开关SW1; 以及连接在输出端子和中和端子之间的第二开关SW2; 该方法包括注入阶段A-D和中和阶段E-H。 该方法还包括与植入阶段和中和阶段重叠的松弛阶段C-F，在此期间等离子体电源的松弛阶段失活。 此外，中和阶段包括用于关闭第二开关的初步步骤E-F，该初步步骤之后是用于激活等离子体电源AP的取消步骤F-G。
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公开(公告)号：US12266692B2
公开(公告)日：2025-04-01
申请号：US17276506
申请日：2019-09-06
Applicant: ION BEAM SERVICES , CNM—CSIC
Inventor： Frank Torregrosa , Laurent Roux , Philippe Godignon
Abstract: A MOSFET device arranged on a substrate 10 having first and second heavily-doped strips 11 and 14 respectively covered by first and second contacts 13 and 15, these two strips being spaced apart by a channel 18 that also appears on the substrate 10, the channel being covered by a dielectric layer 20, itself surmounted by a third contact 21. The channel 18 incorporates a thin film 19 lightly doped with dopant atoms of a same type as the channel, at the interface with the dielectric layer 20, the dopant atoms being distributed on both sides of the interface.
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公开(公告)号：US11053582B2
公开(公告)日：2021-07-06
申请号：US14367015
申请日：2012-12-19
Applicant: ION BEAM SERVICES
Inventor： Frank Torregrosa , Laurent Roux
IPC: C23C14/50 , C23C14/48 , H01L21/683 , H01L21/67
Abstract: The present invention provides a support that comprises: an electrically conductive biased table; an insulating electrostatic substrate carrier 20 in the form of a cylinder having a shoulder 21, the bottom face of the substrate carrier 20 facing the biased table and its top face 22 presenting a bearing plane designed to receive a substrate; and an electrically conductive clamping collar for clamping the shoulder 21 against the biased table. The support also has at least one electrically conductive element 201-202-203 for connecting the bearing plane to the shoulder 211.
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公开(公告)号：US09035269B2
公开(公告)日：2015-05-19
申请号：US14349499
申请日：2012-10-03
Applicant: ION BEAM SERVICES
Inventor： Frank Torregrosa , Laurent Roux
CPC classification number: H01J37/243 , G01R19/0061 , H01J37/32174 , H01J37/32311 , H01J37/32412 , H01J37/32422 , H01J37/32917 , H01J37/32972
Abstract: A control module for an ion implanter having a power supply, the power supply comprising: an electricity generator HT having its positive pole connected to ground; a first switch SW1 having its first pole connected to the negative pole of the generator HT and having its second pole connected to the outlet terminal S of the power supply; and a second switch SW2 having its first pole connected to the outlet terminal S and having its second pole connected to a neutralization terminal N. The control module also comprises a current measurement circuit AMP for measuring the current that flows between the second pole of the second switch SW2 and the neutralization terminal N.
Abstract translation: 一种用于具有电源的离子注入机的控制模块，所述电源包括：发电机HT，其正极连接到地; 第一开关SW1，其第一极连接到发电机HT的负极，并且其第二极连接到电源的出口端子S; 以及第二开关SW2，其第一极连接到出口端S并且其第二极连接到中和端N.控制模块还包括电流测量电路AMP，用于测量在第二极之间流动的电流 开关SW2和中和端N.
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公开(公告)号：US09922856B2
公开(公告)日：2018-03-20
申请号：US15117024
申请日：2015-02-04
Applicant: ION BEAM SERVICES
Inventor： Frank Torregrosa , Laurent Roux
IPC: H01L21/683 , H01L21/67 , H01J37/32
CPC classification number: H01L21/6833 , H01J37/32412 , H01L21/67103 , H01L21/67248 , H01L21/6831
Abstract: The present invention relates to a support comprising: an electrically conductive biased table (10) connected to a high voltage power supply (12) and supported on an electrically insulating stand (40); an electrically insulating substrate carrier (20) in the form of a cylinder, its top face presenting a bearing plane designed to receive a substrate (50); legs (15) standing on the biased table (10) in order to support the bottom face of the substrate carrier (20); and at least one electrically conductive connection (201, 202, 203, 31, 30) for connecting the bearing plane to the biased table (10). The support is remarkable in that the substrate carrier (20) incorporates a heating resistance (26).
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Patent Agency Ranking
公开(公告)号：US09524853B2
公开(公告)日：2016-12-20
申请号：US14783296
申请日：2014-04-09
Applicant: ION BEAM SERVICES
Inventor： Frank Torregrosa , Laurent Roux
CPC classification number: H01J37/3171 , C23C14/48 , C23C14/50 , H01J37/08 , H01J37/20 , H01J37/32412 , H01J37/32541 , H01J37/32568 , H01J37/32715
Abstract: The present invention relates to an ion implantation machine 100 that comprises: an enclosure 101 that is connected to a pump device 102; a plasma source 115-121-122; a bias power supply 113; a gas inlet 117 leading into the enclosure; and a substrate-carrier 104 connected to the negative pole of the bias power supply and arranged inside the enclosure. The machine is remarkable in that: the substrate-carrier 104 consists in at least two parallel plates 105-106; a reference electrode consists in at least one strip 110, this reference electrode being connected to the positive pole of the bias power supply; and the strip is interposed between the two plates.
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公开(公告)号：US09520274B2
公开(公告)日：2016-12-13
申请号：US14647193
申请日：2013-11-25
Applicant: ION BEAM SERVICES
Inventor： Frank Torregrosa , Laurent Roux
CPC classification number: H01J37/32357 , H01J37/32412 , H01J2237/31701 , H01J2237/3365
Abstract: The invention relates to an ion implanter that comprises an enclosure ENV having arranged therein a substrate carrier PPS connected to a substrate power supply ALT via a high voltage electrical passage PET, the enclosure ENV being provided with pump means PP, PS, the enclosure ENV also having at least two cylindrical source bodies CS1, CS2 free from any obstacle and arranged facing the substrate carrier. This implanter is remarkable in that it includes at least one confinement coil BCI1-BCS1, BCI2-BCS2 per source body CS1, CS2.
Abstract translation: 本发明涉及一种离子注入机，其包括外壳ENV，其中布置有经由高压电通道PET连接到基板电源ALT的基板载体PPS，外壳ENV设置有泵装置PP，PS，外壳ENV也 具有至少两个圆柱形源体CS1，CS2没有任何障碍物并且布置成面向衬底载体。 该注入器是显着的，因为它包括每个源体CS1，CS2至少一个约束线圈BCI1-BCS1，BCI2-BCS2。
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公开(公告)号：US20140353525A1
公开(公告)日：2014-12-04
申请号：US14349499
申请日：2012-10-03
Applicant: ION BEAM SERVICES
Inventor： Frank Torregrosa , Laurent Roux
IPC: H01J37/24
CPC classification number: H01J37/243 , G01R19/0061 , H01J37/32174 , H01J37/32311 , H01J37/32412 , H01J37/32422 , H01J37/32917 , H01J37/32972
Abstract: The present invention relates to a control module for an ion implanter having a power supply, the power supply comprising: an electricity generator HT having its positive pole connected to ground; a first switch SW1 having its first pole connected to the negative pole of the generator HT and having its second pole connected to the outlet terminal S of the power supply; and a second switch SW2 having its first pole connected to the outlet terminal S and having its second pole connected to a neutralization terminal N. The control module also comprises a current measurement circuit AMP for measuring the current that flows between the second pole of the second switch SW2 and the neutralization terminal N. The invention also provides an ion implanter fitted with this control module.
Abstract translation: 本发明涉及一种用于具有电源的离子注入机的控制模块，该电源包括：其正极连接到地的发电机HT; 第一开关SW1，其第一极连接到发电机HT的负极，并且其第二极连接到电源的出口端子S; 以及第二开关SW2，其第一极连接到出口端S并且其第二极连接到中和端N.控制模块还包括电流测量电路AMP，用于测量在第二极之间流动的电流 开关SW2和中和端N.本发明还提供了一种配有该控制模块的离子注入机。
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公开(公告)号：US09552962B2
公开(公告)日：2017-01-24
申请号：US14349501
申请日：2012-10-04
Applicant: ION BEAM SERVICES
Inventor： Frank Torregrosa , Laurent Roux
IPC: H01J37/32 , H01J37/317 , C23C14/48 , H01L21/223
CPC classification number: H01J37/3171 , C23C14/48 , H01J37/32009 , H01J37/32146 , H01J37/32412 , H01J37/32422 , H01J37/32706 , H01L21/2236
Abstract: The present invention relates to a method of controlling an ion implanter having a plasma power supply AP and a substrate power supply, the substrate power supply comprising: an electricity generator; a first switch SW1 connected between the generator and the output terminal of the substrate power supply; and a second switch SW2 connected between the output terminal and a neutralization terminal; the method including an implantation stage A-D and a neutralization stage E-H. The method also includes a relaxation stage C-F overlapping the implantation stage and the neutralization stage, during which relaxation stage the plasma power supply is inactivated. Furthermore, the neutralization stage includes a preliminary step E-F for closing the second switch, this preliminary step being followed by a cancellation step F-G for activating the plasma power supply AP.
Abstract translation: 本发明涉及一种控制具有等离子体电源AP和基板电源的离子注入机的方法，所述基板电源包括：发电机; 连接在发电机和基板电源的输出端子之间的第一开关SW1; 以及连接在输出端子和中和端子之间的第二开关SW2; 该方法包括注入阶段A-D和中和阶段E-H。 该方法还包括与植入阶段和中和阶段重叠的松弛阶段C-F，在此期间等离子体电源的松弛阶段失活。 此外，中和阶段包括用于关闭第二开关的初步步骤E-F，该初步步骤之后是用于激活等离子体电源AP的取消步骤F-G。
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公开(公告)号：US20140326176A1
公开(公告)日：2014-11-06
申请号：US14367015
申请日：2012-12-19
Applicant: ION BEAM SERVICES
Inventor： Frank Torregrosa , Laurent Roux
IPC: C23C14/50 , C23C14/48 , H01L21/683
CPC classification number: C23C14/50 , C23C14/48 , H01L21/67069 , H01L21/67248 , H01L21/6831 , H01L21/6833
Abstract: The present invention provides a support that comprises: an electrically conductive biased table; an insulating electrostatic substrate carrier 20 in the form of a cylinder having a shoulder 21, the bottom face of the substrate carrier 20 facing the biased table and its top face 22 presenting a bearing plane designed to receive a substrate; and an electrically conductive clamping collar for clamping the shoulder 21 against the biased table. The support also has at least one electrically conductive element 201-202-203 for connecting the bearing plane to the shoulder 211.
Abstract translation: 本发明提供了一种支撑件，其包括：导电偏置台; 具有肩部21的圆柱形形式的绝缘静电衬底载体20，衬底载体20的底面朝向偏置工作台，其顶面22呈现设计成接收衬底的支承面; 以及用于将肩部21抵靠偏置工位夹紧的导电夹环。 支撑件还具有用于将支承平面连接到肩部211的至少一个导电元件201-202-203。
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