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1.
公开(公告)号:US20240145211A1
公开(公告)日:2024-05-02
申请号:US18385115
申请日:2023-10-30
Applicant: JEOL Ltd.
Inventor: Shigeyuki Morishita , Yuji Kohno
IPC: H01J37/153 , H01J37/21 , H01J37/28
CPC classification number: H01J37/153 , H01J37/21 , H01J37/28 , H01J2237/1516 , H01J2237/1534
Abstract: A method of adjusting a charged particle optical system in a charged particle beam apparatus provided with the charged particle optical system including an aberration corrector in which multipole elements disposed in three or more stages and transfer optical systems are alternately disposed. The method includes adjusting aberration using at least two of the multipole elements without using at least one of the multipole elements, and adjusting parameters of the charged particle optical system other than aberration using at least one of the transfer optical systems that is not disposed between the at least two of the multipole elements used.
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2.
公开(公告)号:US11251016B2
公开(公告)日:2022-02-15
申请号:US16828330
申请日:2020-03-24
Applicant: JEOL Ltd.
Inventor: Yuji Kohno
IPC: H01J37/141 , H01J37/26 , H01J37/295
Abstract: A method of controlling a transmission electron microscope includes: causing a first magnetic field lens to generate a first magnetic field and causing a second magnetic field lens to generate a second magnetic field; causing the magnetic field applying unit to generate a magnetic field of a direction along an optical axis on a specimen mounting surface; and changing excitations of the first excitation coil and the second excitation coil to correct a deviation of a focal length of an objective lens due to the magnetic field generated by the magnetic field applying unit.
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公开(公告)号:US10224173B2
公开(公告)日:2019-03-05
申请号:US15710091
申请日:2017-09-20
Applicant: JEOL Ltd.
Inventor: Tatsuo Naruse , Yuji Kohno
IPC: H01J37/141 , H01J37/26
Abstract: There is provided an objective lens capable of reducing the effects of magnetic fields on a sample. The objective lens includes a first lens and a second lens. The lenses are arranged so that the component of the magnetic field of the first lens lying along the optical axis and the component of the magnetic field of the second lens lying along the optical axis cancel out each other at a sample placement surface. The first and second lenses each include an inner polepiece and an outer polepiece. The inner polepieces have front end portions, respectively. The outer polepieces have front end portions, respectively, which jut out toward the optical axis. The distances of the front end portions of the outer polepieces, respectively, from the sample placement surface are less than the distances of the front end portions of the inner polepieces, respectively, from the sample placement surface.
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公开(公告)号:US09779911B2
公开(公告)日:2017-10-03
申请号:US15013192
申请日:2016-02-02
Applicant: JEOL Ltd.
Inventor: Yuji Kohno
IPC: H01H37/28 , H01J37/22 , H01J37/28 , H01J37/153
CPC classification number: H01J37/222 , H01J37/153 , H01J37/28 , H01J2237/0453 , H01J2237/1534 , H01J2237/221 , H01J2237/24455 , H01J2237/24465 , H01J2237/2802
Abstract: An electron microscope capable of measuring aberrations accurately is provided. The microscope is adapted to obtain scanning transmission electron (STEM) images by detecting electrons transmitted through a sample (S). The microscope (100) includes a segmented detector (20) having a detection surface (23) for detecting the electrons transmitted through the sample (S). The detection surface (23) is divided into detector segments (D1-D16) for detecting the electrons transmitted through the sample (S). The microscope (100) further includes an aperture plate (30) for limiting the active areas of the detector segments (D1-D16) on which the electrons impinge.
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公开(公告)号:US09576768B2
公开(公告)日:2017-02-21
申请号:US15000134
申请日:2016-01-19
Applicant: JEOL Ltd.
Inventor: Yuji Kohno
IPC: H01J37/141
CPC classification number: H01J37/141 , H01J2237/141 , H01J2237/26
Abstract: A multipole lens is provided which is for use in electron microscopy and which is simple in structure but capable of producing X- and Y-components of a quadrupole field and X- and Y-components of an octopole field. The multipole lens (100) comprises: first through twelfth polar elements (10-1 to 10-12); first through sixteenth coils (20-1 to 20-16); a first power supply (30-1) for supplying currents to the coils (20-1, 20-4, 20-9, 20-12); a second power supply (30-2) for supplying currents to the coils (20-3, 20-5, 20-11, 20-13); a third power supply (30-3) for supplying excitation currents to the coils (20-6, 20-8, 20-14, 20-16); and a fourth power supply (30-4) for supplying excitation currents to the coils (20-2, 20-7, 20-10, 20-15). The coils (20-1, 20-3, 20-6, 20-7, 20-9, 20-11, 20-14, 20-15) produce magnetic fields in a first direction. The coils (20-2, 20-4, 20-5, 20-8, 20-10, 20-12, 20-13, 20-16) produce magnetic fields in a direction opposite to the first direction.
Abstract translation: 提供用于电子显微镜的多极镜头,其结构简单,但能够产生四极场的X和Y分量以及八极场的X和Y分量。 多极透镜(100)包括:第一至第十二极性元件(10-1至10-12); 第一至十六线圈(20-1至20-16); 用于向线圈(20-1,20-4,20-9,20-12)提供电流的第一电源(30-1); 用于向线圈(20-3,20-5,20-11,20-13)供给电流的第二电源(30-2); 用于向所述线圈(20-6,20-8,20-14,20-16)供给励磁电流的第三电源(30-3); 以及用于向所述线圈(20-2,20-7,20-10,20-15)提供励磁电流的第四电源(30-4)。 线圈(20-1,20-3,20-6,20-7,20-9,20-11,20-14,20-15)产生沿第一方向的磁场。 线圈(20-2,20-4,20-5,20-8,20-10,20-12,20-13,20-16)沿与第一方向相反的方向产生磁场。
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公开(公告)号:US08859964B2
公开(公告)日:2014-10-14
申请号:US13915725
申请日:2013-06-12
Applicant: JEOL Ltd.
Inventor: Yuji Kohno
IPC: G01R31/305 , H01J37/28 , H01J37/244 , H01J37/22
CPC classification number: H01J37/22 , H01J37/244 , H01J37/28 , H01J2237/0206 , H01J2237/0209 , H01J2237/06341 , H01J2237/24514 , H01J2237/24528 , H01J2237/2801 , H01J2237/2826
Abstract: An electron microscope is offered which has a detector and a noise canceling circuit whose offset can be easily adjusted if any information about the offset of the detector is not available. Also, a method of adjusting this microscope is offered. The method of adjusting the electron microscope (1) starts with measuring the output voltage from a preamplifier (20) at given timing while blocking the electron beam transmitted through a sample (14) from hitting the detector (15) (step S140). An offset voltage to be set into the noise canceling circuit (30) is calculated based on the measured output voltage from the preamplifier (20) (step S150). The calculated offset voltage is set into the noise canceling circuit (30) (step S160).
Abstract translation: 提供具有检测器和噪声消除电路的电子显微镜,如果没有关于检测器的偏移的信息不可用,则可以容易地调整其偏移。 此外,还提供了一种调整该显微镜的方法。 调整电子显微镜(1)的方法从在给定时刻测量来自前置放大器(20)的输出电压开始,同时阻挡透过样品(14)的电子束撞击检测器(15)(步骤S140)。 基于来自前置放大器(20)的测量输出电压计算要设置到噪声消除电路(30)中的偏移电压(步骤S150)。 将计算出的偏移电压设定在噪声消除电路(30)中(步骤S160)。
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公开(公告)号:US20250132118A1
公开(公告)日:2025-04-24
申请号:US18923770
申请日:2024-10-23
Applicant: JEOL Ltd.
Inventor: Yuji Kohno , Hidetaka Sawada , Akihiro Ikeda
IPC: H01J37/073 , H01J37/26
Abstract: There is provided a charged particle gun capable of increasing the number of charged particles contained in each pulse. The charged particle gun operates to emit a charged particle beam and includes: an emitter, an extraction electrode for extracting the charged particle beam from the emitter, a capacitor having one end connected to the extraction electrode, an offset power supply for supplying a first voltage to the one end of the capacitor via a resistor, a pulsed power supply providing an output of a second voltage, and a switch circuit that switches between whether the second voltage or a reference potential is supplied to the other end of the capacitor, based on a reference pulsed signal.
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公开(公告)号:US20230349839A1
公开(公告)日:2023-11-02
申请号:US18125460
申请日:2023-03-23
Applicant: JEOL Ltd.
Inventor: Hidetaka Sawada , Takeshi Kaneko , Shigeyuki Morishita , Yuji Kohno
CPC classification number: G01N23/04 , G01N23/18 , G01N2223/3301 , G01N2223/418
Abstract: An electron microscope includes an irradiation optical system that focuses electron beams and scans a specimen with the focused electron beams; a deflector that deflects the electron beams transmitted through the specimen; a detector that detects the electron beams transmitted through the specimen; and a control unit that controls the irradiation optical system and the deflector The control unit causes the irradiation optical system to scan the specimen with the electron beams so that the electron beams have a plurality of irradiation positions on the specimen. The control unit causes the deflector to repeatedly deflect the electron beams transmitted through each of the irradiation positions, so that a plurality of electron beams which have the same irradiation position and different incident angle ranges with respect to the specimen are caused to sequentially enter the detector.
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公开(公告)号:US20230127255A1
公开(公告)日:2023-04-27
申请号:US17973993
申请日:2022-10-26
Applicant: JEOL Ltd.
Inventor: Kazunori Somehara , Yuji Kohno
IPC: H01J37/147 , H01J37/10 , H01J37/26 , H01J37/28
Abstract: An electron microscope includes an electron source for emitting an electron beam, an illumination lens for focusing the beam, an aberration corrector for correcting aberrations, an illumination deflector assembly disposed between the illumination lens and the aberration corrector and operating to deflect the beam and to vary its tilt relative to a sample, a scanning deflector for scanning the sample with the beam, an objective lens, a detector for detecting electrons transmitted through the sample and producing an image signal, a control section for controlling the illumination deflector assembly, and an image generating section for receiving the image signal and generating a differential phase contrast (DPC) image. The tilt of the beam is varied by the illumination deflector assembly such that the image generating section generates a plurality of DPC images at different tilt angles of the beam and creates a final image based on the DPC images.
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公开(公告)号:US11456151B2
公开(公告)日:2022-09-27
申请号:US17375208
申请日:2021-07-14
Applicant: JEOL Ltd.
Inventor: Yuji Kohno
IPC: H01J37/28 , H01J37/147 , H01J37/22
Abstract: An image acquisition method is provided for use in an electron microscope for scanning a sample by an electron probe and acquiring a scanned image. The method includes the steps of: raster scanning a region of the sample under observation with the electron probe and obtaining a first scanned image; raster scanning the region under observation with the electron probe and obtaining a second scanned image; and superimposing the first and second scanned images over each other. In the step of obtaining the first scanned image, each one of scan lines is drawn with the electron probe in a first direction and then moved in a second direction perpendicular to the first direction. In the step of obtaining the second scanned image, each one of the scan lines is drawn with the electron probe in the first direction and then moved in a third direction opposite to the second direction.
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