公开(公告)号：US09632043B2

公开(公告)日：2017-04-25

申请号：US14708323

申请日：2015-05-11

Applicant: JORDAN VALLEY SEMICONDUCTORS LTD.

Inventor： Isaac Mazor ,  Fouad Atrash ,  Alex Tokar ,  Olga Ostrovsky

IPC: G01N23/00 ,  G01N23/207 ,  G01N23/223 ,  H01L21/66

CPC classification number: G01N23/2076 ,  G01N23/223 ,  G01N2223/6116 ,  H01L22/12

Abstract: A method for X-ray Fluorescence (XRF) analysis includes directing an X-ray beam onto a sample and measuring an XRF signal excited from the sample, in a reference measurement in which the sample includes one or more first layers formed on a substrate, and in a target measurement after one or more second layers are formed on the substrate in addition to the first layers, so as to produce a reference XRF spectrum and a target XRF spectrum, respectively. A contribution of the first layers to the target XRF spectrum is reduced using the reference XRF spectrum. A parameter of at least one of the second layers is estimated using the target XRF spectrum in which the contribution of the first layers has been reduced.

公开(公告)号：US09606073B2

公开(公告)日：2017-03-28

申请号：US14735162

申请日：2015-06-10

Applicant: JORDAN VALLEY SEMICONDUCTORS LTD.

Inventor： Isaac Mazor ,  Alex Krokhmal ,  Alex Dikopoltsev ,  Matthew Wormington

IPC: G01N23/201

CPC classification number: G01N23/201 ,  G01N2223/6116

Abstract: Apparatus, including a sample-support that retains a sample in a plane having an axis, the plane defining first and second regions separated by the plane. A source-mount in the first region rotates about the axis, and an X-ray source on the source-mount directs first and second incident beams of X-rays to impinge on the sample at first and second angles along beam axes that are orthogonal to the axis. A detector-mount in the second region moves in a plane orthogonal to the axis and an X-ray detector on the detector-mount receives first and second diffracted beams of X-rays transmitted through the sample in response to the first and second incident beams, and outputs first and second signals, respectively, in response to the received first and second diffracted beams. A processor analyzes the first and the second signals so as to determine a profile of a surface of the sample.

公开(公告)号：US20150369759A1

公开(公告)日：2015-12-24

申请号：US14735162

申请日：2015-06-10

Applicant: JORDAN VALLEY SEMICONDUCTORS LTD.

Inventor： Isaac Mazor ,  Alex Krokhmal ,  Alex Dikopoltsev ,  Matthew Wormington

IPC: G01N23/201 ,  G01N23/205 ,  G01N23/20

CPC classification number: G01N23/201 ,  G01N2223/6116

Abstract: Apparatus, including a sample-support that retains a sample in a plane having an axis, the plane defining first and second regions separated by the plane. A source-mount in the first region rotates about the axis, and an X-ray source on the source-mount directs first and second incident beams of X-rays to impinge on the sample at first and second angles along beam axes that are orthogonal to the axis. A detector-mount in the second region moves in a plane orthogonal to the axis and an X-ray detector on the detector-mount receives first and second diffracted beams of X-rays transmitted through the sample in response to the first and second incident beams, and outputs first and second signals, respectively, in response to the received first and second diffracted beams. A processor analyzes the first and the second signals so as to determine a profile of a surface of the sample.

Abstract translation: 一种装置，包括将样品保持在具有轴的平面中的样品支撑体，所述平面限定由平面分隔的第一和第二区域。 第一区域中的源极安装围绕轴线旋转，源极安装座上的X射线源引导X射线的第一和第二入射光束沿着正交的束轴以第一和第二角度以第一和第二角度撞击在样品上 到轴。 第二区域中的检测器安装件在与轴线正交的平面中移动，并且检测器安装座上的X射线检测器响应于第一和第二入射光束接收通过样品传输的第一和第二衍射光束的X射线 并且响应于接收到的第一和第二衍射光束分别输出第一和第二信号。 处理器分析第一和第二信号，以便确定样品表面的轮廓。

公开(公告)号：US20140286473A1

公开(公告)日：2014-09-25

申请号：US14222635

申请日：2014-03-23

Applicant: JORDAN VALLEY SEMICONDUCTORS LTD.

Inventor： Alex Tokar ,  Alex Dikopoltsev ,  Isaac Mazor ,  Matthew Wormington

IPC: G01N23/223

CPC classification number: G01N23/223 ,  G01N2223/076

Abstract: A method for inspection includes capturing an optical image of one or more features on a surface of a sample and irradiating an area of the sample containing at least one of the features with an X-ray beam. An intensity of X-ray fluorescence emitted from the sample in response to the irradiating X-ray beam is measured. The optical image is processed so as to extract geometrical parameters of the at least one of the features and to compute a correction factor responsively to the geometrical parameters. The correction factor is applied to the measured intensity in order to derive a property of the at least one of the features.

Abstract translation: 检查方法包括：在样品的表面上捕获一个或多个特征的光学图像，并用X射线束照射含有至少一个特征的样品的区域。 测量响应于照射X射线束从样品发射的X射线荧光的强度。 处理光学图像以便提取至少一个特征的几何参数并且计算响应于几何参数的校正因子。 校正因子被应用于测量的强度，以便导出至少一个特征的属性。

公开(公告)号：US09666322B2

公开(公告)日：2017-05-30

申请号：US14565474

申请日：2014-12-10

Applicant: JORDAN VALLEY SEMICONDUCTORS LTD.

Inventor： Isaac Mazor ,  Asher Peled ,  Alex Brandt ,  Matthew Wormington

IPC: H01J35/04 ,  G21K1/06 ,  H01J35/14 ,  H05G1/52

CPC classification number: G21K1/06 ,  H01J35/14 ,  H05G1/52

Abstract: An apparatus includes an X-ray tube, X-ray optics, one or more coils and control circuitry. The X-ray tube is configured to direct an electron beam onto an anode so as to emit an X-ray beam. The X-ray optics which configured to receive the X-ray beam emitted from the X-ray tube and to direct the X-ray beam onto a target. The coils are configured to steer the electron beam in the X-ray tube using electrical currents flowing through the coils. The control circuitry is configured to compensate for misalignment between the X-ray tube and the X-ray optics by analyzing the X-ray beam output by the X-ray optics, and setting the electrical currents based on the analyzed X-ray beam.

公开(公告)号：US09551677B2

公开(公告)日：2017-01-24

申请号：US14555613

申请日：2014-11-27

Applicant: JORDAN VALLEY SEMICONDUCTORS LTD.

Inventor： Isaac Mazor ,  Asher Peled

IPC: G01N23/223

CPC classification number: G01N23/223 ,  G01N2223/61 ,  G01N2223/6116

Abstract: A method includes directing an X-ray beam to be incident at a grazing angle on a location on a surface of the sample. An X-ray fluorescence excited at the location is measured. A reflection angle of the X-ray beam from the surface and a transmission angle of the X-ray beam are measured. An angle of incidence of the X-ray beam on the surface is evaluated using the measured reflection and transmission angles, and the measured X-ray fluorescence is analyzed using the evaluated angle of incidence.

Abstract translation: 一种方法包括将X射线束以掠射角入射到样品表面上的位置。 测量在该位置激发的X射线荧光。 测量来自表面的X射线束的反射角和X射线束的透射角。 使用测量的反射和透射角来评估X射线束在表面上的入射角，并且使用估计的入射角来分析测量的X射线荧光。

公开(公告)号：US09390984B2

公开(公告)日：2016-07-12

申请号：US13647408

申请日：2012-10-09

Applicant: JORDAN VALLEY SEMICONDUCTORS LTD.

Inventor： Isaac Mazor ,  Alex Tokar ,  Boris Yokhin ,  Matthew Wormington

IPC: H01L21/44 ,  H01L21/66

CPC classification number: H01L22/12

Abstract: A method for inspection includes irradiating, with a focused beam, a feature formed on a semiconductor wafer, the feature including a volume containing a first material and a cap made of a second material, different from the first material, that is formed over the volume. One or more detectors positioned at different angles relative to the feature are used to detect X-ray fluorescent photons that are emitted by the first material in response to the irradiating beam and pass through the cap before striking the detectors. Signals output by the one or more detectors at the different angles in response to the detected photons are processed in order to assess a quality of the cap.

公开(公告)号：US20130089178A1

公开(公告)日：2013-04-11

申请号：US13647408

申请日：2012-10-09

Applicant: Jordan Valley Semiconductors Ltd.

Inventor： Isaac Mazor ,  Alex Tokar ,  Boris Yokhin ,  Matthew Wormington

IPC: G01N23/223

CPC classification number: H01L22/12

Abstract: A method for inspection includes irradiating, with a focused beam, a feature formed on a semiconductor wafer, the feature including a volume containing a first material and a cap made of a second material, different from the first material, that is formed over the volume. One or more detectors positioned at different angles relative to the feature are used to detect X-ray fluorescent photons that are emitted by the first material in response to the irradiating beam and pass through the cap before striking the detectors. Signals output by the one or more detectors at the different angles in response to the detected photons are processed in order to assess a quality of the cap.

Abstract translation: 一种用于检查的方法包括用聚焦光束照射形成在半导体晶片上的特征，所述特征包括容纳第一材料的体积和与所述第一材料不同的第二材料制成的帽，所述第二材料形成在所述体积 。 使用相对于特征以不同角度定位的一个或多个检测器来检测由第一材料响应于照射束而发射的X射线荧光光子，并在撞击检测器之前穿过盖。 处理由响应于检测到的光子以不同角度输出的一个或多个检测器的信号，以便评估盖的质量。

公开(公告)号：US09389192B2

公开(公告)日：2016-07-12

申请号：US14222635

申请日：2014-03-23

Applicant: Jordan Valley Semiconductors Ltd.

Inventor： Alex Tokar ,  Alex Dikopoltsev ,  Isaac Mazor ,  Matthew Wormington

IPC: G01N23/223

CPC classification number: G01N23/223 ,  G01N2223/076

Abstract: A method for inspection includes capturing an optical image of one or more features on a surface of a sample and irradiating an area of the sample containing at least one of the features with an X-ray beam. An intensity of X-ray fluorescence emitted from the sample in response to the irradiating X-ray beam is measured. The optical image is processed so as to extract geometrical parameters of the at least one of the features and to compute a correction factor responsively to the geometrical parameters. The correction factor is applied to the measured intensity in order to derive a property of the at least one of the features.

Abstract translation: 检查方法包括：在样品的表面上捕获一个或多个特征的光学图像，并用X射线束照射含有至少一个特征的样品的区域。 测量响应于照射X射线束从样品发射的X射线荧光的强度。 处理光学图像以便提取至少一个特征的几何参数并且计算响应于几何参数的校正因子。 校正因子被应用于测量的强度，以便导出至少一个特征的属性。

公开(公告)号：US20150330921A1

公开(公告)日：2015-11-19

申请号：US14708323

申请日：2015-05-11

Applicant: JORDAN VALLEY SEMICONDUCTORS LTD.

Inventor： Isaac Mazor ,  Fouad Atrash ,  Alex Tokar ,  Olga Ostrovsky

IPC: G01N23/223

CPC classification number: G01N23/2076 ,  G01N23/223 ,  G01N2223/6116 ,  H01L22/12

Abstract: A method for X-ray Fluorescence (XRF) analysis includes directing an X-ray beam onto a sample and measuring an XRF signal excited from the sample, in a reference measurement in which the sample includes one or more first layers formed on a substrate, and in a target measurement after one or more second layers are formed on the substrate in addition to the first layers, so as to produce a reference XRF spectrum and a target XRF spectrum, respectively. A contribution of the first layers to the target XRF spectrum is reduced using the reference XRF spectrum. A parameter of at least one of the second layers is estimated using the target XRF spectrum in which the contribution of the first layers has been reduced.

Abstract translation: 用于X射线荧光（XRF）分析的方法包括将X射线束引导到样品上并测量从样品激发的XRF信号，其中参考测量中样品包括形成在基底上的一个或多个第一层， 并且在除了第一层之外在基板上形成一个或多个第二层之后的目标测量中，以分别产生参考XRF光谱和目标XRF光谱。 使用参考XRF谱减少第一层对目标XRF谱的贡献。 使用其中第一层的贡献已经减小的目标XRF光谱来估计第二层中的至少一个的参数。