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公开(公告)号：US20230155034A1
公开(公告)日：2023-05-18
申请号：US18157082
申请日：2023-01-20
Applicant: KANEKA CORPORATION
Inventor： Hirofumi Inari , Hiroshi Yoshimoto , Masahito Ide , Takao Manabe
IPC: H01L29/786 , H01L29/417 , H01L29/66
CPC classification number: H01L29/7869 , H01L29/41733 , H01L29/66742
Abstract: A thin-film transistor element including a gate layer, an oxide semiconductor thin-film, a gate insulating film disposed between the gate layer and the oxide semiconductor thin-film, a pair of source-drain electrodes electrically connected to the oxide semiconductor thin-film, and a resin film covering the oxide semiconductor thin-film is provided. The oxide semiconductor thin-film contains two or more metal elements selected from indium, gallium, zinc, and tin. The resin film is in contact with the oxide semiconductor thin-film. The resin film may include a compound that contains a SiH group. The resin film may be formed by applying a composition including a SiH group-containing compound onto the oxide semiconductor thin-film, and heating the composition.
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公开(公告)号：US09494861B2
公开(公告)日：2016-11-15
申请号：US14410438
申请日：2013-07-02
Applicant: KANEKA CORPORATION
Inventor： Masahito Ide , Hirofumi Inari , Aki Kitajima , Komei Tahara , Takao Manabe
IPC: G03F7/004 , G03F7/027 , C08K5/549 , C08G77/388 , G03F7/039 , G03F7/075 , G03F7/40 , H01L51/00 , H01L51/05 , C07F7/18 , H01L21/02 , H01L21/033
CPC classification number: G03F7/0755 , C07F7/1804 , C08G77/388 , C08K5/549 , G03F7/027 , G03F7/0392 , G03F7/0757 , G03F7/162 , G03F7/20 , G03F7/322 , G03F7/40 , H01L21/02126 , H01L21/02216 , H01L21/0332 , H01L21/441 , H01L23/293 , H01L29/42364 , H01L29/51 , H01L29/66969 , H01L29/7869 , H01L51/0094 , H01L51/0508
Abstract: The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to a first aspect of the present invention is characterized by including (A) a compound that contains an alkenyl group or a SiH group within a molecule and has a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; (B) a compound that contains a SiH group or an alkenyl group within a molecule; (C) a hydrosilylation catalyst; and (D) a photoacid generator.
Abstract translation: 本发明的目的在于提供具有优异的图案化特性的正型光敏组合物，并且在固化时（作为薄膜）可以表现出优异的电绝缘可靠性。 根据本发明第一方面的正型光敏组合物的特征在于包括（A）在分子内含有烯基或SiH基的化合物，并且具有在酸存在下分解以产生酸性基团的结构 或羟基; （B）分子内含有SiH基或烯基的化合物; （C）氢化硅烷化催化剂; 和（D）光致酸产生剂。
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Patent Agency Ranking
3.发明申请公开(公告)号：US20150192850A1
公开(公告)日：2015-07-09
申请号：US14410438
申请日：2013-07-02
Applicant: KANEKA CORPORATION
Inventor： Masahito Ide , Hirofumi Inari , Aki Kitajima , Komei Tahara , Takao Manabe
CPC classification number: G03F7/0755 , C07F7/1804 , C08G77/388 , C08K5/549 , G03F7/027 , G03F7/0392 , G03F7/0757 , G03F7/162 , G03F7/20 , G03F7/322 , G03F7/40 , H01L21/02126 , H01L21/02216 , H01L21/0332 , H01L21/441 , H01L23/293 , H01L29/42364 , H01L29/51 , H01L29/66969 , H01L29/7869 , H01L51/0094 , H01L51/0508
Abstract: The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to a first aspect of the present invention is characterized by including (A) a compound that contains an alkenyl group or a SiH group within a molecule and has a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; (B) a compound that contains a SiH group or an alkenyl group within a molecule; (C) a hydrosilylation catalyst; and (D) a photoacid generator.
Abstract translation: 本发明的目的在于提供具有优异的图案化特性的正型光敏组合物，并且在固化时（作为薄膜）可以表现出优异的电绝缘可靠性。 根据本发明第一方面的正型光敏组合物的特征在于包括（A）在分子内含有烯基或SiH基的化合物，并且具有在酸存在下分解以产生酸性基团的结构 或羟基; （B）分子内含有SiH基或烯基的化合物; （C）氢化硅烷化催化剂; 和（D）光致酸产生剂。
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公开(公告)号：US10976663B2
公开(公告)日：2021-04-13
申请号：US16337470
申请日：2017-09-21
Applicant: KANEKA CORPORATION
Inventor： Hirofumi Inari , Susumu Amano , Aki Kitajima , Yoshikatsu Ichiryu , Masahito Ide , Takao Manabe
Abstract: A photosensitive composition contains a polysiloxane compound, a photoacid generator, a coloring agent and a solvent. A content of the coloring agent with respect to a total solid content of the composition is 5% by weight or more. The polysiloxane compound contains a cyclic polysiloxane structure and a cationically polymerizable functional group. The polysiloxane compound may further have an alkali-soluble functional group. A content of the polysiloxane compound with respect to the total solid content of the composition is preferably 20-80% by weight. The photosensitive composition is used, for example, in formation of a colored pattern.
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5.发明申请MODIFIED POLYHEDRAL POLYSILOXANE, COMPOSITION CONTAINING THE MODIFIED POLYHEDRAL POLYSILOXANE, AND CURED PRODUCT OBTAINED BY CURING THE COMPOSITION 审中-公开改性聚醚多羟基聚合物，含有改性聚醚多元醇的组合物，以及通过固化而得到的固化产物公开(公告)号：US20130192491A1
公开(公告)日：2013-08-01
申请号：US13796186
申请日：2013-03-12
Applicant: Kaneka Corporation
Inventor： Yoshitaka Nishiyama , Masahito Ide , Takao Manabe , Hiroyuki Tanaka
IPC: C09D4/00
CPC classification number: C09D4/00
Abstract: A modified polyhedral polysiloxane obtained by hydrosilylation of an alkenyl group-containing polyhedral polysiloxane compound (a), a hydrosilyl group-containing compound (b), and a cyclic olefin compound (c) having one carbon-carbon double bond in its molecule.
Abstract translation: 通过在其分子中含有含烯基的多面体聚硅氧烷化合物（a），含氢化甲硅烷基的化合物（b）和具有一个碳 - 碳双键的环状烯烃化合物（c）的氢化硅烷化获得的改性多面体聚硅氧烷。
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公开(公告)号：US20210359276A1
公开(公告)日：2021-11-18
申请号：US17193769
申请日：2019-09-05
Applicant: KANEKA CORPORATION
Inventor： Hirofumi Inari , Hiroshi Yoshimoto , Masahito Ide , Takao Manabe
Abstract: The present disclosure is directed to a light-shielding colored resin layer formed on a substrate, and a patterned protective layer formed on the colored resin layer. By removing the colored resin layer exposed in an opening of the protective layer by dry etching, thereby patterning the colored resin layer, a partition wall in which the protective layer is provided on a patterned colored resin layer is formed. This partition wall partitions the display surface of an image display device into a plurality of regions; and an image display device is formed by filling spaces, which are partitioned by the partition wall, with a color developing material.
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公开(公告)号：US09588425B2
公开(公告)日：2017-03-07
申请号：US15288722
申请日：2016-10-07
Applicant: KANEKA CORPORATION
Inventor： Masahito Ide , Hirofumi Inari , Aki Kitajima , Komei Tahara , Takao Manabe
IPC: G03F7/004 , G03F7/075 , H01L29/51 , H01L29/423 , C07F7/18 , G03F7/16 , G03F7/20 , G03F7/32 , G03F7/40 , H01L29/786 , H01L29/66 , H01L21/441 , H01L23/29 , H01L21/033 , G03F7/039 , H01L51/05 , H01L51/00 , G03F7/027 , H01L21/02 , C08G77/388 , C08K5/549
CPC classification number: G03F7/0755 , C07F7/1804 , C08G77/388 , C08K5/549 , G03F7/027 , G03F7/0392 , G03F7/0757 , G03F7/162 , G03F7/20 , G03F7/322 , G03F7/40 , H01L21/02126 , H01L21/02216 , H01L21/0332 , H01L21/441 , H01L23/293 , H01L29/42364 , H01L29/51 , H01L29/66969 , H01L29/7869 , H01L51/0094 , H01L51/0508
Abstract: The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to a first aspect of the present invention is characterized by including (A) a compound that contains an alkenyl group or a SiH group within a molecule and has a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; (B) a compound that contains a SiH group or an alkenyl group within a molecule; (C) a hydrosilylation catalyst; and (D) a photoacid generator.
Abstract translation: 本发明的目的在于提供具有优异的图案化特性的正型光敏组合物，并且在固化时（作为薄膜）可以表现出优异的电绝缘可靠性。 根据本发明第一方面的正型光敏组合物的特征在于包括（A）在分子内含有烯基或SiH基的化合物，并且具有在酸存在下分解以产生酸性基团的结构 或羟基; （B）分子内含有SiH基或烯基的化合物; （C）氢化硅烷化催化剂; 和（D）光致酸产生剂。
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