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    MACHINE LEARNING METHOD AND APPARATUS FOR INSPECTING RETICLES
    2.
    发明申请
    MACHINE LEARNING METHOD AND APPARATUS FOR INSPECTING RETICLES 有权
    机器学习方法和检测手段的设备

    公开(公告)号：US20140341462A1

    公开(公告)日：2014-11-20

    申请号：US14274972

    申请日：2014-05-12

    Applicant: KLA-Tencor Corporation

    Inventor： Abdurrahman Sezginer ,  Gang Pan ,  Bing Li

    IPC: G06T7/00 ,  G06K9/62

    CPC classification number: G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2021/95676 ,  G01N2201/12 ,  G03F1/84 ,  G03F7/7065 ,  G06K9/6232 ,  G06K9/6252 ,  G06K9/6282 ,  G06N99/005 ,  G06T7/0008 ,  G06T2207/20081 ,  G06T2207/30148

    Abstract: Apparatus and methods for inspecting a photolithographic reticle are disclosed. A reticle inspection tool is used at one or more operating modes to obtain images of a plurality of training regions of a reticle, and the training regions are identified as defect-free. Three or more basis training images are derived from the images of the training regions. A classifier is formed based on the three or more basis training images. The inspection system is used at the one or more operating modes to obtain images of a plurality of test regions of a reticle. Three or more basis test images are derived from to the test regions. The classifier is applied to the three or more basis test images to find defects in the test regions.

    Abstract translation: 公开了用于检查光刻掩模版的装置和方法。 在一种或多种操作模式下使用掩模版检查工具来获得掩模版的多个训练区域的图像，并且将训练区域识别为无缺陷。 从训练区域的图像导出三个或更多个基础训练图像。 基于三个或更多个基础训练图像形成分类器。 在一个或多个操作模式下使用检查系统以获得掩模版的多个测试区域的图像。 三个或更多个基础测试图像来自测试区域。 分类器应用于三个或更多个基础测试图像，以在测试区域中发现缺陷。

    Detection of thin lines for selective sensitivity during reticle inspection using processed images
    3.
    发明授权
    Detection of thin lines for selective sensitivity during reticle inspection using processed images 有权
    在使用处理图像的掩模版检查期间检测细线以选择灵敏度

    公开(公告)号：US09092847B2

    公开(公告)日：2015-07-28

    申请号：US14475400

    申请日：2014-09-02

    Applicant: KLA-Tencor Corporation

    Inventor： Zhengyu Wang ,  Rui-fang Shi ,  Lih-Huah Yiin ,  Bing Li

    IPC: G06K9/62 ,  G06T7/00 ,  G03F1/84 ,  G01N21/956

    CPC classification number: G06T7/001 ,  G01N2021/95676 ,  G03F1/84 ,  G06T7/13 ,  G06T7/174 ,  G06T2207/10016 ,  G06T2207/10152 ,  G06T2207/20044 ,  G06T2207/20161 ,  G06T2207/20221 ,  G06T2207/30148

    Abstract: A detection method for a spot image based thin line detection is disclosed. The method includes a step for constructing a band limited spot image from a transmitted and reflected optical image of the mask. The spot image is calibrated to reduce noise introduced by the one or more inspection systems. Based on the band limited spot image, a non-printable feature map is generated for the non-printable features and a printable feature map is generated for the printable features. One or more test images of the mask are analyzed to detect defects on such mask. A sensitivity level of defect detection is reduced in areas of the one or more test images defined by the non-printable feature map, as compared with areas of the one or more test images that are not defined by the non-printable features map

    Abstract translation: 公开了一种用于基于点图像的细线检测的检测方法。 该方法包括从掩模的透射和反射光学图像构造带限光斑图像的步骤。 斑点图像被校准以减少由一个或多个检查系统引入的噪声。 基于带限点图像，为不可打印的特征生成不可打印的特征图，并且为可打印特征生成可打印的特征图。 分析掩模的一个或多个测试图像以检测该掩模上的缺陷。 与由不可打印的特征图定义的一个或多个测试图像的区域相比，在由不可打印的特征图定义的一个或多个测试图像的区域中减少了缺陷检测的灵敏度水平

    DETECTION OF THIN LINES FOR SELECTIVE SENSITIVITY DURING RETICLE INSPECTION USING PROCESSED IMAGES
    4.
    发明申请
    DETECTION OF THIN LINES FOR SELECTIVE SENSITIVITY DURING RETICLE INSPECTION USING PROCESSED IMAGES 有权
    使用加工图像检测检验期间选择灵敏度的薄线

    公开(公告)号：US20140369593A1

    公开(公告)日：2014-12-18

    申请号：US14475400

    申请日：2014-09-02

    Applicant: KLA-Tencor Corporation

    Inventor： Zhengyu Wang ,  Rui-fang Shi ,  Lih-Huah Yiin ,  Bing Li

    IPC: G06T7/00 ,  G03F1/84

    CPC classification number: G06T7/001 ,  G01N2021/95676 ,  G03F1/84 ,  G06T7/13 ,  G06T7/174 ,  G06T2207/10016 ,  G06T2207/10152 ,  G06T2207/20044 ,  G06T2207/20161 ,  G06T2207/20221 ,  G06T2207/30148

    Abstract: A detection method for a spot image based thin line detection is disclosed. The method includes a step for constructing a band limited spot image from a transmitted and reflected optical image of the mask. The spot image is calibrated to reduce noise introduced by the one or more inspection systems. Based on the band limited spot image, a non-printable feature map is generated for the non-printable features and a printable feature map is generated for the printable features. One or more test images of the mask are analyzed to detect defects on such mask. A sensitivity level of defect detection is reduced in areas of the one or more test images defined by the non-printable feature map, as compared with areas of the one or more test images that are not defined by the non-printable features map

    Abstract translation: 公开了一种用于基于点图像的细线检测的检测方法。 该方法包括从掩模的透射和反射光学图像构造带限光斑图像的步骤。 斑点图像被校准以减少由一个或多个检查系统引入的噪声。 基于带限点图像，为不可打印的特征生成不可打印的特征图，并且为可打印特征生成可打印的特征图。 分析掩模的一个或多个测试图像以检测该掩模上的缺陷。 与由不可打印的特征图定义的一个或多个测试图像的区域相比，在由不可打印的特征图定义的一个或多个测试图像的区域中减少了缺陷检测的灵敏度水平

    RETICLE DEFECT INSPECTION WITH SYSTEMATIC DEFECT FILTER
    5.
    发明申请
    RETICLE DEFECT INSPECTION WITH SYSTEMATIC DEFECT FILTER 审中-公开
    系统缺陷过滤器的故障检测

    公开(公告)号：US20140205179A1

    公开(公告)日：2014-07-24

    申请号：US14223709

    申请日：2014-03-24

    Applicant: KLA-Tencor Corporation

    Inventor： Bing Li ,  Weimin Ma ,  Joseph M. Blecher

    IPC: G06T7/00

    CPC classification number: G06T7/0002 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F1/84 ,  G06T7/001 ,  G06T2207/30148

    Abstract: Disclosed are methods and apparatus for inspecting a photolithographic reticle. A stream of defect data is received from a reticle inspection system, wherein the defect data identifies a plurality of defects that were detected for a plurality of different portions of the reticle. Before reviewing the defect data to determine whether the reticle passes inspection and as the stream of defect data continues to be received, some of the defects are automatically grouped with other most recently one or more received defects so as form groups of substantially matching defects. Before reviewing the defect data to determine whether the reticle passes inspection and after all of the defect data for the reticle is received, one or more of the groups of defects that have a number above a predetermined threshold are automatically filtered from the defect data so as to form filtered defect data. The filtered defect data may then be provided to a review station for determining whether the reticle passes.

    Abstract translation: 公开了用于检查光刻掩模版的方法和装置。 从掩模版检查系统接收缺陷数据流，其中缺陷数据识别针对掩模版的多个不同部分检测到的多个缺陷。 在检查缺陷数据以确定掩模版是否通过检查并且随着缺陷数据流继续被接收之后，一些缺陷自动与其他最近一个或多个接收到的缺陷分组，以便形成基本上匹配的缺陷的组。 在检查缺陷数据以确定掩模版是否通过检查之前，并且在接收到所有掩模版的缺陷数据之后，从缺陷数据中自动过滤具有高于预定阈值的数量的缺陷组中的一个或多个，以便 以形成过滤的缺陷数据。 然后可以将过滤的缺陷数据提供给审查站，以确定标线是否通过。

    Reticle defect inspection with systematic defect filter
    8.
    发明授权
    Reticle defect inspection with systematic defect filter 有权
    带有系统缺陷过滤器的光罩缺陷检查

    公开(公告)号：US09224195B2

    公开(公告)日：2015-12-29

    申请号：US14223709

    申请日：2014-03-24

    Applicant: KLA-Tencor Corporation

    Inventor： Bing Li ,  Weimin Ma ,  Joseph M. Blecher

    IPC: G06T7/00 ,  G01N21/956

    CPC classification number: G06T7/0002 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F1/84 ,  G06T7/001 ,  G06T2207/30148

    Abstract: Disclosed are methods and apparatus for inspecting a photolithographic reticle. A stream of defect data is received from a reticle inspection system, wherein the defect data identifies a plurality of defects that were detected for a plurality of different portions of the reticle. Before reviewing the defect data to determine whether the reticle passes inspection and as the stream of defect data continues to be received, some of the defects are automatically grouped with other most recently one or more received defects so as form groups of substantially matching defects. Before reviewing the defect data to determine whether the reticle passes inspection and after all of the defect data for the reticle is received, one or more of the groups of defects that have a number above a predetermined threshold are automatically filtered from the defect data so as to form filtered defect data. The filtered defect data may then be provided to a review station for determining whether the reticle passes.

    Abstract translation: 公开了用于检查光刻掩模版的方法和装置。 从掩模版检查系统接收缺陷数据流，其中缺陷数据识别针对掩模版的多个不同部分检测到的多个缺陷。 在检查缺陷数据以确定掩模版是否通过检查并且随着缺陷数据流继续被接收之后，一些缺陷自动与其他最近一个或多个接收到的缺陷分组，以便形成基本上匹配的缺陷的组。 在检查缺陷数据以确定掩模版是否通过检查之前，并且在接收到所有掩模版的缺陷数据之后，从缺陷数据中自动过滤具有高于预定阈值的数量的缺陷组中的一个或多个，以便 以形成过滤的缺陷数据。 然后可以将过滤的缺陷数据提供给审查站，以确定标线是否通过。

    MACHINE LEARNING METHOD AND APPARATUS FOR INSPECTING RETICLES
    9.
    发明申请
    MACHINE LEARNING METHOD AND APPARATUS FOR INSPECTING RETICLES 有权
    机器学习方法和检测手段的设备

    公开(公告)号：US20160335753A1

    公开(公告)日：2016-11-17

    申请号：US15221304

    申请日：2016-07-27

    Applicant: KLA-Tencor Corporation

    Inventor： Abdurrahman Sezginer ,  Gang Pan ,  Bing Li

    IPC: G06T7/00 ,  G03F1/84 ,  G01N21/956 ,  G03F7/20 ,  G06K9/62 ,  G01N21/95

    CPC classification number: G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2021/95676 ,  G01N2201/12 ,  G03F1/84 ,  G03F7/7065 ,  G06K9/6232 ,  G06K9/6252 ,  G06K9/6282 ,  G06N99/005 ,  G06T7/0008 ,  G06T2207/20081 ,  G06T2207/30148

    Abstract: Apparatus and methods for inspecting a specimen are disclosed. An inspection tool is used at one or more operating modes to obtain images of a plurality of training regions of a specimen, and the training regions are identified as defect-free. Three or more basis training images are derived from the images of the training regions. A classifier is formed based on the three or more basis training images. The inspection system is used at the one or more operating modes to obtain images of a plurality of test regions of a specimen. Three or more basis test images are derived from to the test regions. The classifier is applied to the three or more basis test images to find defects in the test regions.

    Abstract translation: 公开了用于检查试样的装置和方法。 以一种或多种操作模式使用检查工具来获得样本的多个训练区域的图像，并且训练区域被识别为无缺陷的。 从训练区域的图像导出三个或更多个基础训练图像。 基于三个或更多个基础训练图像形成分类器。 在一个或多个操作模式下使用检查系统以获得样本的多个测试区域的图像。 三个或更多个基础测试图像来自测试区域。 分类器应用于三个或更多个基础测试图像，以在测试区域中发现缺陷。

    Machine learning method and apparatus for inspecting reticles
    10.
    发明授权
    Machine learning method and apparatus for inspecting reticles 有权
    机器学习方法和检查标线的装置

    公开(公告)号：US09430824B2

    公开(公告)日：2016-08-30

    申请号：US14274972

    申请日：2014-05-12

    Applicant: KLA-Tencor Corporation

    Inventor： Abdurrahman Sezginer ,  Gang Pan ,  Bing Li

    IPC: G06T7/00 ,  G01N21/956 ,  G06K9/62 ,  G03F7/20 ,  G03F1/84

    CPC classification number: G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2021/95676 ,  G01N2201/12 ,  G03F1/84 ,  G03F7/7065 ,  G06K9/6232 ,  G06K9/6252 ,  G06K9/6282 ,  G06N99/005 ,  G06T7/0008 ,  G06T2207/20081 ,  G06T2207/30148

    Abstract: Apparatus and methods for inspecting a photolithographic reticle are disclosed. A reticle inspection tool is used at one or more operating modes to obtain images of a plurality of training regions of a reticle, and the training regions are identified as defect-free. Three or more basis training images are derived from the images of the training regions. A classifier is formed based on the three or more basis training images. The inspection system is used at the one or more operating modes to obtain images of a plurality of test regions of a reticle. Three or more basis test images are derived from to the test regions. The classifier is applied to the three or more basis test images to find defects in the test regions.

    Abstract translation: 公开了用于检查光刻掩模版的装置和方法。 在一种或多种操作模式下使用掩模版检查工具来获得掩模版的多个训练区域的图像，并且将训练区域识别为无缺陷。 从训练区域的图像导出三个或更多个基础训练图像。 基于三个或更多个基础训练图像形成分类器。 在一个或多个操作模式下使用检查系统以获得掩模版的多个测试区域的图像。 三个或更多个基础测试图像来自测试区域。 分类器应用于三个或更多个基础测试图像，以在测试区域中发现缺陷。

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