公开(公告)号：US11410830B1

公开(公告)日：2022-08-09

申请号：US16421004

申请日：2019-05-23

Applicant: KLA-Tencor Corporation

Inventor： Hong Xiao ,  Lawrence Muray ,  Nick Petrone ,  John Gerling ,  Abdurrahman Sezginer ,  Alan D. Brodie ,  Kuljit Virk ,  Qiang Q. Zhang ,  Grace Hsiu-Ling Chen

IPC: H01J37/244 ,  H01J37/22 ,  H01J37/28

Abstract: A system is disclosed. In one embodiment, the system includes a scanning electron microscopy sub-system including an electron source configured to generate an electron beam and an electron-optical assembly including one or more electron-optical elements configured to direct the electron beam to the specimen. In another embodiment, the system includes one or more grounding paths coupled to the specimen, the one or more grounding paths configured to generate one or more transmission signals based on one or more received electron beam-induced transmission currents. In another embodiment, the system includes a controller configured to: generate control signals configured to cause the scanning electron microscopy sub-system to scan the portion of the electron beam across a portion of the specimen; receive the transmission signals via the one or more grounding paths; and generate transmission current images based on the transmission signals.

公开(公告)号：US11131629B2

公开(公告)日：2021-09-28

申请号：US15882951

申请日：2018-01-29

Applicant: KLA-Tencor Corporation

Inventor： Abdurrahman Sezginer ,  Kuljit Virk ,  Eric Vella

IPC: G01N21/41 ,  G01N21/956 ,  G01J1/44 ,  G01J9/00 ,  G01N21/55 ,  G03F1/84 ,  G03F1/32

Abstract: In one embodiment, disclosed are apparatus, methods, and targets for determining a phase shift of a photomask having a phase-shift target. An inspection or metrology system is used to direct an incident beam towards the target and then detect a plurality of intensity measurements that are transmitted through the target in response to the incident beam. A phase shift value for the target may then be determined based on the intensity measurements.

公开(公告)号：US20180340886A1

公开(公告)日：2018-11-29

申请号：US15882951

申请日：2018-01-29

Applicant: KLA-Tencor Corporation

Inventor： Abdurrahman Sezginer ,  Kuljit Virk ,  Eric Vella

IPC: G01N21/41 ,  G01J9/00 ,  G01J1/44 ,  G01N21/55

Abstract: In one embodiment, disclosed are apparatus, methods, and targets for determining a phase shift of a photomask having a phase-shift target. An inspection or metrology system is used to direct an incident beam towards the target and then detect a plurality of intensity measurements that are transmitted through the target in response to the incident beam. A phase shift value for the target may then be determined based on the intensity measurements.