Thin film transistor substrate and method for manufacturing the same
    1.
    发明授权
    Thin film transistor substrate and method for manufacturing the same 有权
    薄膜晶体管基板及其制造方法

    公开(公告)号:US08575616B2

    公开(公告)日:2013-11-05

    申请号:US13305435

    申请日:2011-11-28

    Applicant: KiTae Kim

    Inventor: KiTae Kim

    Abstract: A thin film transistor substrate and a method for manufacturing the same are discussed, in which the thin film transistor comprises a gate line and a data line arranged on a substrate to cross each other; a gate electrode connected with the gate line below the gate line; an active layer formed on the gate electrode; an etch stopper formed on the active layer; an ohmic contact layer formed on the etch stopper; source and drain electrodes formed on the ohmic contact layer; and a pixel electrode connected with the drain electrode. It is possible to prevent a crack from occurring in the gate insulating film during irradiation of the laser and prevent resistance of the gate electrode from being increased.

    Abstract translation: 讨论薄膜晶体管基板及其制造方法,其中薄膜晶体管包括布置在基板上以彼此交叉的栅极线和数据线; 栅极电极,与栅极线下方的栅极线连接; 形成在栅电极上的有源层; 形成在有源层上的蚀刻停止层; 形成在蚀刻停止器上的欧姆接触层; 源极和漏极形成在欧姆接触层上; 以及与漏电极连接的像素电极。 可以防止在激光照射期间在栅极绝缘膜中发生裂纹,并且防止栅电极的电阻增加。

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