-
公开(公告)号：US20240383017A1
公开(公告)日：2024-11-21
申请号：US18787708
申请日：2024-07-29
Applicant: Lam Research Corporation
Inventor： Amir A. YASSERI , Hong SHIH , John DAUGHERTY , Duane OUTKA , Lin XU , Armen AVOYAN , Cliff LA CROIX , Girish M HUNDI
Abstract: A method for conditioning a component of a wafer processing chamber is provided. The component is placed in an ultrasonic conditioning solution in an ultrasonic solution tank. Ultrasonic energy is applied through the ultrasonic conditioning solution to the component to clean the component. The component is submerged in a megasonic conditioning solution in a tank. Megasonic energy is applied through the megasonic conditioning solution to the component to clean the component.
-
公开(公告)号：US20240308926A1
公开(公告)日：2024-09-19
申请号：US18577889
申请日：2022-08-04
Applicant: Lam Research Corporation
Inventor： Amir A. YASSERI , Hong SHIH , Satish SRINIVASAN , Jeremiah Michael DEDERICK , Pankaj HAZARIKA , Lin XU , Douglas DETERT
CPC classification number: C04B41/0072 , B24C1/003 , H01J37/32495
Abstract: A method for treating a ceramic component for use in a semiconductor processing chamber, wherein the ceramic component comprises a ceramic laminate comprising a base zone comprising a first dielectric ceramic material, a protective, wherein the protective zone comprises a second dielectric ceramic material, and a transition zone between the protective zone and base zone, wherein the transition zone comprises the first dielectric ceramic material and the second dielectric ceramic material, wherein exposure of the ceramic component to UV light changes an optical property of at least a first part of the ceramic component is provided. A heat treatment of the ceramic component is provided by heating the ceramic component in a furnace to a temperature of between 400° C. to 1000° C. for a period between 2 hours to 20 hours, wherein the heat treatment changes the optical property of the first part of the ceramic component.
-
公开(公告)号：US20210280393A1
公开(公告)日：2021-09-09
申请号：US17255635
申请日：2019-07-01
Applicant: Lam Research Corporation
Inventor： Hong SHIH , Xiaomin BIN , Duane OUTKA , Eric A. PAPE , Gregory A. PILGRIM , Girish M. HUNDI , Cliff LA CROIX
IPC: H01J37/32
Abstract: A method for conditioning ceramic coating on a part for use in a plasma processing chamber is provided. The ceramic coating is wetted with a solution, wherein the solution is formed by mixing a solvent with an electrolyte, wherein from 1% to 10% of the electrolyte dissociates in the solution. The ceramic coating is blasted with particles. The ceramic coating is rinsed.
-
公开(公告)号：US20190233658A1
公开(公告)日：2019-08-01
申请号：US15883787
申请日：2018-01-30
Applicant: Lam Research Corporation
Inventor： Amir A. YASSERI , Duane OUTKA , Hong SHIH , John DAUGHERTY
CPC classification number: C09D5/008 , C01F7/02 , C01F17/00 , C01F17/0043 , C01G25/02 , C09D1/00 , C23C4/01 , C23C4/02 , C23C4/12
Abstract: A method for providing a part with a plasma resistant ceramic coating for use in a plasma processing chamber is provided. A patterned mask is placed on the part. A film is deposited over the part. The patterned mask is removed. A plasma resistant ceramic coating is applied on the part.
-
公开(公告)号：US20210205858A1
公开(公告)日：2021-07-08
申请号：US17211518
申请日：2021-03-24
Applicant: Lam Research Corporation
Inventor： Amir A. YASSERI , Hong SHIH , John DAUGHERTY , Duane OUTKA , Lin XU , Armen AVOYAN , Cliff LA CROIX , Girish HUNDI
Abstract: A method for conditioning a component of a wafer processing chamber is provided. The component is placed in an ultrasonic conditioning solution in an ultrasonic solution tank. Ultrasonic energy is applied through the ultrasonic conditioning solution to the component to clean the component. The component is submerged in a megasonic conditioning solution in a tank. Megasonic energy is applied through the megasonic conditioning solution to the component to clean the component.
-
Patent Agency Ranking
公开(公告)号：US20180127868A1
公开(公告)日：2018-05-10
申请号：US15843683
申请日：2017-12-15
Applicant: Lam Research Corporation
Inventor： Lin XU , Hong SHIH , Nash ANDERSON , Tom STEVENSON , John DAUGHERTY , John Michael KERNS , Robert Griffith O'NEILL
IPC: C23C14/56 , C23C16/455 , C23C16/44 , C23C16/04
CPC classification number: C23C14/564 , C23C16/045 , C23C16/4402 , C23C16/4404 , C23C16/45525 , Y10T428/263 , Y10T428/31504 , Y10T428/31551 , Y10T428/31678 , Y10T428/31721 , Y10T428/31725 , Y10T428/31786
Abstract: A fluid handling component for a vacuum chamber of a semiconductor substrate processing apparatus is provided. The fluid handling component comprises interior fluid wetted surfaces and an atomic layer deposition (ALD) or molecular layer deposition (MLD) barrier coating on the interior fluid wetted surfaces wherein the fluid wetted surfaces which include the ALD or MLD barrier coating are configured to be contacted by a process gas and/or fluid during a semiconductor substrate processing process wherein the ALD or MLD barrier coating protects the underlying fluid wetted surfaces from erosion and/or corrosion.
-
7.发明申请USE OF ATOMIC LAYER DEPOSITION COATINGS TO PROTECT BRAZING LINE AGAINST CORROSION, EROSION, AND ARCING 审中-公开原子层沉积涂料用于防止腐蚀，腐蚀和腐蚀的布线公开(公告)号：US20160375515A1
公开(公告)日：2016-12-29
申请号：US14754441
申请日：2015-06-29
Applicant: Lam Research Corporation
Inventor： Lin XU , John DAUGHERTY , Hong SHIH , Yiwei SONG , Satish SRINIVASAN
CPC classification number: B23K1/0008 , B23K1/19 , B23K2103/10 , B32B15/016 , C25D11/04 , C25D11/08 , H01J37/3244 , H01J37/32715 , H01J37/32807
Abstract: In accordance with this disclosure, there are provided several inventions, including an apparatus and method for brazing at least two aluminum or aluminum alloy components and providing an anodized coating, and an atomic layer deposition coating for adding plasma corrosion resistance.
Abstract translation: 根据本公开，提供了几个发明，包括用于钎焊至少两个铝或铝合金部件并提供阳极氧化涂层的装置和方法，以及用于添加等离子体耐腐蚀性的原子层沉积涂层。
-
公开(公告)号：US20160254125A1
公开(公告)日：2016-09-01
申请号：US14634129
申请日：2015-02-27
Applicant: Lam Research Corporation
Inventor： Lihua Li HUANG , Evan E. PATTON , Alan POPIOLKOWSKI , Brett C. RICHARDSON , Hong SHIH
CPC classification number: H01J37/32495 , C23C4/04 , C23C4/11 , C23C4/18
Abstract: A method for providing a protective layer over a substrate is provided. A ceramic layer is deposited over the substrate, wherein the ceramic layer has a porosity. A localized heating of a region of the ceramic layer to a temperature that causes the ceramic layer to melt without damaging the substrate is provided, wherein the melting the ceramic layer reduces the porosity or seals fissures or columnar grain boundaries. The region of the ceramic layer heated by the localized heating is scanned over the ceramic layer.
Abstract translation: 提供了一种在衬底上提供保护层的方法。 陶瓷层沉积在衬底上，其中陶瓷层具有孔隙率。 提供了将陶瓷层的区域局部加热到导致陶瓷层熔化而不损坏基底的温度，其中熔化陶瓷层减少孔隙率或密封裂缝或柱状晶界。 通过局部加热加热的陶瓷层的区域在陶瓷层上扫描。
-
公开(公告)号：US20230092570A1
公开(公告)日：2023-03-23
申请号：US17795509
申请日：2021-02-16
Applicant: Lam Research Corporation
Inventor： Lin XU , David Joseph WETZEL , John DAUGHERTY , Hong SHIH , Satish SRINIVASAN , Yuanping SONG , Johnny PHAM , Yiwei SONG , Christopher KIMBALL
Abstract: A method for making a component for use in a semiconductor processing chamber is provided. A component body is formed from a conductive material having a coefficient of thermal expansion of less than 10.0×10−6/K. A metal oxide layer is then disposed over a surface of the component body.
-
公开(公告)号：US20180144909A1
公开(公告)日：2018-05-24
申请号：US15874744
申请日：2018-01-18
Applicant: Lam Research Corporation
Inventor： Lihua Li HUANG , Hong SHIH , Lin XU , John DAUGHERTY
CPC classification number: H01J37/32495 , C23C14/06 , C23C16/30 , H01J37/32119 , H01J37/3244 , H01J37/32477 , H01J37/32504 , H01J37/32642 , H01J37/32715
Abstract: A method for coating a part body for use in a plasma processing chamber is provided. The part body is received into a chamber. At least part of a surface of the part body is coated by physical vapor deposition or chemical vapor deposition with a coating with a thickness of no more than 30 microns consisting essentially of a Lanthanide series or Group III or Group IV element in an oxyfluoride.
-
-
-
-
-
-
-
-
-
Search Results
17
records
(took 0.013 seconds)
