公开(公告)号：US08212992B2

公开(公告)日：2012-07-03

申请号：US13045697

申请日：2011-03-11

Applicant: Peter Kloesch ,  Michael Ringel ,  Markus Weiss

Inventor： Peter Kloesch ,  Michael Ringel ,  Markus Weiss

IPC: G02B7/02 ,  G03B27/42 ,  G03B27/52 ,  G03B27/54

CPC classification number: G03F7/709 ,  G03F7/70825 ,  G03F7/7085

Abstract: A changeable assembly for a projection exposure apparatus for semiconductor lithography contains at least one damping element. Projection exposure apparatus for semiconductor lithography and measuring assemblies for a projection exposure apparatus for semiconductor lithography can include at least one sensor for detecting parameters and vibrations of the projection exposure apparatus, wherein the measuring assembly is embodied in such a way that it can be inserted into an exchange opening, provided for an optical element, in the projection exposure apparatus.

Abstract translation: 用于半导体光刻的投影曝光装置的可变组件包含至少一个阻尼元件。 用于半导体光刻的投影曝光装置和用于半导体光刻的投影曝光装置的测量组件可以包括用于检测投影曝光装置的参数和振动的至少一个传感器，其中测量组件以这样一种方式被实现： 在投影曝光装置中设置有用于光学元件的交换开口。

公开(公告)号：US20110205507A1

公开(公告)日：2011-08-25

申请号：US13045697

申请日：2011-03-11

Applicant: Peter Kloesch ,  Michael Ringel ,  Markus Weiss

Inventor： Peter Kloesch ,  Michael Ringel ,  Markus Weiss

IPC: G03B27/52

CPC classification number: G03F7/709 ,  G03F7/70825 ,  G03F7/7085

Abstract: A changeable assembly for a projection exposure apparatus for semiconductor lithography contains at least one damping element. Projection exposure apparatus for semiconductor lithography and measuring assemblies for a projection exposure apparatus for semiconductor lithography can include at least one sensor for detecting parameters and vibrations of the projection exposure apparatus, wherein the measuring assembly is embodied in such a way that it can be inserted into an exchange opening, provided for an optical element, in the projection exposure apparatus.

Abstract translation: 用于半导体光刻的投影曝光装置的可变组件包含至少一个阻尼元件。 用于半导体光刻的投影曝光装置和用于半导体光刻的投影曝光装置的测量组件可以包括用于检测投影曝光装置的参数和振动的至少一个传感器，其中测量组件以这样一种方式被实现： 在投影曝光装置中设置有用于光学元件的交换开口。

公开(公告)号：US07491951B2

公开(公告)日：2009-02-17

申请号：US11319193

申请日：2005-12-28

Applicant: Marc Hubertus Lorenz Van Der Velden ,  Vadim Yevgenyevich Banine ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Markus Weiss ,  Bastiaan Theodoor Wolschrijn ,  Michiel D. Nijkerk

Inventor： Marc Hubertus Lorenz Van Der Velden ,  Vadim Yevgenyevich Banine ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Markus Weiss ,  Bastiaan Theodoor Wolschrijn ,  Michiel D. Nijkerk

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70916 ,  G03F7/7095

Abstract: The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.

Abstract translation: 本发明涉及一种光刻设备，其包括被配置为调节辐射束或将图案化的辐射束投影到基板的目标部分上的系统。 该系统包括被配置为分别引导辐射束或图案化辐射束的光学有源器件，以及被配置为支持光学有源器件的支撑结构。 该装置还包括用于将背景气体提供到系统中的气体供应。 辐射束或图案化的辐射束与背景气体反应以形成包括多个离子的等离子体。 支撑结构包括包括具有低溅射产率，高溅射阈值能量或高离子注入产量的材料的元件，以减少溅射和溅射产物的产生。

公开(公告)号：US07362414B2

公开(公告)日：2008-04-22

申请号：US11065327

申请日：2005-02-24

Applicant: Wolfgang Singer ,  Joachim Hainz ,  Joachim Wietzorrek ,  Markus Weiss

Inventor： Wolfgang Singer ,  Joachim Hainz ,  Joachim Wietzorrek ,  Markus Weiss

IPC: G03B27/52 ,  G03B27/42

CPC classification number: G02B27/0006 ,  G02B17/0657 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70825 ,  G03F7/70925 ,  G03F7/70975

Abstract: There is provided an optical system including an optical element having a first used area and a second used area on which impinge rays of a light bundle, and a device for moving the optical element between a first position and a second position. The light bundle impinges on the first used area when the optical element is in the first position, and light bundle impinges on the second used area when the optical element is in the second position.

Abstract translation: 提供了一种光学系统，其包括具有第一使用区域的光学元件和光束的入射光线的第二使用区域，以及用于在第一位置和第二位置之间移动光学元件的装置。 当光学元件处于第一位置时，光束照射在第一使用区域上，并且当光学元件处于第二位置时，光束照射在第二使用区域上。

公开(公告)号：US20080042079A1

公开(公告)日：2008-02-21

申请号：US11974718

申请日：2007-10-16

Applicant: Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Joachim Wietzorrek ,  Johannes Wangler ,  Frank Melzer ,  Bernhard Gellrich ,  Bernhard Geuppert ,  Erich Schubert ,  Martin Antoni

Inventor： Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Joachim Wietzorrek ,  Johannes Wangler ,  Frank Melzer ,  Bernhard Gellrich ,  Bernhard Geuppert ,  Erich Schubert ,  Martin Antoni

IPC: G01J3/10

CPC classification number: B82Y10/00 ,  G02B5/09 ,  G02B7/182 ,  G02B17/006 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70158 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70825 ,  G21K1/06 ,  G21K5/04

Abstract: There is provided a system that includes a first optical sub-system contained in a first space, and a second optical sub-system contained in a second space. The first and said second spaces are separated by a structure selected from the group consisting of a diaphragm and a valve.

Abstract translation: 提供了一种包括包含在第一空间中的第一光学子系统和包含在第二空间中的第二光学子系统的系统。 第一和第二空间由选自隔膜和阀门的结构分开。

公开(公告)号：US07321126B2

公开(公告)日：2008-01-22

申请号：US11416447

申请日：2006-05-02

Applicant: Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Joachim Wietzorrek ,  Johannes Wangler ,  Frank Melzer ,  Bernhard Gellrich ,  Bernhard Geuppert ,  Erich Schubert ,  Martin Antoni

Inventor： Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Joachim Wietzorrek ,  Johannes Wangler ,  Frank Melzer ,  Bernhard Gellrich ,  Bernhard Geuppert ,  Erich Schubert ,  Martin Antoni

IPC: A61N5/00

CPC classification number: B82Y10/00 ,  G02B5/09 ,  G02B7/182 ,  G02B17/006 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70158 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70825 ,  G21K1/06 ,  G21K5/04

Abstract: There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ≦193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.

Abstract translation: 提供了沿着扫描方向以扫描模式操作的投影曝光系统。 投影曝光系统包括收集器，其收集波长<= 193nm的光并照亮平面中的区域。 平面由具有与扫描方向平行的y方向和垂直于扫描方向的x方向的局部坐标系限定。 收集器包括（a）第一镜壳，（b）第一镜壳内的第二镜壳，以及（c）用于紧固第一镜壳和第二镜壳的紧固装置。 镜壳基本上围绕公共旋转轴线旋转对称。 紧固装置具有在镜壳的径向方向上延伸的支撑辐条，并且当​​投影到平面中时支撑辐条产生不平行于y方向的突起。

公开(公告)号：US20070206301A1

公开(公告)日：2007-09-06

申请号：US11695626

申请日：2007-04-03

Applicant: Andreas Seifert ,  Markus Weiss ,  Andreas Heisler ,  Stefan Dornheim

Inventor： Andreas Seifert ,  Markus Weiss ,  Andreas Heisler ,  Stefan Dornheim

IPC: G02B5/08

CPC classification number: B82Y10/00 ,  G02B7/1824 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70825

Abstract: In a method for the production of a facetted mirror 24 having a plurality of mirror facets 12 and 12′, which have mirror surfaces 15 and are fitted into reception bores 22, 22′ of a support plate 16, the mirror facets 12, 12′ are made in a first method step. At least one of the mirror facets is fitted into the associated reception bore of the support plate in a second method step, after which the ACTUAL position of the optical axis of at least one mirror surface of an associated mirror facet 12, 12′ fitted into the support plate is respectively determined in a third step and compared with a SET position of a predetermined optical axis. Knowing the measured values determined for the at least one mirror facet 12, 12′ in the third method step, reprocessing of the mirror facet and/or of the reception bore is subsequently carried out in a further method step if there is an angular deviation between the ACTUAL position and the SET position.

Abstract translation: 在制造具有多个镜面12和12'的分面镜24的方法中，其具有镜面15并被装配到支撑板16的接收孔22,22'中，镜面12,12' 在第一方法步骤中制成。 在第二方法步骤中，至少一个镜面被安装到支撑板的相关联的接收孔中，之后将相关镜面12,12'的至少一个镜面的光轴的ACTUAL位置嵌入 分别在第三步骤中确定支撑板并与预定光轴的SET位置进行比较。 了解在第三方法步骤中对于至少一个镜面12,12'确定的测量值，随后在另外的方法步骤中进行镜面和/或接收孔的再处理，如果在第二方法步骤之间存在角度偏差 ACTUAL位置和SET位置。

公开(公告)号：US07090362B2

公开(公告)日：2006-08-15

申请号：US10841846

申请日：2004-05-07

Applicant: Hubert Holderer ,  Andreas Heisler ,  Wolfgang Singer ,  Markus Weiss ,  Andreas Seifert ,  Frank Melzer ,  Heinz Mann

Inventor： Hubert Holderer ,  Andreas Heisler ,  Wolfgang Singer ,  Markus Weiss ,  Andreas Seifert ,  Frank Melzer ,  Heinz Mann

IPC: G02B26/08 ,  G02B7/18

CPC classification number: G03F7/70258 ,  G02B5/09 ,  G02B7/1821 ,  G02B7/1824 ,  G02B26/0816 ,  G03F7/70075 ,  G03F7/70141 ,  G03F7/702 ,  G03F7/70275

Abstract: In a facet mirror with a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces, the mirror facets are mounted jointly in a basic body via bearing devices. The mirror facets comprise mirror bodies contacting at the periphery with the bearing devices via a surface, line or point contact. The preferred field of use of the facet mirrors is a projection objective of a projection exposure machine in microlithography for fabricating semiconductor elements.

Abstract translation: 在具有多个镜面的小平面镜中，其中镜面设置有反射面，镜面通过轴承装置联合地安装在基体内。 镜面包括通过表面，线或点接触在外周与轴承装置接触的镜体。 小平面镜的优选使用领域是用于制造半导体元件的微光刻中的投影曝光机的投影物镜。

公开(公告)号：US09284860B2

公开(公告)日：2016-03-15

申请号：US13883942

申请日：2011-08-23

Applicant: Phillipp Bittel ,  Stefan Foerst ,  Markus Weiss ,  Josef Groeschel

Inventor： Phillipp Bittel ,  Stefan Foerst ,  Markus Weiss ,  Josef Groeschel

IPC: F01L1/34 ,  F01L1/344 ,  F15B13/044 ,  F16K27/04

CPC classification number: F01L1/34 ,  F01L1/3442 ,  F01L2001/34426 ,  F15B13/044 ,  F16K27/041 ,  Y10T29/49293

Abstract: A valve housing for a control valve of a camshaft adjuster, including a housing flange for fastening to a control unit as well as an essentially cylindrical housing component for accommodating a control piston. It is provided that the housing component is rotatably fixedly attached to the housing flange by a form-locked connection. A valve housing of this type is cost effective to manufacture and has a low weight, while ensuring operational reliability. The invention furthermore relates to a method for manufacturing an aforementioned valve housing.

Abstract translation: 一种用于凸轮轴调节器的控制阀的阀壳体，包括用于紧固到控制单元的壳体凸缘以及用于容纳控制活塞的基本上圆柱形的壳体部件。 提供了壳体部件通过形成锁定的连接可旋转地固定地附接到壳体凸缘。 这种阀壳体制造成本低，重量轻，同时确保操作可靠性。 本发明还涉及一种用于制造上述阀壳体的方法。

公开(公告)号：US07875865B2

公开(公告)日：2011-01-25

申请号：US12098739

申请日：2008-04-07

Applicant: Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

Inventor： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

IPC: G03B27/42

CPC classification number: G01J1/42 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70141 ,  G03F7/70558 ,  H05G2/00

Abstract: The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.

Abstract translation: 本公开涉及EUV（极紫外）照明系统。 该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。 孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。 孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。