公开(公告)号：US09143056B2

公开(公告)日：2015-09-22

申请号：US13357616

申请日：2012-01-25

Applicant: Milan Ilic ,  Mika Nuotio

Inventor： Milan Ilic ,  Mika Nuotio

IPC: H02M7/5387 ,  H02M7/72 ,  H02M1/00 ,  H02J3/32 ,  H02J3/38 ,  H02J9/06

CPC classification number: H02M7/5387 ,  G05F1/67 ,  H02J3/32 ,  H02J3/381 ,  H02J3/383 ,  H02J9/06 ,  H02M7/48 ,  H02M7/72 ,  H02M2001/0077 ,  Y02E10/563 ,  Y02E60/721 ,  Y04S10/126

Abstract: A stacked voltage source inverter having separate DC sources is described herein. This inverter is applicable to low or medium voltage, low to medium power applications such as photovoltaic utility interface systems, battery storage application such as peak shaving with renewables, motor drive applications and for electric vehicle drive systems. The stacked inverter consists of at least one phase wherein each phase has a plurality of low voltage full bridge inverters equipped with an independent DC source. This inverter develops a near sinusoidal approximation voltage waveform with fast switching and small low pass AC output filter. A system controller controls operating parameters for each inverter. The inverter may have either single-phase or multi-phase embodiments connected in either wye or delta configurations.

Abstract translation: 这里描述了具有分离的DC源的堆叠电压源逆变器。 该逆变器适用于低压或中压电力应用，如光伏应用接口系统，电池存储应用，如可再生能源的峰值剃须，电机驱动应用和电动车辆驱动系统。 堆叠式逆变器由至少一个相位组成，其中每相具有配备有独立DC源的多个低电压全桥逆变器。 该逆变器开发出具有快速开关和小的低通交流输出滤波器的近正弦近似电压波形。 系统控制器控制每个逆变器的运行参数。 逆变器可以具有以相位或三角形配置连接的单相或多相实施例。

公开(公告)号：US09099938B2

公开(公告)日：2015-08-04

申请号：US13441788

申请日：2012-04-06

Applicant: Milan Ilic ,  Mika Nuotio ,  Jon Bonanno

Inventor： Milan Ilic ,  Mika Nuotio ,  Jon Bonanno

IPC: H02M7/5387 ,  H02M7/72 ,  H02M1/00 ,  H02J3/32 ,  H02J3/38 ,  H02J9/06

CPC classification number: H02M7/72 ,  H02J3/32 ,  H02J3/381 ,  H02J9/06 ,  H02M1/32 ,  H02M1/36 ,  H02M7/49 ,  H02M7/5387 ,  H02M2001/0077 ,  Y10T307/305 ,  Y10T307/707

Abstract: A multiple dc sources bi-directional energy converter includes a plurality of direct current (DC) power sources; one alternating current (AC) power source; at least one stacked alternating current (AC) phase, each stacked alternating current (AC) phase having at least two or more full bridge converters, each respectively coupled to one of the direct current power sources, each full bridge converter having an inductor electrically coupled thereto; and a local controller coupled to each full bridge converter controlling the firing sequence of the switching devices in said full bridge converter to generate an approximately nearly sinusoidal voltage waveform when operated as a voltage source inverter in one direction or generate an approximately nearly constant direct current (DC) output when operated as a full-wave active rectifier in the opposite direction.

Abstract translation: 多直流源双向能量转换器包括多个直流（DC）电源; 一个交流（AC）电源; 至少一个堆叠的交流（AC）相，每个堆叠的交流（AC）相具有至少两个或更多个全桥转换器，每个全桥转换器分别耦合到一个直流电源，每个全桥转换器具有电感耦合 到; 以及本地控制器，耦合到每个全桥转换器，其控制所述全桥转换器中的开关装置的点火顺序，以在一个方向上作为电压源逆变器工作时产生大致接近正弦的电压波形，或者产生大致接近恒定的直流电流 DC）输出，作为相反方向的全波有源整流器工作。

公开(公告)号：US08357266B2

公开(公告)日：2013-01-22

申请号：US12212506

申请日：2008-09-17

Applicant: Milan Ilic ,  Robert B. Huff ,  George W. McDonough

Inventor： Milan Ilic ,  Robert B. Huff ,  George W. McDonough

IPC: C23C14/34

CPC classification number: C23C14/34 ,  C23C14/54 ,  H01J37/32935 ,  H01J37/3299

Abstract: A method and system for conditioning a vapor deposition target is described. In one illustrative embodiment, a vapor deposition system is operated in which a vapor deposition target is used, the occurrence of electrical arcs in the vapor deposition system is detected, and the vapor deposition target is conditioned by adjusting an output current of a power supply that powers the vapor deposition system and adjusting an interval during which energy is delivered to each arc to deliver substantially the same energy to each arc. In some embodiments, the energy delivered to each arc is approximately equal to the maximum energy that the vapor deposition target can withstand without being damaged. The described method and system significantly reduces the time required to remove impurities from a target and does not require the venting of the vacuum chamber or the removal of the target from the chamber.

Abstract translation: 描述了用于调节气相沉积靶的方法和系统。 在一个示例性实施例中，操作气相沉积系统，其中使用气相沉积靶，在气相沉积系统中发现电弧，并且通过调节电源的输出电流来调节气相沉积靶， 为蒸镀系统提供动力并调整能量传送到每个电弧的时间间隔，以向每个电弧输送基本相同的能量。 在一些实施例中，输送到每个电弧的能量近似等于气相沉积靶能够承受而不被损坏的最大能量。 所描述的方法和系统显着地减少了从靶中除去杂质所需的时间，并且不需要真空室的排放或者从室中移出靶。

公开(公告)号：US07999526B2

公开(公告)日：2011-08-16

申请号：US12426698

申请日：2009-04-20

Applicant: Milan Ilic ,  Vladislav V. Shilo

Inventor： Milan Ilic ,  Vladislav V. Shilo

IPC: G05F1/565 ,  G05F1/575

CPC classification number: H02M3/157 ,  H02M2001/0019

Abstract: Disclosed herein are an apparatus and method for charge-mode control. An embodiment of a charge mode controller may include an analog/digital converter configured to monitor the current through a duty cycle switch and convert the current to a switch current value; an accumulator module configured to integrate the switch current value during the switching cycle and output an accumulated charge value; and a comparator module responsive to the accumulated charge value and a charge set point configured to generate a gate drive signal for the duty cycle switch that turns the duty cycle switch ON when the accumulated charge value is less than the charge set point and turns the duty cycle switch OFF when the accumulated charge value reaches the charge set point and thereby controls the duty cycle of the converter and the power supplied by the power stage.

Abstract translation: 这里公开了一种用于充电模式控制的装置和方法。 充电模式控制器的实施例可以包括模拟/数字转换器，其被配置为监视通过占空比开关的电流并将电流转换为开关电流值; 累加器模块，被配置为在开关周期期间积分开关电流值，并输出累积电荷值; 以及响应于所述累积电荷值的比较器模块和被配置为产生所述占空比开关的栅极驱动信号的充电设定点，所述占空比开关在所述累积电荷值小于所述充电设定点时将所述占空比开关导通，并且使所述占空比 当累积的电荷值达到充电设定点时，循环开关OFF，从而控制转换器的占空比和由功率级提供的电力。

公开(公告)号：US07445695B2

公开(公告)日：2008-11-04

申请号：US11413434

申请日：2006-04-28

Applicant: Milan Ilic ,  Robert B. Huff ,  George W. McDonough

Inventor： Milan Ilic ,  Robert B. Huff ,  George W. McDonough

IPC: C23C14/34

CPC classification number: C23C14/34 ,  C23C14/54 ,  H01J37/32935 ,  H01J37/3299

Abstract: A method and system for conditioning a vapor deposition target is described. In one illustrative embodiment, a vapor deposition system is operated in which a vapor deposition target is used, the occurrence of electrical arcs in the vapor deposition system is detected, and the vapor deposition target is conditioned by adjusting an output current of a power supply that powers the vapor deposition system and adjusting an interval during which energy is delivered to each arc to deliver substantially the same energy to each arc. In some embodiments, the energy delivered to each arc is approximately equal to the maximum energy that the vapor deposition target can withstand without being damaged. The described method and system significantly reduces the time required to remove impurities from a target and does not require the venting of the vacuum chamber or the removal of the target from the chamber.

Abstract translation: 描述了用于调节气相沉积靶的方法和系统。 在一个说明性实施例中，操作气相沉积系统，其中使用气相沉积靶，在气相沉积系统中发现电弧，并且通过调节电源的输出电流来调节气相沉积靶， 为蒸镀系统提供动力并调整能量传送到每个电弧的时间间隔，以向每个电弧输送基本相同的能量。 在一些实施例中，输送到每个电弧的能量近似等于气相沉积靶材能够承受而不被损坏的最大能量。 所描述的方法和系统显着地减少了从靶中除去杂质所需的时间，并且不需要真空室的排放或者从室中移出靶。

公开(公告)号：US20060012308A1

公开(公告)日：2006-01-19

申请号：US10884027

申请日：2004-07-02

Applicant: Milan Ilic ,  Kalyan Siddabattula ,  Gerald Roop ,  David Christie

Inventor： Milan Ilic ,  Kalyan Siddabattula ,  Gerald Roop ,  David Christie

IPC: H01J7/24

CPC classification number: H01J37/3405 ,  H01J37/32027 ,  H01J37/3299 ,  H05H1/46

Abstract: There is provided by this invention an apparatus and method for controlling a dc magnetron plasma processing system that automatically adjusts the control signal to the power supply based upon the dynamic impedance of the load to control the output power to the plasma. The output voltage and the output current of the power supply that supplies power to the plasma is sampled over at a sampling frequency at least four to five times higher than the switching frequency and the dynamic impedance of the plasma is calculated based upon the sampled voltage and current from the algorithm R plasma = Δ ⁢   ⁢ V n Δ ⁢   ⁢ I n wherein ΔVn and ΔIn is the maximum difference among samples on one switching cycle. If the dynamic impedance seen is negative in nature then the control signal is compensated accordingly.

Abstract translation: 本发明提供一种用于控制直流磁控管等离子体处理系统的装置和方法，该系统基于负载的动态阻抗自动调节对电源的控制信号，以控制等离子体的输出功率。 向等离子体供电的电源的输出电压和输出电流以比开关频率高至少四至五倍的采样频率被采样，并且基于采样电压来计算等离子体的动态阻抗， 来自算法的电流