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1.发明授权公开(公告)号：US11619606B2
公开(公告)日：2023-04-04
申请号：US17327114
申请日：2021-05-21
Applicant: NANOWEAR INC.
Inventor： Vijay Varadan , Pratyush Rai , Gyanesh Mathur
IPC: G01N27/416 , G01N27/414 , G01N27/12 , G01N27/327 , H05H1/38 , B82Y15/00
Abstract: A system and method is provided for depositing nanosensors including directing a plasma stream onto a low energy substrate having a surface energy of from 10 mN/m to 43 mN/m to increase the surface energy of the substrate to from 44 mN/m to 80 mN/m, applying an adhesive layer to the plasma discharge treated substrate; and depositing nanosensors on the adhesive coated substrate of step (b) via electrostatic force assisted deposition using a high strength electrostatic field of from 2 kV/cm to 10 kV/cm to form vertically standing nanosensors.
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2.发明授权公开(公告)号：US11041825B2
公开(公告)日：2021-06-22
申请号：US16136424
申请日：2018-09-20
Applicant: NANOWEAR INC.
Inventor： Vijay Varadan , Pratyush Rai , Gyanesh Mathur
IPC: B32B37/00 , G01N27/414 , G01N27/12 , G01N27/327 , H05H1/38 , B82Y15/00
Abstract: A system and method is provided for depositing nanosensors including directing a plasma stream onto a low energy substrate having a surface energy of from 10 mN/m to 43 mN/m to increase the surface energy of the substrate to from 44 mN/m to 80 mN/m, applying an adhesive layer to the plasma discharge treated substrate; and depositing nanosensors on the adhesive coated substrate of step (b) via electrostatic force assisted deposition using a high strength electrostatic field of from 2 kV/cm to 10 kV/cm to form vertically standing nanosensors.
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3.发明申请公开(公告)号：US20190086361A1
公开(公告)日：2019-03-21
申请号：US16136424
申请日：2018-09-20
Applicant: NANOWEAR INC.
Inventor： Vijay Varadan , Pratyush Rai , Gyanesh Mathur
IPC: G01N27/414 , H05H1/38 , G01N27/327 , G01N27/12
Abstract: A system and method is provided for depositing nanosensors including directing a plasma stream onto a low energy substrate having a surface energy of from 10 mN/m to 43 mN/m to increase the surface energy of the substrate to from 44 mN/m to 80 mN/m, applying an adhesive layer to the plasma discharge treated substrate; and depositing nanosensors on the adhesive coated substrate of step (b) via electrostatic force assisted deposition using a high strength electrostatic field of from 2 kV/cm to 10 kV/cm to form vertically standing nanosensors.
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公开(公告)号：US11819339B2
公开(公告)日：2023-11-21
申请号：US16916843
申请日：2020-06-30
Applicant: NANOWEAR INC.
Inventor： Vijay Varadan , Pratyush Rai , Gyanesh Mathur
IPC: A61B5/01 , A61B5/00 , A61B5/1486 , C08L33/26
CPC classification number: A61B5/6801 , A61B5/1486 , C08L33/26 , A61B2562/0276 , A61B2562/0285 , A61B2562/12
Abstract: A thermosensitive nanosensor includes a substrate having a plurality of vertically standing nanostructures attached thereto, the plurality of vertically standing nanostructure being covered with a conductive material to form conductive coated nanostructures; a thermosensitive hydrogel adjacent to the plurality of conductive coated nanostructures; and a cover layer on top of the thermosensitive hydrogel to prevent loss of moisture and mechanical stress.
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公开(公告)号：US10714310B2
公开(公告)日：2020-07-14
申请号：US16559109
申请日：2019-09-03
Applicant: NANOWEAR INC.
Inventor： Vijay Varadan , Pratyush Rai , Gyanesh Mathur
Abstract: A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.
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Patent Agency Ranking
公开(公告)号：US10438772B2
公开(公告)日：2019-10-08
申请号：US15974176
申请日：2018-05-08
Applicant: NANOWEAR INC.
Inventor： Vijay Varadan , Pratyush Rai , Gyanesh Mathur
Abstract: A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.
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7.发明申请公开(公告)号：US20210278366A1
公开(公告)日：2021-09-09
申请号：US17327114
申请日：2021-05-21
Applicant: NANOWEAR INC.
Inventor： Vijay Varadan , Pratyush Rai , Gyanesh Mathur
IPC: G01N27/414 , G01N27/12 , G01N27/327 , H05H1/38 , B82Y15/00
Abstract: A system and method is provided for depositing nanosensors including directing a plasma stream onto a low energy substrate having a surface energy of from 10 mN/m to 43 mN/m to increase the surface energy of the substrate to from 44 mN/m to 80 mN/m, applying an adhesive layer to the plasma discharge treated substrate; and depositing nanosensors on the adhesive coated substrate of step (b) via electrostatic force assisted deposition using a high strength electrostatic field of from 2 kV/cm to 10 kV/cm to form vertically standing nanosensors.
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公开(公告)号：US20210000417A1
公开(公告)日：2021-01-07
申请号：US16916843
申请日：2020-06-30
Applicant: NANOWEAR INC.
Inventor： Vijay Varadan , Pratyush Rai , Gyanesh Mathur
IPC: A61B5/00 , A61B5/1486 , C08L33/26
Abstract: A thermosensitive nanosensor includes a substrate having a plurality of vertically standing nanostructures attached thereto, the plurality of vertically standing nanostructure being covered with a conductive material to form conductive coated nanostructures; a thermosensitive hydrogel adjacent to the plurality of conductive coated nanostructures; and a cover layer on top of the thermosensitive hydrogel to prevent loss of moisture and mechanical stress.
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9.发明申请公开(公告)号：US20200006035A1
公开(公告)日：2020-01-02
申请号：US16559109
申请日：2019-09-03
Applicant: NANOWEAR INC.
Inventor： Vijay Varadan , Pratyush Rai , Gyanesh Mathur
Abstract: A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.
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10.发明申请公开(公告)号：US20180330918A1
公开(公告)日：2018-11-15
申请号：US15974176
申请日：2018-05-08
Applicant: NANOWEAR INC.
Inventor： Vijay Varadan , Pratyush Rai , Gyanesh Mathur
CPC classification number: H01J37/28 , B82Y35/00 , G01Q30/02 , G01Q30/04 , G01Q60/30 , G01Q60/42 , H01J37/20 , H01J2237/2803 , H01J2237/2814
Abstract: A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.
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