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公开(公告)号:US10435792B2
公开(公告)日:2019-10-08
申请号:US15123021
申请日:2015-02-25
Applicant: NHK Spring Co., Ltd.
Inventor: Masaru Takimoto , Yuichiro Yamauchi , Satoshi Hirano , Naoya Aikawa
Abstract: A laminate includes: a substrate; and a metallic coating that is formed from copper powder containing 0.002% to 0.020% by weight of phosphorus and having been subjected to reduction treatment, the metallic coating being deposited on the substrate.
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公开(公告)号:US20210324889A1
公开(公告)日:2021-10-21
申请号:US17271765
申请日:2019-10-23
Applicant: NHK Spring Co., Ltd.
Inventor: Masaru Takimoto , Toshihiko Hanamachi , Junichi Nakayama
IPC: F16B5/06
Abstract: A joined body includes: a main body section including a wall section forming a passage along which a medium for accelerating heat exchange flows; and a cover configured to cover a surface of the main body section, the cover including: a covering section provided on a side facing the main body section and configured to cover the surface; a groove section provided on the side facing the main body section and configured to accommodate an end portion of the wall section; and a stirred joint section provided on a side opposite to a side where the covering section and the groove section are provided, the stirred joint section being at least partly frictionally stirred by a depth reaching a bottom of the groove section from a surface on a side opposite to the side facing the main body section and bonded to the end portion of the wall section.
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公开(公告)号:US20170058406A1
公开(公告)日:2017-03-02
申请号:US15123021
申请日:2015-02-25
Applicant: NHK Spring Co., Ltd.
Inventor: Masaru Takimoto , Yuichiro Yamauchi , Satoshi Hirano , Naoya Aikawa
IPC: C23C24/04
Abstract: A laminate includes: a substrate; and a metallic coating that is formed from copper powder containing 0.002% to 0.020% by weight of phosphorus and having been subjected to reduction treatment, the metallic coating being deposited on the substrate.
Abstract translation: 层压体包括:基材; 以及由含有0.002〜0.020重量%的磷并经过还原处理的铜粉形成的金属被膜,金属被膜沉积在基板上。
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公开(公告)号:US12247296B2
公开(公告)日:2025-03-11
申请号:US17259609
申请日:2019-07-17
Applicant: NHK Spring Co., Ltd. , IZUMI TECHNO INC.
Inventor: Toshihiko Hanamachi , Shuhei Morota , Go Takahara , Masaru Takimoto , Hibiki Yokoyama , Hiroshi Mitsuda , Yoshihito Araki , Kengo Ajisawa
IPC: C23C28/04
Abstract: A member for a plasma processing device includes: an aluminum base material; and an oxide film formed on the aluminum base material and having a porous structure, the oxide film including a first oxide film formed on a surface of the aluminum base material, a second oxide film formed on the first oxide film, and a third oxide film formed on the second oxide film, wherein the first oxide film is harder than the second oxide film and the third oxide film, and a hole formed in each of the first oxide film, the second oxide film and the third oxide film is sealed.
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公开(公告)号:US20220009022A1
公开(公告)日:2022-01-13
申请号:US17413680
申请日:2019-12-13
Applicant: NHK Spring Co., Ltd.
Inventor: Toshihiko Hanamachi , Daisuke Fujino , Masaru Takimoto , Yoshihito Araki , Masahiro Fujii
IPC: B23K20/02 , B23K20/00 , B23K20/233
Abstract: A joining method of joins a main body and a cover, the main body being a flat plate and made of aluminum or an aluminum alloy and including a passage through which a medium for promoting heat exchange is circulated, and the cover being a flat plate and made of aluminum or an aluminum alloy and configured to cover the passage of the main body. The method includes: a covering step of covering the main body with the cover; and a diffusion bonding step of joining the main body and the cover by diffusion bonding under a condition in which a joining temperature is 500° C. or higher and 640° C. or lower, and a joining surface pressure is 0.7 MPa or higher. Each of a joining surface of the main body and a joining surface of the cover has a flatness of 0.2 or less.
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公开(公告)号:US11477858B2
公开(公告)日:2022-10-18
申请号:US16653094
申请日:2019-10-15
Applicant: NHK SPRING CO., LTD.
Inventor: Toshihiko Hanamachi , Kenji Sekiya , Daisuke Hashimoto , Satoshi Hirano , Masaru Takimoto , Go Takahara , Yoshihito Araki , Arata Tatsumi , Takashi Kawasaki , Yuki Toyama , Satoshi Anzai
Abstract: A small diameter sheath heater with improved reliability is provided. The sheath heater according to one embodiment of the present invention includes a metal sheath, a heating wire having a band shape, the heating wire arranged with a gap within the metal sheath so as to rotate with respect to an axis direction of the metal sheath, an insulating material arranged in the gap, and connection terminals arranged at one end of the metal sheath, the connection terminals electrically connected with both ends of the heating wire respectively.
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公开(公告)号:US20210292911A1
公开(公告)日:2021-09-23
申请号:US17259609
申请日:2019-07-17
Applicant: NHK Spring Co., Ltd. , IZUMI TECHNO INC.
Inventor: Toshihiko Hanamachi , Shuhei Morota , Go Takahara , Masaru Takimoto , Hibiki Yokoyama , Hiroshi Mitsuda , Yoshihito Araki , Kengo Ajisawa
IPC: C23C28/04
Abstract: A member for a plasma processing device includes: an aluminum base material; and an oxide film formed on the aluminum base material and having a porous structure, the oxide film including a first oxide film formed on a surface of the aluminum base material, a second oxide film formed on the first oxide film, and a third oxide film formed on the second oxide film, wherein the first oxide film is harder than the second oxide film and the third oxide film, and a hole formed in each of the first oxide film, the second oxide film and the third oxide film is sealed.
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