Data generation method and charged particle beam irradiation device

    公开(公告)号:US11749499B2

    公开(公告)日:2023-09-05

    申请号:US17412775

    申请日:2021-08-26

    Inventor: Kenichi Yasui

    CPC classification number: H01J37/304 H01J2237/30416

    Abstract: In one embodiment, a data generation method is for calculating a coverage of a polygon in each of a plurality of pixels obtained by dividing a target to be irradiated with a charged particle beam into predetermined sizes. The method includes dividing a parametric curve that defines a pattern shape into a plurality of parametric curves, calculating, for each of the plurality of parametric curves, an area of a region surrounded by a segment connecting end points among control points of the parametric curve and the parametric curve, calculating positions of vertexes of a figure having an area equivalent to the calculated area and having, as one side thereof, the segment connecting the end points, and generating the polygon by using the vertexes.

    Drawing data generating method
    4.
    发明授权

    公开(公告)号:US10685435B2

    公开(公告)日:2020-06-16

    申请号:US15380503

    申请日:2016-12-15

    Abstract: A drawing data generating method according to an embodiment is a method for generating drawing data input to a drawing apparatus that draws a plurality of figure patterns on an object using a charged particle beam. The method includes generating the drawing data in accordance with a data format that not only defines a plurality of pieces of figure information, but also sequentially defines dose information of each figure before or after the plurality of pieces of figure information. The dose information of each of the second and succeeding figures is converted to a representation based on the dose information of any preceding figure, and a data length of the dose information is made variable for each figure. For example, the dose information of each of the second and succeeding figures is converted to a difference representation between a dose of the figure and a dose of the preceding figure, and a data length of the difference representation is changed in accordance with the magnitude of a difference value.

    Generating method of drawing data and charged particle beam drawing method

    公开(公告)号:US10445450B2

    公开(公告)日:2019-10-15

    申请号:US15691951

    申请日:2017-08-31

    Abstract: In one embodiment, a generating method of drawing data includes generating a pixel map that includes dose amount information on each of pixels obtained by dividing a drawing area on an object into a mesh, extracting, from the pixel map, an island-shaped pixel map which is a group of multiple pixels in which the dose amount information is not zero, determining an order of definition of the dose amount information on the pixels in the island-shaped pixel map, and generating a compressed pixel map including a size of the pixels, information indicating the order of definition, coordinates of a pixel which is first in the order of definition in the island-shaped pixel map, and the dose amount information on the pixels in the island-shaped pixel map, the dose amount information being continuously defined based on the order of definition.

    Data processing method, charged particle beam writing method, and charged particle beam writing apparatus

    公开(公告)号:US10096452B2

    公开(公告)日:2018-10-09

    申请号:US15342296

    申请日:2016-11-03

    Abstract: In one embodiment, a data processing method is for creating write data from design data, and registering the write data into a writing apparatus. The method includes applying, to a plurality of pieces of first frame data into which first chip data of the design data is divided, a plurality of conversion processes to create the write data, and applying a plurality of pre-processes to a plurality of pieces of second frame data into which second chip data of the write data is divided, and registering the second chip data into the writing apparatus. The plurality of conversion processes and the plurality of pre-processes are each performed in a pipeline processing on a per-frame basis. The write data is registered into the writing apparatus on a per-chip basis, on a per-virtual chip basis, or on a per-frame basis. The virtual chip includes a plurality of chips combined together.

    Writing data verification method and multi-charged particle beam writing apparatus

    公开(公告)号:US09846760B2

    公开(公告)日:2017-12-19

    申请号:US14819931

    申请日:2015-08-06

    Inventor: Kenichi Yasui

    Abstract: In one embodiment, a writing data verification method is for verifying a conversion error due to data conversion from first writing data in a vector format based on design data to second writing data in a pixel format. The method includes converting the second writing data to third writing data in a vector format, performing an exclusive OR operation on the first writing data and the third writing data, enlarging a graphic of the first writing data to obtain an enlarged graphic and generating a tolerance region graphic from a difference between the enlarged graphic and the graphic of the first writing data, and detecting a defect by performing a mask process on a graphic generated by the exclusive OR operation with the tolerance region graphic.

    Charged particle beam writing method and charged particle beam writing apparatus

    公开(公告)号:US11456153B2

    公开(公告)日:2022-09-27

    申请号:US16831979

    申请日:2020-03-27

    Inventor: Kenichi Yasui

    Abstract: In one embodiment, a charged particle beam writing method includes dividing a figure pattern defined in writing data into a plurality of shot figures, virtually dividing a writing target substrate into a plurality of mesh regions, and calculating a correction irradiation amount to correct proximity effect and middle range effect for each of the mesh regions based on a position of the figure pattern, calculating an irradiation amount for each of the plurality of shot figures using the correction irradiation amount, calculating an insufficient irradiation amount at an edge portion of the shot figure based on the irradiation amount, resizing the shot figure based on the insufficient irradiation amount, and writing the resized shot figure on the writing target substrate using a charged particle beam in the irradiation amount.

    METHOD OF CREATING WRITING DATA
    10.
    发明申请

    公开(公告)号:US20180285505A1

    公开(公告)日:2018-10-04

    申请号:US15925089

    申请日:2018-03-19

    Abstract: In one embodiment, a method is for creating writing data used in a multi charged particle beam writing apparatus. The method includes partitioning a polygonal figure included in design data into a plurality of trapezoids that each include at least one pair of opposite sides parallel along a first direction and that join so as to be continuous in a second direction orthogonal to the first direction while a side parallel to the first direction serves as a common side, and creating the writing data by, when a first trapezoid, a second trapezoid, and a third trapezoid join along the second direction, representing a position of a common vertex shared by the second trapezoid and the third trapezoid using displacements in the first direction and the second direction from a position of a common vertex shared by the first trapezoid and the second trapezoid. In at least one of the plurality of trapezoids, different dose amounts are defined in the first direction.

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