公开(公告)号：US10429742B2

公开(公告)日：2019-10-01

申请号：US15772728

申请日：2016-11-02

Applicant: Orbotech Ltd. ,  Laser Imaging Systems GmbH

Inventor： Steffen Ruecker ,  Stefan Heinemann ,  Werner Eschke ,  Abraham Gross

IPC: G03F7/20

Abstract: A method of manufacture of objects including receiving a CAD file containing electrical circuit design data for direct writing on a surface, the CAD file including CAD data for a multiplicity of objects to be produced on the surface, automatically configuring a direct write machine to direct write direct writing data based on the CAD data on the surface in plural scans, each having a scan width less than a width of the surface, including arranging the direct writing data for the multiplicity of objects to be written in a side by side manner in each of the plural scans so as to be within the scan width, whereby stitching of direct writing data between adjacent scans is obviated and operating the direct write machine to create the multiplicity of objects on the surface.

公开(公告)号：US11596070B2

公开(公告)日：2023-02-28

申请号：US17425023

申请日：2020-02-11

Applicant: Orbotech Ltd.

Inventor： Nava Shpaisman ,  Abraham Gross ,  Arie Glazer

IPC: H05K3/06 ,  H05K3/12 ,  H05K3/00 ,  C09D11/30

Abstract: An apparatus is used in preparing a printed circuit board (PCB). The apparatus can include a common chassis, an inkjet printer mounted on the common chassis, and a pattern exposer mounted on the common chassis. The inkjet printer can selectively print unexposed photosensitive patterns on a PCB substrate with a photosensitive ink. The pattern exposer can expose said photosensitive patterns to radiation thereby defining exposed patterns. A photosensitive ink for use in an ink jet printer can include a photoresist, a solvent, a humectant, a surfactant, an adhesion promoter, and a basic solution. The adhesion promoter is operative to increase anisotropy of a wet etching process of a copper component on which said photosensitive ink is printed.

公开(公告)号：US09523873B2

公开(公告)日：2016-12-20

申请号：US14603572

申请日：2015-01-23

Applicant: Orbotech Ltd. ,  Laser Imaging Systems GmbH & Co. KG

Inventor： Stefan Heinemann ,  Wolfgang Retschke ,  Holger Wagner ,  Jonas Burghoff ,  Abraham Gross

IPC: G02B26/08 ,  G02F1/11 ,  H04N1/04 ,  G02B26/12 ,  G02B27/09 ,  G02B27/30

CPC classification number: G02F1/11 ,  G02B26/124 ,  G02B27/0955 ,  G02B27/30 ,  H04N1/04 ,  H04N1/0408 ,  H04N1/0443

Abstract: A direct imaging system comprises an illumination unit comprising a plurality of light sources, the plurality of light sources configured to emit a plurality of beams, an optical system for forming the plurality of beams to be aligned in position or angle, an acoustic optical modulator positioned to receive the plurality of beams aligned in one of position or angle and to consecutively diffract different portions of the plurality of beams as an acoustic wave propagates in an acoustic direction, and a scanning element adapted to scan an exposure plane with the plurality of beams modulated by the acoustic optical modulator at a scanning velocity, wherein the scanning velocity is selected to incoherently unite the different portions of the plurality of beams into a single exposure spot.

公开(公告)号：US08964274B2

公开(公告)日：2015-02-24

申请号：US13956797

申请日：2013-08-01

Applicant: Orbotech Ltd. ,  Laser Imaging Systems GmbH & Co. KG

Inventor： Stefan Heinemann ,  Wolfgang Retschke ,  Holger Wagner ,  Jonas Burghoff ,  Abraham Gross

IPC: G02B26/08 ,  G02F1/11 ,  H04N1/04

CPC classification number: G02F1/11 ,  G02B26/124 ,  G02B27/0955 ,  G02B27/30 ,  H04N1/04 ,  H04N1/0408 ,  H04N1/0443

Abstract: A direct imaging system comprises an illumination unit comprising a plurality of light sources, the plurality of light sources configured to emit a plurality of beams, an optical system for forming the plurality of beams to be aligned in position or angle, an acoustic optical modulator positioned to receive the plurality of beams aligned in one of position or angle and to consecutively diffract different portions of the plurality of beams as an acoustic wave propagates in an acoustic direction, and a scanning element adapted to scan an exposure plane with the plurality of beams modulated by the acoustic optical modulator at a scanning velocity, wherein the scanning velocity is selected to incoherently unite the different portions of the plurality of beams into a single exposure spot.

Abstract translation: 直接成像系统包括包括多个光源的照明单元，所述多个光源被配置为发射多个光束，用于形成要在位置或角度对准的多个光束的光学系统，定位 以接收以一个位置或角度对准的多个光束，并且当声波在声学方向上传播时，连续地衍射多个光束的不同部分，以及适于扫描具有多个光束的曝光平面的扫描元件 通过声光学调制器以扫描速度，其中选择扫描速度以将多个光束的不同部分非均匀地组合成单个曝光点。

公开(公告)号：US20220104360A1

公开(公告)日：2022-03-31

申请号：US17425023

申请日：2020-02-11

Applicant: Orbotech Ltd.

Inventor： Nava Shpaisman ,  Abraham Gross ,  Arie Glazer

IPC: H05K3/06 ,  H05K3/00 ,  H05K3/12

Abstract: A method for preparing a PCB product having highly dense conductors, the method including providing a PCB substrate including a conductive layer, employing an inkjet printer to selectively print unexposed photosensitive patterns on the PCB substrate, the unexposed photosensitive patterns having a thickness of less than 5 pm, exposing the photosensitive patterns to radiation thereby to define exposed patterns, the exposed patterns having a pitch less than 20 pm and wet etching the conductive layer in accordance with a pattern defined by the exposed patterns thereby to define the highly dense conductors having a pitch of less than 30 pm.

公开(公告)号：US09523714B2

公开(公告)日：2016-12-20

申请号：US14155808

申请日：2014-01-15

Applicant: Photon Dynamics, Inc. ,  Orbotech Ltd.

Inventor： Alexander Kadyshevitch ,  Ofer Kadar ,  Arie Glazer ,  Ronen Loewinger ,  Abraham Gross ,  Daniel Toet

IPC: G01R31/305 ,  G01R1/07 ,  H01J33/00

CPC classification number: G01R1/072 ,  G01R31/305 ,  H01J33/00 ,  H01J2237/164

Abstract: A non-mechanical contact signal measurement apparatus includes a first conductor on a structure under test and a gas in contact with the first conductor. At least one electron beam is directed into the gas so as to induce a plasma in the gas where the electron beam passes through the gas. A second conductor is in electrical contact with the plasma. A signal source is coupled to an electrical measurement device through the first conductor, the plasma, and the second conductor when the plasma is directed on the first conductor. The electrical measurement device is responsive to the signal source.

Abstract translation: 非机械接触信号测量装置包括被测结构上的第一导体和与第一导体接触的气体。 至少一个电子束被引导到气体中，以便在电子束通过气体的气体中引入等离子体。 第二导体与等离子体电接触。 当等离子体被引导到第一导体上时，信号源通过第一导体，等离子体和第二导体耦合到电测量装置。 电测量装置响应于信号源。